Analog/RF Circuit Design Techniques For Nanometerscale IC Technologies
Analog/RF Circuit Design Techniques For Nanometerscale IC Technologies
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Proceedings of ESSCIRC, Grenoble, France, 2005
All these effect can easily be estimated using the fgate of a 180nm technologies, which is usually sufficient.
MOS transistor. This area-independent and fairly vDS- However the maximum hold time decreases rapidly with
independent parameter is for conventional MOS newer technologies, down to a typical value in the low
transistors [3]: nano-second range for standard 65nm technologies. To
g tunnel get an acceptable hold-time in 65nm CMOS, either thick
f gate oxide transistors or inter-metal capacitances must be
2S C in
used; similar conclusions hold for PLL loop filters.
vGS 13.6
# 1.5 10 16 v GS
2
e tox NMOST Leaky gates result in DC-input current, which sets a
vGS 13.6 lower bound on the current gain of a MOS transistor; as a
# 0.5 10 16 v GS
2
e tox PMOST rough estimation this DC gain is:
2
t ox in [ nm ] vGS in [ V ] iD 1 P vGT VT
| 2 with E igs | 1V
iGS L 2 E igs f gate
Figure 2 shows fgate–bands for 4 technologies as derived For a typical 65nm CMOS generation and at low
from measurements. This figure shows that fgate ranges effective gate-overdrive voltages, the current gain is
from roughly 0.1Hz in 180nm technologies to about about unity for L | 30 Pm .
1MHz in 65nm CMOS; for PMOS-transistors, fgate is
roughly a factor 3 lower. This fgate can be used to easily The impact of gate-leakage on matching
estimate the impact of gate leakage on other relevant Gate leakage is caused by quantum-mechanical
properties of MOS transistors. tunnelling and depends on the layer-thickness and the
1GHz
1E+09 field-strength. It therefore exhibits spread that can limit
the achievable level of performance of analog circuits.
65nm Because spread and mismatch are DC effects, they do
1MHz
1E+06 90nm not (from a fundamental point of view) require any
additional power. However, the typically way to
fgate 1E+03 120nm
1kHz minimization is spending area [9,10] which in turn
increases power consumption at a given speed, because
1Hz
1E+00 larger capacitances have to be charged [11].
Gate-leakage mismatch is an extra mismatch source [3]
180nm with an area-dependency different from that of
1mHz
1E-03 conventional matching [9,10,12]. Mismatch of gate
technology leakage current is proportional to the gate current level
with in 65nm CMOS a proportionality constant
Figure 2: fgate ranges for typical analog applications, for X IGS | 0.03 / Area , where Area is the transistor’s gate
NMOS-transistors in different CMOS technologies. For area in square-micron. The total relative mismatch of a
PMOS-transistors fgate is roughly a factor 3 lower. transistor’s drain current is roughly given by the
following relation; current factor mismatch of the
The impact of gate-leakage on filters, integrators and transistors is neglected, which is allowed for practical
hold circuits values of vGT [10].
