CompleteEASE 6 Manual
CompleteEASE 6 Manual
6
Software Manual
J.A. Woollam
©2004–2020 J.A. Woollam Co., Inc. All Rights Reserved.
Phone: 1.402.477.7501
Fax: 1.402.477.8214
www.jawoollam.com
[email protected]
[email protected]
[email protected]
[email protected]
Trademarks
J.A. Woollam, CompleteEASE, M-2000, RC2, alpha-SE, WVASE, VASE, Gen-Osc, and Global Fit are registered trademarks
of J.A. Woollam. All other trademarks used within are the property of their respective owners.
Contents
1. Introduction 1-1
1.1. Manual Overview ..................................................................................................... 1-1
1.2. Conventions Used in this Manual ............................................................................. 1-3
Tabs .......................................................................................................................... 1-4
Panels ....................................................................................................................... 1-4
Buttons ..................................................................................................................... 1-4
Commands ................................................................................................................ 1-4
Mouse-Selected Menus ............................................................................................ 1-5
Pipeline Descriptions ................................................................................................ 1-6
1.3. File Structure and File Types .................................................................................... 1-7
COMMON Location .................................................................................................. 1-8
File Types .................................................................................................................. 1-8
1.4. File Dialog ................................................................................................................. 1-9
Recent ....................................................................................................................... 1-9
Projects ................................................................................................................... 1-11
Library ..................................................................................................................... 1-13
Opening Files from Windows Explorer ................................................................... 1-14
1.5. Multiple Users ........................................................................................................ 1-14
1.6. Shortcut Guide........................................................................................................ 1-18
1.7. What is Spectroscopic Ellipsometry?...................................................................... 1-20
Thank you for purchasing a J.A. Woollam Spectroscopic Ellipsometer (SE) system.
We hope the information contained in this manual will help you develop a better
understanding and appreciation for data analysis using CompleteEASE.
Chapter 1: Introduction
Chapter 1 will introduce you to CompleteEASE. It contains conventions used in this
manual, information on file structure and file types, how to configure
CompleteEASE for multiple users, a list of shortcuts, and a brief introduction to
spectroscopic ellipsometry.
To help you navigate this manual, the following conventions will be followed to
describe features in CompleteEASE.
Panels
Within each tab, there are screen areas referred to as panels. From the
Measurement tab shown in Figure 1-1, the panels include System Status,
Measurement Controls, and Fit Results. Throughout this manual, panels will be
written in bold, blue text.
Buttons
Figure 1-2 shows an example Hardware tab for CompleteEASE. The figure below
has six panels: Hardware Status, Controls, Alignment, Other, Routine Test
Measurement, and System Information. Within panels are various buttons.
Buttons will be designated with single quote marks, such as ‘Align Sample’ and
‘Display Signal'.
Commands
Figure 1-3 shows an example Analysis tab. Within the Analysis tab, there are Data,
Fit, and Model panels. The Model panel includes many choices – some of which are
shown in bold, underlined, red letters. Within this manual, they will also be shown
in bold, underlined, red letters such as Add, Delete, and Save. Model details are
further divided into expandable sections, shown in bold letters preceded by a red +
or - symbol. The symbol preceding the text is interactive and shows whether the
section is collapsed (+) or expanded (-). These sections will be listed using bold text
with a red + symbol: +MODEL Options, +FIT Options, and +OTHER Options.
Mouse-Selected Menus
CompleteEASE also utilizes both mouse buttons to access additional menus and
features. Throughout this manual, if you need to select the right or left mouse
button, you may see the following symbols: (R) or (L), respectively. Figure 1-4
shows the menu that appears when the right mouse button (R) is clicked within
the Fit results box.
Pipeline Descriptions
The descriptions used in above sections can be “pipelined” to form a concise
description of software features or menus. In this case, the description will take on
a form like:
Tab > Panel > ‘Button’
For example, the ‘Open’ button within the Model panel under the Analysis tab is
conveniently described as:
Analysis > Model > ‘Open’
As another example, the command to right-click the mouse within the Fit Panel
from the Analysis tab and then choose the “Add to Fit Log” menu choice would
read as follows:
Analysis > Fit > (R) > ‘Add to Fit Log’
Table 1-1 provides more details about each of these subdirectories and their
function within CompleteEASE.
DIRECTORY FUNCTION
cnf Hardware configuration files
DAT COMMON data files, including a sub-folder of Examples that
are included with CompleteEASE. Data files saved in this
directory can be viewed and opened by all users.
HTML Files and graphs used by CompleteEASE to construct reports
Clipboard within the HTML clipboard.
jar Java application files
MAT COMMON material files to describe optical constants of
materials. This folder is divided into Advanced, Basic,
Dielectric, Metal, and Semiconductor folders. Files within
this directory can be viewed and opened by all users but are
read-only.
MOD COMMON model files to describe a sample and the
associated analysis strategy. COMMON snapshots are also
saved here. This folder is divided into Advance, Basic, and
Calibration Wafers.
Recipe COMMON recipe files describe a complete measurement
and model strategy. Recipes are not used with alpha-SE
systems.
COMMON Location
As indicated in Table 1-1, CompleteEASE uses these folders as a COMMON location
for data, material, model, and recipe files which are accessible to all users. The
DAT, MAT, and MOD folders are also accessible for all recipes. For CompleteEASE
to locate material or model files associated with a recipe, it must be in the same
folder as the recipe or in the respective COMMON folder.
The location of these COMMON folders is as follows:
C:\CompleteEASE\DAT
C:\CompleteEASE\MAT
C:\CompleteEASE\MOD
C:\CompleteEASE\recipe
File Types
There are many different file types used within CompleteEASE. Table 1-2 provides a
list of different file types and their corresponding file extensions.
Table 1-2. List of File Types used by CompleteEASE and their corresponding extensions.
The tab you select from this dialog box (Recent, Projects, Library) will remain
“sticky” for each file type. For example, if the Library tab was last selected in the
Open Model dialog, that tab will remain selected the next time the Open Model
dialog is shown.
In addition, the selected project will also remain “sticky” for each file type. For
example, if the “research” folder shown above is selected in the Open Model dialog,
then it will be selected when this dialog box is shown next. This allows you to return
quickly to the same location again and again when working on the same project.
Each tab is described in more detail in the sections below.
Recent
Each of the file dialog boxes used for opening or saving files contains a “Recent” tab
which enables you to quickly find files and folders you have recently worked in.
CompleteEASE auto-populates the list of recent folders. This list excludes
COMMON files, as these are always available from the Projects or Library tabs. You
can add folders to this list using drag-and-drop from Windows Explorer.
First in the recent list is a blue folder for “Recently Opened Files”. This is
convenient when working with files across multiple directories.
