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MOS Transistor

1. This document discusses transistor operation and doping in silicon. Key points include how doping with boron or phosphorus ionizes atoms and allows silicon to conduct via holes or electrons. 2. The MOS capacitor structure and its operation in different regimes is described. Accumulation, depletion, and inversion regions are defined based on the applied gate voltage and doping concentrations. 3. Formulas for capacitance, threshold voltage, and carrier concentrations are provided to analyze MOS operation quantitatively.

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Sandeep
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0% found this document useful (0 votes)
15 views40 pages

MOS Transistor

1. This document discusses transistor operation and doping in silicon. Key points include how doping with boron or phosphorus ionizes atoms and allows silicon to conduct via holes or electrons. 2. The MOS capacitor structure and its operation in different regimes is described. Accumulation, depletion, and inversion regions are defined based on the applied gate voltage and doping concentrations. 3. Formulas for capacitance, threshold voltage, and carrier concentrations are provided to analyze MOS operation quantitatively.

Uploaded by

Sandeep
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
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on

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Current and drift
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and
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when there
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decrease

channel 10mV drop may give


Current .

more drop of

to this in PLANAR TECH .

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by
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this
the txn

fab threshold
as

Slope
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-
-
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mm
> 45hm
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→ Sub threshold
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as Lf =D to × also reduced

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.

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Greatest Advantage
channel fIoT
Long
uantum
Mechanics )
led to
scaling Problems

.

to many
led
advised
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change
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19hm node
while
problem Carefull
→ Can be a potential
the
circuit .

designing
FHORTCHANNELEFFECTS -
-
-

Modulation (
into channel
Drain junction .

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limitation vos
-

(
electron ,

velocity of
saturation .

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BIT
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.

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Leakage [
biased BD
.
Forward

5. Substitute
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,

leakage
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6 Gate
.

.
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mmmm
mm


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s

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holes at the top of
of
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cone
as the
same
is as
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the
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electron

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carriers
.

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.

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load

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① Yp 0 to

Transistor in saturation region .

② AIDS

,↳,
;µ④§
saturation occurs before
③ velocity
in
that Change region ; ,

4¥ so
eliminated
Can be
.

of operation VDSAT DID VDD 40


2

④ IDs = kn
'

¥ Vissatn ④ -
4th) -

VEI) ( HXXO) .

is independent of
IDs - Io (1-1×40) =D

Resistance is function of Yo .

⑤ RG10)
Yi = YDD Vf
,
=¥D
RL40)
IO1H No)
=

resistance
Average
=µy §
=D
filo) duo
Reg
.

YbD/z
Vppfz

I )dVo
.
=

II. I III. "ok.

Reg = VDD
UDD

Ree=Ii¥-I¥
Reg =
? It =D

establish R - C network .

taken to
Reg is
source discharging
Current
Constant
+ I0

I
Region of

f) Operation
.

I I .
Vo

}
VDSATN
I

a
:*÷:*
I
17
2

§ (* ) =L
'
=O
Reg =

I0 1IO I
1 I =

I =
Rep CL ,
=

¥nxCi= Iot .

1
t 0.69 Reg Ce

/t=asvema
t.CN#t=o.69xgIx
=
'

+4 ! 2Io

Current foure model


Constant
When 4=0 model
Current
.

is the

l=O=DCONSTANTCURRENTS0UR-
Holt)
-2
method
I

Invalid because of

change of operation
in
region
to linear)
(saturation


/Req=¥Y
Io = kn
'

¥ His satin ((
VDD -
Vtn) -

] Velocity
saturation

Utf Saturation
f- kin ¥ ( VDD
-

Io =

/Reqa Txn Reg drops by x①


Double the
width of
VDD
is large =D VDD -
Vtn -

VD{ I

⑦ VDD
Udai
not a
function of
=D Reg is
Course)
large ( in
this .

taken as

Vpp is
always

/
¥58③

*i¥ tii
Vasco
IT i

'
! I

¥
'

:
¥
I I ①

"
→ us .

* noise

C = ↳ × Series
with Cdep

( =
CoxCa#
Cox
+
Cdep
#
as Vast Surface charge mode
and
Inversion
=D Depletion to the field
reduced
as

the Cdep
is
the top of
terminated
is compete ly
the channel .

# and reaches
C again
cdep to =D
Value
original
.

the
TXN is linear region of operation to ③
started =D near
↳ Inversion is already
worried about
=D We
are
only
Co=Co×W .

SATURATION ( IDEAL)
④ D

6%4 Vs
""

÷ .

s ¥B
III , so

G=CDt↳
because ,

mask
acts its
.

as own

[ =

Cut
Cox WL

# CGB =Cg ,
Cons =
Cop
= 0 .

6GB
Saturation CGs=Ih
off
,

pinch
.
-

Due
to

÷÷÷: Loy Lou

D. annual

even
is done to make

distribution of defects labnoomahih.es


overlap Capacitance
a=Co×oLovW Gfeftannt #g. given
a
( Lou
,
L
reduced
.

2 Coy


CG net
=
Cgt
IN Loy
Cox WL1-2CO
×
↳ net =

CGnet=Co×WfL-2LaT✓ width CH) of


TX =D Canet F.
increase
if we

⑦ CDBandc.si# Capacitance
.

↳ PN junction Depletion

p!!n III.II
'
"

am

:*:[
Could
⑦ CG = Cox HL t 2
'

ca.ie#aco.FU me

IN # CGI Dimensions .

=D =D
* DIFFUSION CAPACITANCE ! -

mmmm
mmm

NA 4- ¥7 4 "±
¥¥N/¥
o-oioi.io I

# ① ① i. ④ ④
Capacitance ea
=
Cjo
µ µ
Hole
I
Cjo=#I¥)¥
Lone NA

Cj =CjoWL
.

=D


Top VIEW

÷:÷¥:
i:.
1-

accounted for i%→


is .

Gate as
or ;
under the
.

:#
'
I'

channel length :

length
Drawn ;
↳ i ii
Intended Channel
.

i i.

ci.capaatanah.ua .

,
region
Depletion as
there ←¥
"
hI[op other
-
.

side
.

"
"

!a

↳ot=Gt
↳ A=WXLs(Bottom
plate Capacitance .
② (perimeter Capacitance) SIDEWALL CAPACITACE in

Constant
↳µ =
Xj CW1-2LS) Cj
Xj =

Technology
Constant
Wt2↳) Cjsw =
Technology
=D
Csw =
Cjsw (

CDB=CBot-Csw=CjthemWLs-Cj¥tumsµ(Ht2F
[
.

e- .

same)
Csis (if Bias is
i

CDB =

② Csis
CG =

=
IN

Cars
fcoxl
=
+2 " " )

WIG ↳ + GS1N (t +
a
¥ )) } .FI?pIaene
on µ .

* Rea =
? '¥I -
I .

scale
Cap linearly
with µ

.

scale all
If we

if /WF CI ReqTf
↳ IN determines delay So .

,
Correct ft

to be selected .

is
always
W
=D Independent of
Parasitic
delay C×Req Law , Rafa .
its Capacitance delay
Parasitic
delay =D own

We
Independent of

Go I
m
Cj
=

↳ emphen.cat Formula .

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