The fgate by definition gives the frequency below which
the input impedance appears to be mainly resistive. For V id2 V id2 ,conventional V id2 ,gate leakage
frequencies higher than fgate the gate appears to be mainly
capacitive. For filters this simply implies that a MOS- i D2 i D2 i D2
capacitance can be used as capacitance only for 2 2
§ AVT g m · §X i ·
frequencies much higher than the fgate. For lower ¨ ¸ ¨ IGS G ¸
¨ ¸ ¨ ¸
frequencies a (loop-)filter using MOS capacitances © WL i D ¹ © WL i D ¹
effectively is a (non-linear) resistive divider. This leaky
behavior of gates also severely limits applications in
switched-current circuits and sample-and-hold circuits. The first term is the conventional mismatch due to
The droop-rate of MOS-capacitances is as a good mismatch in threshold voltage, with AVT the matching
approximation given by: coefficient. This AVT is a technology-related factor that
dvC ªV º is roughly proportional to the gate-oxide thickness,
| J dvdt f gate « » with J dvdt | 1V
dt ¬s¼ saturating in UDSM technologies around 2-3mVPm
which relation implies that when accepting a droop of [12]. The second term is the gate current mismatch. The
'V , the maximum (hold-)time is impact of gate-leakage mismatch on the overall
'V mismatch is best illustrated using the square-law relation
't | >s@ which relation is sufficient for rough estimation
J dvdt f gate purposes. It follows that:
Allowing, e.g., 1mV drop on a sampled-and-held value,
the maximum usable hold-time is in the ms-range in
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Proceedings of ESSCIRC, Grenoble, France, 2005
2 2
§ ] f gate L2 ·
2 x the suppression of short channel effects is
V ID § AVT g m ·
¨ ¸ ¨ ¸ relatively good
i D2 ¨ i ¸ ¨ ¸
© WL D ¹ © WL ¹ x the output conductance can be relatively low
In this relation 9 is a constant that is independent of area x the sub-threshold slope of these devices is near
ideal: about 60mV/decade
and (almost) independent of technology. It follows
x the junctions are small because of the thin-body
directly that high values of fgate result in a large impact of
enclosed by oxide
gate-leakage related mismatch. The previous relation
The fully depleted transistors are basically thin-film SOI
also shows that by linearly scaling of transistors
transistors that come in many flavours. Figure 4b shows
(increasing the width and the length proportionally), with
the type that resembles the planar bulk device in Figure
constant power consumption, the classical mismatch
4a the most. The double-gate variant that probably is the
term decreases while at the same time the gate-leakage
successor or the planar bulk devices is the FinFET
term increases. This yields a maximum usable area and a
[17,19,20,21,22] shown in Figure 4c and 4d. The naming
lower limit on attainable mismatch. With width-scaling
of the FinFET originates from its appearance, see also
and a proportional power-scaling there is no minimum in
Figure 4d for a simplified view; the device resembles a
the reachable mismatch figure. It’s also clear that the fgate
silicon fin on top of a SiO2 layer, with the gate draped
has a significant impact on the minimum attainable
over it to effectively form a gate on (usually only) both
mismatch figure: for maximum matching therefore low-
sides of the fin.
leakage devices should be used.
As conduction takes place on the two sides of the fin, the
10%
gm/ID IG/ID
W of the FinFET is twice the height of a fin (this fin-
height is therefore denoted as W/2 in Figure 4d). The fin–
1% VGT=500mV
VID/ID VGT=200mV
width is small in order to get fully depleted devices with
L
VGT= 50mV decent properties: as a rule of thumb the fin-width is
0.10%
smaller than L/4 which amounts to only 10nm wide fins
W
for 40nm long transistors [23]. Taking into account the
0.01%
1E+0 1E+2 1E+4 1E+6
current shape of the fins [24], the W of FinFETs is
area >Pm2@ heavily discretized at about W # 2 N Lmin with
10%
N=1,2,3,… and with Lmin the minimum transistor length.
gm/ID There are many differences between the conventional
1% VGT= 50mV planar bulk MOS transistors and the (FD SOI) FinFETs.
L VID/ID VGT=200mV Below a short summary is given, focussing on some
VGT= 500mV
0.10% analog aspects not listed in the previous list.
W
x The body of the FinFET will be almost
0.01% undoped, while the threshold voltage will be
1E+0 1E+2 1E+4 1E+6
area >Pm2@
determined by the workfunction between the
silicon and the metal gate [25]. As a result both
Figure 3: The spread of an MOS transistor in 65nm gate depletion and threshold voltage spread due
CMOS with a) linear scaling of W and L at constant to dopant number fluctuations in the body are
power consumption b) W-scaling, and proportional essentially absent.
powerscaling x Vt-spread will be determined by the spread in
the fin-width [25] and by the spread in the
3.2.1 The impact of gate-leakage on noise workfunction. There’s not yet good data of
expected mismatch and area-scaling relations.