Figure 1-8. Right-click on a Folder in the “Recent” list to Add that folder to the Projects list or
to Clear the Recent Folders list.
Projects
The Projects tab is not auto-populated by CompleteEASE. This tab can be used to
create a list of folders relevant to you, which is custom to each user (based on
login). Folders can be located anywhere on the computer or remote network drive
and will be shown together in a single list in this tab. The COMMON folder is always
included here and is accessible to all users.
Folders can be added to the Projects tab by:
• Adding from Recent tab (see Add to Projects List section above)
• Drag-and-drop from Windows Explorer
• ‘Add Folder Link’ button (see Add Folder Link section below)
Folders in the Projects tab can be expanded to show subfolders up to three levels
deep.
Figure 1-11. Right-click on a Folder in the “Projects” list to remove that folder from the list or
to create subfolders within that Project folder.
Figure 1-12. “Add Folder Link” opens global file dialog to search for a Folder to add to the
Projects list.
The Library tab is disabled when saving files, as it is not intended for you to add
additional files into these read-only locations. However, additional folders can be
created in Windows Explorer and populated with special files that you may choose
to archive and wish to prevent other users from changing (as they will be read-only
files and folders). For example, five additional folders shown in Figure 1-14 were
added into the C:\CompletEASE\MOD location using Windows Explorer prior to
launching CompleteEASE. These folders are read-only, and no files can be added
into these folders from within CompleteEASE. Files can still be added or deleted
from Windows Explorer.
From the CompleteEASE Configuration window, expand the General section, scroll
to “User Log-In Mode = ” . Change User Log-In Mode to “Must Log In”, as shown in
Figure 1-17.
Next, scroll to “Users Have Own Folders List = ” and check the box to turn this
parameter ON.
Optionally, you can decide whether to have all CompleteEASE folders visible to all
users by changing the “Always Add CE Folder” to True (Parameter ON) or False
(Parameter OFF). With this ON, all folders within the CompleteEASE directory on
your computer will show up for all users.
After configuring CompleteEASE for multiple users, you will want to set up each
User with their own account. Click Options > Miscellaneous > ‘Manage Users’ and
the User Management box will appear.
From the User Management window, click ‘Add New User’ and type in the name
and password for each user you wish to add.
NOTE: If the password area is left blank, no password will be required to log-in.
When CompleteEASE is restarted, it will open by asking for User Name and
Password. User names will be available from a drop-down list.
Any folders that are added by an individual user will now be shown for their
account only. Folders within the CompleteEASE directory will be shown for all users
if “Always Show CE Folders” is configured ON. CompleteEASE COMMON folders will
be shown for all users.
SHORTCUT FUNCTION
CTRL+M Go to Measurement Tab
CTRL+A Go to Analysis Tab
CTRL+H Go to Hardware Tab
CTRL+O Go to Options Tab
CTRL+U Go to In-situ Tab
CTRL+P Graph the Psi data curves
CTRL+D Graph the Delta data curves
CTRL+N Graph the “N” data curves (N,C,S format)
CTRL+C Graph the “C” data curves (N,C,S format)
CTRL+S Graph the “S” data curves (N,C,S format)
CTRL+1 Graph the <e1> data curves
CTRL+2 Graph the <e2> data curves
CTRL+I Graph the Intensity data
CTRL+Z Graph the Depolarization data
If you are working with Uniformity Mapping data, the shortcuts in Table 1-4 can
help manipulate the data and graphs.
SHORTCUT FUNCTION
CTRL+Click on Point Select/Un-select Point
CTRL+ALT+Click on Point Delete Point
CTRL+ALT+SHIFT+Click on Point Show camera image from point (when
available)
CTRL+space bar Switch view from single point to map
Finally, when working with in-situ data or multi-sample analysis, there are
additional shortcuts to help quickly switch between different data sets and models,
as shown in Table 1-5.
SHORTCUT FUNCTION
CTRL+(F1, F2, F3...) Switch between models 1, 2, 3...
ALT+(1,2,3...) Switch between data sets 1, 2, 3...
Equation 1-1
𝑟̃p
tan Ψ ⋅ eiΔ = ρ̃ =
𝑟̃s
In this equation, rho (𝜌̃) is defined as the ratio of the complex reflection coefficient
for p-polarized light (𝑟̃p , polarized parallel to the plan of incidence) divided by the
complex reflection coefficient for s-polarized light (𝑟̃s , polarized perpendicular to the
plane of incidence). ρ̃ is a complex number, and the ellipsometric parameters
simply report this value in polar form: tan() is the magnitude of the reflectivity
ratio, and is the phase. Ellipsometry offers three main advantages over simple
intensity-based reflection or transmission measurements:
1. Precision As the change in polarization state is defined by a ratio,
ellipsometry is not sensitive to changes in the absolute intensity of
the measurement beam (i.e., the sample itself is the ‘reference’ for
the measurement). Thus, it can remain accurate without knowing
“absolute” intensity values.
2. Sensitivity The phase information contained in the ellipsometric
parameter provides enhanced sensitivity to ultra-thin films, even
down to the sub-nanometer thickness level.
3. Information Ellipsometry measures two values (Psi and Delta) at
each wavelength, doubling the information content compared to
an intensity reflection or transmission measurement.
The high accuracy, precision, and sensitivity of the ellipsometric measurement
make it highly suited for demanding thin-film metrology applications.
1. linearly polarized light ...
E p-plane
plane of incidence
The first step in any ellipsometry experiment is acquisition of data from the sample
with the ellipsometer. Details for data acquisition depend on the ellipsometer type
and configuration. This chapter provides a brief overview of data acquisition with
CompleteEASE. More details are provided in Chapter 8, which lists all features of
the Measurement Tab, and in the corresponding hardware manual for your system,
which can be found by pressing the F2 key on the instrument computer while
CompleteEASE is running.
NOTE: Instructions in this chapter are representative of various systems. For more
complete instructions, including details on system alignment and calibration, please
consult your hardware manual.
Figure 2-1. Measurement tab for alpha-SE systems. The camera accessory is optional and
may not be available on your system.
The Measurement Controls panel contains all options for measurement. For an
alpha-SE, you must specify measurement mode, type of sample alignment,
measurement angles, model for analysis (optional), and “Save Data after
Measurement”, if desired. “Mode”, “Sample Alignment”, and “Model” are selected
from a drop-down menu, as shown in Figure 2-2.
For most measurements, “Standard” Mode and “Standard” Sample Alignment are
adequate. A Model can be developed and applied later if not available at time of
measurement.
Once the Measurement Controls options are set, click ‘Measure’ to begin.
CompleteEASE will prompt you to change angle if needed. The alpha-SE will
automatically align the z-height according to the selected Sample Alignment option
and then acquire data according to the selected Mode. Finally, if a Model was
selected, the data will be analyzed to determine the resulting film properties.
Figure 2-3. Clicking ‘Measure’ will start the data acquisition procedure. The System Status
will be updated to show the current hardware operation.
If the “Save Data after Measurement” checkbox was selected, a dialog box will
appear, as shown in Figure 2-4. Navigate to the desired location, enter a File Name
and Comment (optional), and click ‘Save’. See Section 1.4 for details regarding the
CompleteEASE File Dialog.
NOTE: CompleteEASE data files are encrypted and saved with “.SE” or “.iSE”
extensions. These files are only accessible by CompleteEASE.
Figure 2-5. Successful measurement of thin oxide film using an alpha-SE system.
Figure 2-6. Measurement tab for an M-2000 system with automated angle of incidence,
automated sample alignment, automated sample translation, focusing optics, and an
integrated camera.
Recipes
Each Recipe contains three basic components of data acquisition:
1) Acquisition Parameters
2) Scan Pattern (if applicable)
3) Model (optional)
These options are shown in Figure 2-7 and more details are provided in the
following sections.
Acquisition Parameters
Acquisition parameters describe how the data will be collected at each location. A
typical acquisition parameters setup dialog box is shown in Figure 2-11. The
options available will depend on your system configuration. Only basic details are
provided in this chapter. Please see Chapter 8 and consult your hardware manual
for more details.
Data Type
“Data Type” options are shown in Figure 2-12. For most applications, “Standard”
will be appropriate.
Acq. Time
This box sets the averaging time. For most samples, 1 to 5 seconds will yield good
data. Low reflectivity samples may require longer averaging than high reflectivity
samples.
Angle Scan
This selection sets the angle(s) of incidence to be used during measurement. For
most applications, two to three angles between 50° and 75° are recommended.
NOTE: The following settings will work well for many applications: Data Type =
Standard, Acq. Time = 3, Angle Scan = 55 to 75 by 10.
Sample tilt alignment is often skipped when using focusing probes, as a focused
beam is less sensitive to sample tilt. It can also be skipped for applications where
common samples are measured that remain flat. For example, if a system is
continually used to measure 200mm silicon wafers, the tilt of each wafer will
probably be very similar from sample-to-sample.
For manual or automatic sample tilt alignment, the system will study the reflection
of a light beam off the sample that is incident on a four-quadrant detector or
camera. An example of the tilt alignment screen for a system with automatic four-
quadrant detector tilt alignment is shown in Figure 2-14.
Figure 2-17. Choose ‘Edit/Create’ Scan Pattern from the Choose Recipe Components dialog
box.
The Scan Patter Editor, shown in Figure 2-18, allows you to describe both circular
and rectangular samples. There are many options to automatically fill-in the points
to measure, including ‘Cartesian Grid Fill’, ‘Polar Grid Fill’, and ‘Line Fill’. Most of
these selections are intuitive and best learned by testing each button a few times.
Figure 2-19. From Analysis>Model>‘Open Model’, choose the Library tab, “Basic” folder on
the left to access several prebuilt models for glass or silicon substrates.
For maps of multiple points, the graph can be toggled to display parameters for all
completed locations by clicking Measurement > Fit Results > ‘Graph Parms’.
Parameters can be selected from a drop-down list above the graph, as shown in
Figure 2-21.
When the recipe is finished, a table of results will be displayed in the Fit Results
panel, as shown in Figure 2-22.
If “Save Data after Measurement” was selected prior to starting the recipe, results
of the analysis are saved with the measurement data and can be accessed at any
time by clicking Measurement > Fit Results > ‘View Prev. Results’. Choose the file
location and file to display a tabulated list of results. Click ‘Graph Data’ from this
window to select parameters to graph. See Figure 2-23 and Figure 2-24.
The best way to learn software features and data analysis is through a series of real-
world examples where you can follow along. To this end, we have developed
examples that spread over multiple chapters to teach common data analysis
procedures in CompleteEASE. Following this tutorial is instructive for beginner and
expert users. This chapter begins with basic data analysis examples. Here, we
concentrate on thin films that are transparent. Chapter 4 continues with
intermediate concepts, concentrating on absorbing materials and the extra
difficulties involved with their characterization. Chapter 5 introduces a few
advanced topics such as multi-sample analysis and anisotropic materials. Finally,
Chapter 6 introduces in-situ data analysis methods.
The section examples from this chapter are listed below, along with the primary
CompleteEASE features that are discussed.
The above steps will be described in more detail in subsequent sections. Keep in
mind that while the basic SE data analysis approach is straightforward, “real-world”
samples can often be difficult to analyze. CompleteEASE is designed to simplify
common SE data analysis procedures which work for many types of samples, but
there is no substitute for experience when dealing with complex samples. Please
contact your J.A. Woollam representative if you require assistance.
t2 n,k (film 2)
t1 n,k (film 1)
n,k (substrate)
Figure 3-2. Schematic representation of a layered optical model with two films,
parameterized by thicknesses t1 and t2, and optical constants n & k.
(a)
(b)
Figure 3-3. Layered optical model in CompleteEASE with model-generated data: (a) the
model-generated data (black dashed lines) are not in agreement with the measured SE data
(colored curves); (b) when the top layer thickness is adjusted appropriately, the model-
generated data lies directly on the measured data.
(a) (b)
Figure 3-4. Schematic of: (a) physical surface roughness; (b) optical model of surface
roughness.
Grading
Another common non-ideality is that the optical properties of real samples are not
constant through layer depth. This may be caused by process variations during the
film deposition. CompleteEASE models these variations, called gradients, by
dividing the layer into smaller sublayers, with each sublayer having slightly different
optical properties, as shown in Figure 3-5.
(a) (b)
Figure 3-5. Schematic of: (a) continuous variation in the optical properties of a graded film,
(b) CompleteEASE approximation of a graded film with discrete layers.
Anisotropy
Some materials have different optical properties depending on polarization and
propagation direction of the light beam. This is called anisotropy, which is a broad
topic that is not covered fully in this section. Anisotropy can be uniaxial (where nx =
ny ≠ nz) or biaxial (where nx ≠ ny ≠ nz).
nx
ny nz
Figure 3-6. Anisotropic materials have different values for nx, ny, and/or nz.
Equation 3-1
n N
2 2 2
1 − N Gi CEi − CGi S Ei − SGi
MSENCS = Ei
3n − m i =1 .001
+ +
.001 .001
where “n” is the number of wavelengths, “m” is the number of fit parameters,
N=cos(2), C=sin(2)cos(), and S=sin(2)sin().