Just as any current across a junction, gate leakage x Conduction takes place on the sidewalls of the
exhibits shot-noise with current density S IG 2 q I G . As fin, which are formed by etching: this surface is
such, it is equivalent to base-currents in bipolar rough which probably gives rise to excess
transistors. This shot noise comes on top of the induced flicker noise.
gate noise [13,14]. Noise in the gate current therefore x The gate-leakage of FinFETs is reduced by
limits noise performance in analog circuits in UDSM about one order of magnitude compared to that
CMOS [15]. in planar devices because of reduced fields and
quantum confinement effects [26].
4. Future CMOS transistors x The mobility and hence the transistor’s current
factor is orientation dependent in FinFETs
In the past few decades, the transistors in mainstream because of the conduction on the sidewalls of
CMOS technology were planar bulk devices. Scaling of the fin: the crystal orientation can be anything
these planar bulk devices is expected to end around the ranging from (1 0 0) to (1 1 0) [21,27] which
45nm technology node [16,17]. The most likely significantly affects carrier mobility. This
successors are fully depleted (FD) thin-body transistors orientation dependency is expected to give no
[17,18]. These FD thin-body transistors have a number problems in analog circuit design as it is good
of advantages over conventional UDSM transistors: practice to layout matching sensitive transistors
in the same orientation.
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internal supply voltage of ICs has been dropping the past idealities caused by capacitor mismatch and finite
decade from 5V down to 1 V today. However lagging operational amplifier (opamp) gain both in the pipelined
behind, the PCB board designs still use higher voltage ADC and the algorithmic ADC.
swings and supplies as standards. For this reason the Digital calibration is also used in RF circuits: for
modern digital ICs should sometimes still look, from the example in [47] calibration techniques are presented that
outside, as if they operate on a higher supply voltage suppress the carrier leakage and enable the direct-
than used internally. This is especially the case for upconversion architecture to meet WCDMA
commodity products like microcontrollers. For this specifications.
reason fully integrated supply voltage regulators [38,39] Another example is found in [6] where a closed-loop RF
and high voltage IO buffers [40] have been developed in calibration is used in a fully integrated transceiver,
modern CMOS technologies. These circuits are designed including digital MAC layers. An RF loop-back path is
at a higher than nominal supply voltage, but by carefully used from the output of the transmit mixer to the input of
stacking devices the circuits can withstand the high the receive mixer. During calibration, a known digital
voltages. sequence is transmitted and looped back to the receiver
The on-chip communication is getting more attention, as and the received digital signal is used to correct for
(global) interconnects are rapidly becoming a speed, analog and RF non-idealities such as DC offset, I/Q
power and reliability bottleneck for digital systems [41]. mismatch, and RF carrier leak. This way matching
Technological advances such as copper interconnects requirements are relaxed and area and power can be
and low-k dielectrics are not sufficient to let the saved.
interconnect bandwidth keep up with the advances in If we observe this trend, then we can foresee analog
transistor speeds. circuits, with many calibration points. Smart algorithms
From a circuit-design perspective, a general solution is can locate the error sources in the digital domain and
the use of repeaters, which is expensive in term of area correct for it. These way at least static errors (gain,
and power. Another proposed solution [42] uses low- mismatch, and even linearity) can be compensated.
swing signaling over differential 10mm aluminum However, noise cannot be compensated for in the digital
interconnects. In [43], it is proposed to use 16µm-wide domain due to its wide band nature: it remains an analog
differential wires (20mm long) and exploit the LC problem. On the system level, however, detection
regime (transmission line behavior) of these wires. algorithms can be improved so that less signal-to-noise is
In [44], it is shown that pulse-width pre-emphasis in needed for the required bit error rate. For example in RF
combination with resistive termination can increase the circuits, inductors are used today to improve the signal to
data-rate to 3Gb/s/ch, using 10mm-long, 0.4µm-wide noise ratio. If we realize that an inductor of a few nH -
differential interconnects. Without the proposed which is necessary for the low GHz range - occupies the
techniques, these interconnects can achieve only same die area as a simple baseband processor in 65nm
0.55Gb/s/ch. So by using analog equalizers which still technology, it is clear that smart digital detection
comply with pure digital swing, a factor 6 in speed techniques can help to overcome noise problems as well.
increase can be achieved over large distances.