“MSE” is an acronym for Mean Squared Error. The definition given in Equation 3-1
is more accurately termed “Root Mean Squared Error” (as the error summation is
divided by the number of measurement points minus the number of fit parameters,
and the square root is taken). However, for historical reasons, we still use the term
“MSE” to quantify the goodness of fit.
Basically, the MSE sums, over all the measurement wavelengths, the differences
between the measured data (parameters subscripted with “E”) and model-
generated data (parameters subscripted with “G”). In CompleteEASE, the
difference between the measured and model-generated data is calculated in terms
of the “N”, “C”, and “S” parameters, which are derived from the ellipsometric Psi
() and Delta () parameters. The N, C, & S parameters have the following
properties which make them better suited for the MSE definition (compared to
using and ):
1. N, C, & S are always bounded between -1.0 and 1.0.
2. The rotating compensator ellipsometer configuration measures data with
approximately the same precision and accuracy in N, C, & S on any sample.
The N, C, & S parameters for the current data set in CompleteEASE can be graphed
by selecting N, C, or S from the “+Data” menu above the graph, as shown in Figure
3-7.
Figure 3-7. Select N, C, or S option from the +Data menu to display corresponding data.
“Fitting” Data
To obtain the best agreement between the model-generated and experimentally
measured data (or in other words, to achieve the lowest MSE), parameters of the
optical model must be adjusted, and you must define which model parameters
should be adjusted. These adjustable parameters are also called fit parameters,
and they typically consist of layer thicknesses and parameters which define the
optical properties of the layers. CompleteEASE uses a standard, iterative, non-
linear regression algorithm (the Levenberg-Marquardt method) to automatically
minimize the MSE by adjusting the fit parameters. The Levenberg-Marquardt
method does an excellent job of quickly converging to the best (lowest) MSE value
if: 1) the optical model accurately represents the sample and 2) the initial starting
values for the fit parameters are reasonably close to their correct (best fit) values.
To help ensure that the best fit model is found, CompleteEASE includes the
following powerful features:
• “Try Alternate Models”: this command automatically fits the data using
the ideal layered optical model, then with surface roughness, index
grading, and simple anisotropy. The results of the various model fits are
summarized in tabulated format, and a suggestion is given for which model
is most appropriate for the sample.
• “Thickness Pre-Fit” and “Global Fit”: these options perform a large
number of trial fits to the data set, using a wide range of initial starting
values for selected fit parameters to find the best fit model.
These features will be demonstrated in data analysis examples presented later in
this chapter.
A. Index (n) must increase toward shorter wavelengths when the material is
transparent (k=0).
Figure 3-8. Index must increase toward shorter wavelengths if k=0. These optical
constants are physical as they obey this rule.
Figure 3-9. Index must increase toward shorter wavelengths if k=0. These optical
constants are not physical because n is decreasing below 600nm without any
absorption (k=0).
Figure 3-10. Index will turn over and decrease toward shorter wavelengths when
material becomes absorbing (k increases toward shorter wavelengths). These
optical constants are physical as they obey this rule.
Figure 3-11. The graphed optical constants are physically plausible, as the index is
increasing for wavelengths above 400nm (where k=0), decreasing when absorption
becomes larger (near 350nm), and then returns to increasing toward shorter
wavelengths when the absorption decreases (below 320nm).
Figure 3-12. The graphed optical constants are unphysical because the extinction
coefficient, k, is negative at the longer wavelengths.
Evaluating the fit results is an important part of SE data analysis. As examples are
presented in the following sections, comments related to evaluation of fit results
will be highlighted yellow.
Shortcut: After opening the specified model and data files, the CompleteEASE screen should
appear as shown in Figure 3-15. Note the experimentally measured SE data (the
CTRL+Y to turn double-Y
ellipsometric Psi and Delta parameters versus wavelength) appear in the graph
axis on or off as needed
panel as red and green curves, and the optical model contains a substrate
(SI_JAW) and two layers (INTR_JAW and SIO2_JAW).
Figure 3-15. CompleteEASE screen after opening the “Si with Thermal Oxide” model and the
“25nm SiO2 on Si” example data.
For more practice, use the “Si with Thermal Oxide” model to determine the total
film thickness for each SiO2 on Si example file: “60nm SiO2 on Si”, “500nm SiO2 on
Si”, and “1000nm SiO2 on Si ”. Open each data file (Analysis > Data > ‘Open’) and
click ‘Fit’; the results should agree with the values shown in Table 3-1. There are a
few important trends to note in this table:
1. The MSE increases with thicker films (from ~1 to >10), though all data fits
are visually good (i.e. black dashed model curves lie on red/green
experimental curves).
2. The reported “Total Thickness” values do not agree exactly with
thicknesses given in the file names (this is acceptable, as the file names are
only nominal film thickness values).
The J.A. Woollam “Si with Thermal Oxide” optical model supplied with
CompleteEASE has several unique features which will be described in the following
sections.
1
C.M. Herzinger, B. Johs, W.A. McGahan, J.A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon
and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation”, J. Appl. Phys. 83 (1998) 3323.
Derived Parameters
The “Total Thickness” in the “Si with Thermal Oxide” model is not an actual fit
parameter, as the value is derived by summing all layer thicknesses in the model.
Derived parameters can be added to the results by expanding Model > +FIT Options
and turning the “Include Derived Parameters” option ON (Figure 3-18). In addition
to “Total Thickness”, additional derived parameters include n and k values for a
specified layer and wavelength, optical thickness, total optical thickness, and many
other possibilities. These will be addressed further in a later example.
If you wish to delete a Derived Parameter, simply right-click on the number (shown
in blue) next to the parameter you wish to delete.
NOTE: The “Total Thickness” parameter error bar is simply the error bar of the top-
most layer’s thickness error bar (if the top-most layer’s thickness is turned on as a
fit parameter; if not, it takes the highest layer whose thicknesses is a fit parameter).
Figure 3-19. Fit parameter dialogs, showing how to (a) “Hide” or (b) “Rename” fit parameters. Low
and High Specs for the parameter are also set in (b).
Angle Offset
In the “Si with Thermal Oxide” model, “Angle Offset” is also defined as a fit
parameter located within +MODEL Options, as shown in Figure 3-21. The “Angle
Offset” is added to the nominal angle of incidence in the optical model calculation.
For most analyses (and especially when fitting for optical constants) it is best to
leave the Angle Offset fixed at 0. However, since Si and SiO2 optical constants are
so well known and there is only one additional fit parameter in the model
(Thickness #2), fitting the “Angle Offset” can slightly improve the SiO2 thickness
result by compensating for small sample alignment errors. The best sensitivity to
angle of incidence occurs for thin layers (<100nm), and we generally only
recommend fitting for this value when measuring the calibration wafer supplied
with the ellipsometer.
Thickness Pre-Fit
One further concept will be demonstrated using the “Si with Thermal Oxide”
model. For this example, reload both the “Si with Thermal Oxide” model and the
Thickness Pre-Fit quickly
“1000nm SiO2 on Si” example data file. From the Model > +FIT Options section,
finds good starting
turn the “Perform Thickness Pre-Fit” option to “OFF” by clicking on the underlined
values for the thickest
blue value.
layer in the sample
stack. Click Fit > ‘Generate’. The screen should appear as shown in Figure 3-22. Note
that the data generated by the model (black dashed curves) using the default
thickness (100nm) has roughly one oscillation while the experimental data has
many oscillations.
Now click Fit > ‘Fit’. The result is shown in Figure 3-23. CompleteEASE fails to find a
good match to the data. The MSE is very high and model curves do not match
experimental curves. The results are meaningless. This illustrates what happens if
you start the fit with parameter values that are not reasonably close to the true or
best fit values.
Figure 3-23. Fit result with starting thickness = 100nm and Thickness Pre-Fit OFF.
Now, set “Thickness #2” to “1000” and “Angle Offset” to “0” (by clicking on the
respective parameter values). Click Fit > ‘Generate’. The screen should appear as in
Figure 3-24. While the model and experimental data curves do not line up exactly
(slight shift), at least the basic structure and features in the data sets appear similar.
Figure 3-24. “1000nm SiO2 on Si” example with model data generated using a closer
(1000nm) starting thickness value.
Now click Fit > ‘Fit’. The result is shown in Figure 3-25. Because the starting value
was sufficiently close to the real value, CompleteEASE found a good match to the
data. MSE is reasonable and model curves visually match experimental curves. The
results are now meaningful.
Evaluation of fit result: Model curves match experimental curves. Reasonable MSE.
Thickness result is believable based on nominal value.
A good starting value for “Thickness #2” is critical to achieve the best data fit.
Without the Thickness Pre-Fit, CompleteEASE tries to adjust the fit parameter
(thickness) to lower the MSE. However, the MSE profile is not a single minimum at
the correct thickness. It also contains many other minima, which are called local
minima. These local minima can trap the normal fit process. Each of these local
minima are at a much larger MSE value, as shown in Figure 3-26, so it is easy to
distinguish the correct answer from a thickness result that does NOT match the
experimental curves. However, it is tedious to guess starting film thickness values
for all samples.
NOTE: Films thicker than 1-2 microns are more susceptible to the model getting
trapped in local minima.
The “Thickness Pre-Fit” option automatically provides a good starting value for the
thickest layer in the model, using a proprietary algorithm. To demonstrate this
feature, turn the “Perform Thickness Pre-Fit” option back to “ON”. Input a “bad”
starting value for the “Thickness #2” parameter, for example “50”. Click ‘Generate’
to verify that the model starting parameters are not close to the best fit. Now
when you click the ‘Fit’ button, a good data fit appears on the screen, even though
the initial thickness value (50nm) was not close to the final best fit value (1029.65
nm). For most analysis, it is useful to have the “Perform Thickness Pre-Fit” option
turned “ON”, especially if accurate starting thickness values are not known.
To better understand the Thickness Pre-Fit, consider that the data will oscillate
versus wavelength as the film becomes thicker due to interference between
reflected light from the surface and bottom of a thin film. As thickness increases,
more oscillations will occur versus wavelength. This is not independent of the
refractive index, but the underlying principle is that a larger “optical thickness” will
have more oscillations. The Thickness Pre-Fit works by quickly interpreting the data
oscillations to “estimate” the actual thickness, as illustrated in Figure 3-27. Often,
this fast calculation is adequate to get a good starting point for the normal fit
procedures.
The next set of examples will demonstrate how to determine the film thickness and
index of refraction “n” for transparent films deposited on substrates with known
optical constants. While there are certainly cases in which it is not known in
advance if the film is transparent (absorbing films are discussed in the following
chapter), there are also many applications where the film can be assumed
transparent, at least in the visible spectral range: optical coating materials (SiO 2,
TiO2, Ta2O5, MgF2 etc.), some nitrides (Si3N4, AlN), many organic films (photoresists,
PMMA, spin-on polymers, etc.), and so on. In addition, the presence of periodic
The index of refraction dispersion for transparent films in the visible spectral range
is often modeled by the Cauchy dispersion equation (Equation 3-2). The A
parameter relates to the approximate amplitude for the material index, while the B
and C parameters provide the magnitude of curvature of the index versus
wavelength. Figure 3-30 shows index dispersion curves for three common
transparent materials. In a transparent region, the Kramers-Kronig relations imply
that index must curve upward toward shorter wavelengths, a behavior which is well
described by the Cauchy dispersion equation (Figure 3-31).
Equation 3-2
B C
n ( ) = A + +
2
4
Figure 3-31. Simulated index curves for Cauchy parameters displayed in graph legend.
Evaluation of fit result: Model curves do not match experimental curves as well as
we expect for a simple structure. MSE is high. Angle Offset is too high and unlikely
real.
PECVD SiO2 is optically like thermal SiO2 but with slightly different refractive index.
Thus, a different optical model with more flexibility regarding the film refractive
index is required. To determine the index and thickness of the PECVD SiO2, open
the “Si with Transparent Film” model from the same location (see Figure 3-33).
After opening, click ‘Fit’. The result is significantly improved with better visual
agreement between model and experimental curves and lower MSE (~22) (see
Figure 3-34).
Figure 3-34. “PECVD SiO2 on Si” data fit using “Si with Transparent Film” model – acceptable
fit quality.
Figure 3-35. To view a layer’s optical constants, right-click the layer name and choose to
“Graph Layer Optical Constants”.
Figure 3-36. You can also expand the +Model menu above graph to display optical constants.
To display and edit the Cauchy parameters, click the red “+” symbol to the left of
“Layer #1” to expand layer details. With the layer expanded, the Cauchy fit
parameters are now accessible, as shown in Figure 3-37.
NOTE: The “+Urbach Absorption Parameters” subsection within the Cauchy layer
can be used to add an exponential “Urbach” absorption tail to this otherwise
transparent layer. This is not required for this example. The Cauchy layer is
described in further detail in Section 10.2.
Global Fit
Like the “Si with Thermal Oxide” model, the “Si with Transparent Film” model uses
the Thickness Pre-Fit option to provide a good starting value for the layer thickness.
To provide starting values for the film index, a “Global Fit” is also performed. In a
Global Fit, a user-defined range of values and number of guesses within this range
for a specified fit parameter are used as starting values for a normal fit. The value
which yields the lowest MSE becomes the starting value for the “final” fit.