4. Pure analog circuits
3. Digital circuits for analog Analog once was the field in which the main chunk of
Analog CMOS circuits typically reside on an IC that has signal processing was done. Since a few decades a
digital signal processing circuits. Since digital circuits continuous shift towards digital signal processing with
have become very compact, analog circuits can some analog processing (or conditioning) of the inputs
nowadays receive help from digital circuits: the analog and outputs of the digital core is apparent. However, still
circuits can be calibrated and can be corrected for the analog circuits are required to get meaningful data into
non ideal behaviour. This calibration can be online, and out of the digital core in an area-efficient and power-
while normal signals are processed, or offline in a special efficient way. Although the area where pure analog is
calibration mode. This correction in turn can be done in applied will inevitably shrink to a (non-zero) minimum,
the analog domain (where typically a DA converter the requirements on analog circuits will continue to
injects a static signal in the analog circuit) or in the increase while the CMOS implementation environment
digital domain (where an error can be subtracted). Below gets worse and worse.
some examples of calibrated circuits are given. One fundamental problem for analog CMOS circuits is
This trend of calibrating is clearly observable in AD the lowering supply voltage. This problem can be tackled
converters. In pipeline ADC's amplifier non-linearities in 2 ways. Design analog circuits that operate at a low
are a major concern and in [45] background calibration voltage or design analog circuits that can withstand
was implemented to correct for these sources of higher than nominal supply voltages.
impairment. This allows the use of simple power- The first approach was popular during the past 15 years
efficient open-loop residue amplifiers, which are more where the supply dropped from 5V down to 1.2 V today.
compatible with modern CMOS technologies. Many new circuit techniques have been developed
ADCs can even be calibrated on line in background, with recently, for example the switched opamp technique [48]
a calibrated auxiliary ADC. In [46] a pipelined analog- where switches in switched capacitor are moved from the
to-digital converter (ADC) is calibrated in background signal path to the supply path, where they need less gate
using an algorithmic ADC, which is itself calibrated in drive. Recently a similar approach has been
foreground. The calibration overcomes the circuit non- demonstrated for Gilbert type of mixers [49]
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Proceedings of ESSCIRC, Grenoble, France, 2005
Despite all the research effort, today the bare minimum Wrap up
supply for an analog circuit seems to be VGS+VDSSAT+ In the past decades, much functionality shifted from the
vswing, where vswing is the signal swing. If still enough (traditional) analog domain to the digital domain because
SNR is needed then the noise has to be lowered. This can of (area and power) efficiency reasons. Apart from this
simply be done via impedance level scaling, and the shift, there is also a clear trend towards mixing analog
result is that 10dB less noise will result in 10 times more and digital. In the near future high-performance digital
power consumption (for the same supply voltage, blocks include analog sensory and control systems, while
SINAD, bandwidth, etc). analog circuits tend to include more and more digital
Thermal noise can even be cancelled [50] but also at the compensation and control.
cost of power dissipation. 1/f noise is a major concern as
well since the corner frequency, where thermal noise controlled:
dominates the 1/f noise seems to be proportional to ft in a analog digital
given technology. So since ft is usually chosen high, to
benefit from the bandwidth, 1/f noise will be large as adaptive clock
well. Chopping and double correlated sampling can adaptive supply voltage
remove 1/f noise for low frequency application. measure temperature
digital
Switched bias technique can reduce the intrinsic 1/f noise measure local variations
of transistors [51] decrease local noise redundancy
The second approach is to design circuits that can multi-level I/O parity bit
withstand higher than nominal supply voltages. This is on-chip modems ECC
usually done via stacking of transistors while taking care
function:
that each transistor does not breakdown, including during
transients and startup.
These circuits at higher supply were first found in chopping digital calibration
interfacing drivers [40] and later in (RF) PAs [52,53], but switched circuits pre-distortion
nowadays also normal "internal" analog circuits need to switched bias post-processing
analog
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