Figure 3-38. Settings for the “Si with Transparent Film” model; note the “Use Global Fit” and
“Include Derived Parameters” sections.
In the “Si with Transparent Film” model, the Cauchy A parameter (which is the
approximate index at long wavelengths) is defined as a Global Fit parameter. Min.
and max. values are set to 1.2 and 4.5, respectively, and the # of Guesses is set to
45. This means that CompleteEASE performs 45 trial fits with different starting
values for A, distributed in equal increments between 1.2 and 4.5. At each trial fit,
the Thickness Pre-Fit is also performed. The lowest MSE from these trial fits
determines the starting values for thickness and the Cauchy A parameter. A final fit
is then performed with these starting values to arrive at a “final” result (subject to
evaluation as described in Section 3.1). Min., Max., and # Guesses can be adjusted
if needed.
If more than one global fit parameter is defined, a grid of test values is created with
the total number of guesses being the product of the individual guesses for each fit
parameter. Depending on the total number of guesses, the Global Fit procedure
can be computation intensive. If the total number of guesses is small, you may not
notice a significant difference in the time it takes to arrive at a “final” result. If the
total number of guesses is large, the process may take several seconds or longer,
and a status box with a ‘Stop’ button will be displayed as shown in Figure 3-39.
The Global Fit can be further customized (expand “+Customize Global Fit”
subsection). To minimize computational time, only a subset of the experimental
data points is used during trial fits (“# of Data Points”). The # of Iterations used in
each trial fit can also be limited. Default values for these options are 20 and 5,
respectively, which are adequate for most samples but can be increased if
necessary. Larger values may improve the robustness of the Global Fit but will
increase analysis time. More details regarding Global Fit customization can be
found in Section 9.7.
Figure 3-41. Fit results for “PECVD SiO2 on Si” example data with “Si with Transparent Film”
model.
You can right-click on any layer and choose “Rename Layer & Fit Parameters”, as
shown in Figure 3-42.
Figure 3-42. Right-click on a layer and choose “Rename Layer and Fit Parameters”.
The “Rename Layer Options” dialog box will appear, as shown in Figure 3-43. You
can enter a new name and use the checkboxes to determine which elements of the
layer will be renamed:
• “Rename Layer” will change the displayed layer name in the model and
other references to the layer name.
• “Rename Layer Parameters” will append the layer name to the layer
parameters.
• “Rename Thickness” will specify thickness according to the layer name
rather than the layer number.
Click ‘Ok’ to apply changes and refit the data to update results displayed in the Fit
panel (Figure 3-44).
In the previous section, we introduced the Cauchy equation to describe the index of
refraction for transparent films. The Cauchy equation can also be applied to
transparent substrates. This is the most common approach for glass or plastic
substrates. In this section, we will use the prebuilt “Glass Substrate” model which
utilizes the Cauchy layer to determine the index for glass substrates.
Figure 3-45. Backside reflections of transparent substrates can be avoided by roughening the
back surface or using index-matching tape to scatter the reflected light.
If the backside reflections cannot be avoided, then they must be included in the
software calculation. This will be demonstrated with the following example.
Depolarization data can be used to check for evidence of backside reflections in the
measured data. If the depolarization is essentially zero, then no backside
reflections reached the detector. This is the preferred condition. If backside
2 R.A. Synowicki, “Suppression of Backside Reflections from Transparent Substrates”, Phys. Stat. Sol. (c) 5, No. 5 (2008) 1085-1088.
Figure 3-46. Right-click on ‘Open’ button to access the “Append Data” option.
NOTE: While you can only OPEN one file at a time, you can APPEND multiple files
simultaneously.
Shortcut: When multiple data sets are open, new menus appear above the graph, as shown
in Figure 3-47. Check the “Graph All Data Sets” box (and turn OFF double Y axis, if
CTRL+Y to turn double Y
applicable) to compare Psi for each data set. In Figure 3-48, “glass
axis ON or OFF
substrate_smooth” is data set #2 with dark blue curves. This data set is from a
glass slide with normal, polished backside, and backside reflections are expected
and present in the data. Notice the shift around 300 nm compared to data sets #1
and #3, where backside reflections have been eliminated or suppressed via
roughening and tape, respectively. Below 300 nm, the glass is absorbing and light
doesn’t reach the backside or reflections from the back surface are absorbed
Figure 3-48. Check “Graph All Data Sets” to view all data sets simultaneously.
NOTE: Before proceeding, clear the contents in the Graph Scratchpad by viewing
the Scratchpad and clicking ‘Delete All’.
Glass Substrate.mod
In a later example, we will learn how to fit multiple data sets simultaneously.
However, for this example, we will focus on fitting each individual data set. Start by
opening the “glass substrate_rough” data file. Next, open the “Glass Substrate”
model from the Basic folder (Figure 3-52). Click ‘Fit’ and you should get the result
as shown in Figure 3-53. The data appear noisy, but this is primarily due to the
graph scale.
Figure 3-53. Result for “glass substrate_rough” data with “Glass Substrate” model.
Display the optical constants of Cauchy Substrate by right-clicking this name in the
model or by selecting from the +Model menu above the graph.
Graphing Depolarization
Ellipsometry measurements use polarized light. If the sample is isotropic and ideal,
this measurement can be described by two values: Psi and Delta. However, if a
sample is partially depolarizing, two parameters are insufficient to fully describe the
change in polarization. The patented Rotating Compensator technology used in the
alpha-SE, M-2000, and RC2 systems permits measurements of three reported
quantities: , , and %depolarization. The “%depolarization” should remain zero
for ideal sample conditions.
Shortcut: To view depolarization data, expand the +Data menu above the graph and select
“Depolarization”. See Figure 3-55.
CTRL+Z to graph
Depolarization
Notice the depolarization in Figure 3-56 is near zero. (Some noise is expected and
acceptable.) This indicates that backside reflections are not detected.
Figure 3-56. Depolarization data from glass slide with backside roughened.
Shortcut: Next, open the “glass substrate_smooth” data file. Graph the depolarization
data. %Depolarization now deviates from zero increasingly with angle. This
CTRL+P to graph Psi
indicates that backside reflections are detected.
Now, graph Psi again and click ‘Generate’. See Figure 3-58. The model no longer
matches the experimental measurement even though this data is from the same
glass substrate (only now with backside reflections present in the data). The
backside reflections do more than introduce depolarization – they also shift the
ellipsometry values.
Figure 3-58. Data generated with “Glass Substrate.mod” do not match data from glass slide
with backside reflections.
Figure 3-59. Fit results for “glass substrate_smooth” data without backside reflections
included in the model.
Evaluation of fit result: Model curves do not match experimental curves. MSE is
high. “Glass Substrate.mod” does not work when backside reflections are present
in the data.
Fitting Depolarization
There can be correlation between the substrate index and the amount of backside
light collected when modeling ellipsometry data. However, depolarization data is
only influenced by the amount of backside light collected. The default setting is to
ignore the depolarization data and only fit Psi and Delta. In fact, the depolarization
fitting selection is a hidden feature of the model. To show this feature, scroll to the
bottom of the Model panel and click Configure Options. This will open the dialog
box shown in Figure 3-61. Check the box next to “Include Depolarization Data” in
the Fit Options section and then click ‘Ok’.
Figure 3-61. Click Configure Options to open the Show Model Options dialog box. Under Fit
Options section, check “Include Depolarization Data”.
Now that this option has been added to the model, it can be turned on. Expand the
+FIT Options section in the model and turn the “Include Depolarization Data” to
ON, as shown in Figure 3-62.
NOTE: For this example, we will limit the wavelength range to 375 nm and longer
to avoid absorption in the UV.
Open the “glass substrate_smooth” example data set if needed. Click the ‘Set
Ranges’ button in the Data panel to open the Select Data Range dialog box. Set the
min. wavelength to 375.
Using the “Glass Substrate (with backside reflection)” model, click Fit > ‘Fit’. Results
are shown in Figure 3-66.
Evaluation of fit result: Model curves match experimental curves, indicating that
the backside correction is effective. MSE is reasonable. However, roughness is
negative, and index has the beginnings of a downturn at the shortest wavelengths.
The model could use a few modifications.
Before we finalize the result, there are a couple of modifications we can make to
this model. It is prudent to reset the fit to restore the model to original starting
values. To do so, click Fit > ‘Reset’.
• First, as the previous result yielded a negative roughness value, let’s turn
this OFF and see if a similar fit quality can be obtained.
Figure 3-67. “Glass Substrate (with backside reflection)” model with modifications – surface
roughness OFF and C parameter set to 0 and deactivated as a fit parameter.
Now fit the data again and re-evaluate the result (Figure 3-68).
Evaluation of fit result: Model curves still match experimental curves. MSE is only
slightly higher. Index only increases with decreasing wavelength. Higher MSE is
acceptable with improved physicality of model.
NOTE: Prebuilt models are included with CompleteEASE for convenience but may
need to be modified for specific sample types. Always evaluate your results!
For this example, load the “SiC on Si” example data and the “Si with Transparent
Film” model. Click the ‘Fit’ button. Results are shown in Figure 3-69 and Figure
3-70.
Figure 3-69. Results from “SiC on Si” data set with “Si with Transparent Film” model.
Figure 3-70. Resulting SiC optical constants using “Si with Transparent Film” model.
Let’s consider ways to possibly improve the model and lower the MSE. The
following three topics (Surface Roughness, Simple Grading, and Simple Anisotropy)
were introduced in Section 3.1. The sections below contain more details on how
these complexities are included in a model and how they may apply to this specific
example.
Surface Roughness
Surface roughness lowers the optical density and behaves optically as a lower-index
surface film. CompleteEASE utilizes an Effective Medium Approximation with 50%
void (n=1, k=0) and 50% base material to describe this condition. The option to
include Surface Roughness in the model is included at the top of the Model panel
(below Layer Commands) and is easily toggled ON/OFF.
Evaluation of fit result: MSE is reduced from ~22 to ~20. Is this enough? Can MSE
be reduced further? There is still some visual misfit between model and
experimental curves.
Simple Grading
If the index varies with depth through the film, the data may not be well-modeled
by a standard single layer. CompleteEASE can approximate the index variation by
dividing the layer into smaller sublayers, as shown in Figure 3-5.
Grading often appears in the data as compressed or expanded interference
oscillations, as we see for this example. Consider the 60° data for Psi only (Figure
3-74). Model curves are compressed compared to experimental curves.
Reload the “Si with Transparent Film” model and click ‘Fit’. Now, try adding a
simple index gradient by right-clicking on the name of Layer #1 (“Cauchy Film”) and
choosing “Grade Layer” (see Figure 3-75). This will add a simple gradient where
index is varied with depth of the film and % Inhomogeneity is defined as a fit
parameter. Click ‘Fit’. See Figure 3-76 for results.
Figure 3-75. Right-click on the layer name and choose “Grade Layer”.
Right-click on “Graded Layer” and select “Graph Sub-Layer Optical Constants (n)”, as
shown in Figure 3-77, to display the index at each sublayer (“slice”) of the model.
NOTE: The optical effect of surface roughness is like a film with lower index at the
top, as both have the effect of lowering the optical density toward the surface. In
this case, the film may be modeled equally well by surface roughness or by a
negative index gradient. This is more likely to occur for thinner films where the size
of roughness is comparable to the film thickness or if the gradient is nonlinear. If
both roughness and grading yield similar MSE values, you can decide which is best
based on your understanding of the material or information you have from other
metrology.
Simple Anisotropy
Anisotropy is usually observed in the experimental data as a tilting of the curves, as
demonstrated by Figure 3-78. Note that while the maxima of the interference
oscillations are lined up at the same wavelengths, the minima position is shifted
relative to the isotropic model.
The simplest form of anisotropy is uniaxial where nx = ny ≠ nz and nx, ny are in the
sample plane. To try this simple case in your model, right-click the layer name and
select “Convert to Anisotropic” (Figure 3-79). This will replace your layer with an
anisotropic layer where the previous optical constants are preloaded into the X and
Z orientations of a uniaxial model (Figure 3-80).
Figure 3-80. "Convert to Anisotropic" replaces the previous layer with an anisotropic layer
where the previous optical constants are preloaded into the X and Z orientations of a uniaxial
model.
As shown in Figure 3-80, two sets of optical constants are now active in the fit: Ex
and Ez. We can further simplify this model by using “Difference Mode”. Turn
“Difference Mode” ON to fit Ex only; Ez is simply shifted relative to Ex using the
“Index Differences” parameters.
Equation 3-3
∆𝐼𝑅
∆𝑛(𝑒𝑉) = ∆𝐴(1 + ∆𝐵 ∙ 𝐸 2 + ∆𝐶 ∙ 𝐸 4 + ∆𝐷 ∙ 𝐸 6 + ) (𝐸 in eV)
𝐸2
The “A” parameter provides the base index difference and may be the only
parameter needed to adequately describe simple cases.
NOTE: “Difference Mode” often works well for uniaxial transparent films with the
differing axis oriented in the Z direction. More complex cases will require more
complex model and nonstandard experimental data.
Try simple anisotropy with the current “SiC on Si” example. Results are shown in
Figure 3-82.
A good starting model should be first established, which approximates the film as
ideal. When Try Alternate Models is executed, CompleteEASE will automatically try
fitting the data using the ideal optical model, the same model with surface
roughness, then with simple grading, with both roughness and grading, and finally,
with simple anisotropy. When finished, a summary of the results will appear in a
new window, as shown in Figure 3-84. The recommended model will be highlighted
in green. The recommended model is determined solely by the MSE Improvement
Threshold, which is located next to “Try Alternate Models” and must be set prior to
executing. The default value for this threshold is 25%, which means that the added
complexity in the model must provide at least 25% improvement in MSE to be
recommended over a simpler model.
NOTE: Roughness often improves the fit for higher-index or absorbing films.
Grading is common with many metal-dielectrics. Anisotropy is common with
polymers.
With “SiC on Si” example data and “Si with Transparent Film” model open, use the
Try Alternate Models command. The recommended model (see Figure 3-84)
includes both surface roughness and index grading. The MSE is improved at least
25% over the ideal model, the model with surface roughness only, and the model
with index grading only, which suggests that both roughness and grading are
present in the sample.
NOTE: The Try Alternate Models command is a tool to automate the process of
testing each model but does not evaluate the results of each model beyond MSE.
This command does not eliminate the need to evaluate the results.
Figure 3-85. Example difference plot from summary of Try Alternate Models results.
Lastly, you can click the ‘<<’ and ‘>>’ buttons to change the selected model, then
‘Apply Chosen Model’ to update the Model panel with your selection. With the
“Roughness & Grading” column selected, click ‘Apply Chosen Model’ to update your
model for this example. CompleteEASE will then look like Figure 3-86.
Finally, upon updating the model, you can further evaluate the result by viewing
optical constants. Right-click on “Graded Layer” and select “Graph Sub-Layer
Optical Constants (n)”, as shown in Figure 3-77. The final optical constants for this
example are shown in Figure 3-87.
Figure 3-87. Optical constants for “SiC on Si” example with surface roughness and index
grading included in the model.
Ellipsometry is often used to measure a series of thin films to compare and report.
CompleteEASE enables simple logging, comparing, and reporting of results. This
example will step through a series of SiNx thin films on Si, using the analysis steps
taught in Section 3.3. However, the emphasis will be on using CompleteEASE to log
all fit results, compare optical constants for the various films, and finally create a
report of the results.
To begin this exercise, open the “sinx on si-1” data file and the “Si with Transparent
Film” model in the Analysis tab of CompleteEASE. Click ‘Fit’ and the results shown
in Figure 3-88 appear.
Figure 3-88. Fit to “sinx on si-1” example data with “Si with Transparent Film” model.
Copy to Clipboard
The Fit and Model panels in the Analysis tab of CompleteEASE offer right-click (R)
menu choices. Examples of these right-click menus are shown in Figure 3-89. The
Figure 3-89. Right-click menu choices from the Fit and Model panels.
Fit Log
Shortcut: CompleteEASE includes a “Fit Log” for easy comparison of multiple results. To
record a fit result to the Fit Log, right-click (R) on the Fit panel and select “Add
CTRL+L to Add to Fit Log
to Fit Log” after the fit is finished. To view the Fit Log, use the same menu and
CTRL+Alt+L to View Fit select “View Fit Log”.
Log
Use the Fit Log to compare results for all five “sinx on si” example data sets. Open
each file and fit using the “Si with Transparent Film” model. After each is finished,
add the result to the Fit Log. You will be prompted to enter a descriptive name for
each entry, or you can use the timestamp generated by CompleteEASE (Figure
3-91).
After all five data files have been fit and added to the Fit Log, view the Fit Log. It
will appear as a new window, as shown in Figure 3-92. Click on any of the individual
log entries to see the results from that entry. You can use ‘Load Log Entry’ to
restore the selected entry into the Analysis tab of CompleteEASE.
Figure 3-92. Fit Log showing results from all five “sinx on si” data files.
Comparing Results
The Fit Log allows easy comparison of multiple results. Use SHIFT+click or
SHIFT+up/down keys to select multiple entries from the Fit Log. With multiple
entries selected, click ‘Compare’. This will create a table of results for each sample,
as in Figure 3-93. Use the checkboxes to reverse columns and rows or to add
statistics. This table can also be easily copied to the clipboard and pasted into
another program.
NOTE: The “Re-save Data” checkbox allows new fit results to be saved with the
data file, which can then be reviewed later.
In batch analysis, “rows” are used to separate groups of data or analysis models.
Each row will contain a “file group”, model, and log name (optional). To start, click
‘Add Row’. This will open a dialog for you to first select data files for the file group
(Figure 3-96).
Click ‘Add’ to browse to the desired file location. For this example, select the five
“sinx on si” example data files from the Library tab (Figure 3-97). When finished,
click ‘Ok’.
CompleteEASE will ask for a name for the group (Figure 3-98). When finished, click
‘Ok’.
The new file group will now appear in the “Choose Files” window with individual
files displayed on the right (Figure 3-99).
Figure 3-99. Choose Files dialog with new file group listed.
This is the only file group needed for this example, so with the new file group
selected, click ‘Ok’ to add it into a row of the batch analysis setup. The Reanalyze
Data dialog will now appear like Figure 3-100.
To add a model for this batch analysis, double-click where indicated and select a
prebuilt or previously saved model. For this example, select “Si with Transparent
Film” from the Library tab and click ‘Open’ (Figure 3-101). The model will be added
to the row in the batch analysis setup.
Lastly, you can double-click under “Log Name” and enter a name for the batch
analysis (Figure 3-102). The log name will be appended to the file name for each
entry and will be displayed within the Fit Log.
Figure 3-103. Fit Log after batch analysis. The log name is appended to the file name for
each Fit Log entry.
After the batch analysis, entries can be compared as described in the preceding
sections.
Generate Reports
To generate reports from the Fit Log, select one or more entries and click ‘Generate
Reports’ (Figure 3-104). CompleteEASE will ask if it’s okay to clear the current
model and data set. Click ‘Ok’ to continue (Figure 3-105). The report will be saved
as an RTF file; navigate to the desired save location and enter a name for the report
(Figure 3-106).
Figure 3-105. CompleteEASE will ask if it is okay to clear the current model and data set
before generating reports.
Figure 3-106. Browse to desired save location and enter name for report.
When finished, navigate to the designated save location and open the RTF file to
view. The report will look like Figure 3-107.
NOTE: The model must be SAVED with “Add Opt. Const. to Report” = ON if it is to
be used in batch analysis or generating reports from the Fit Log.
Figure 3-109. Right-click in the Fit panel to “Copy Analysis Report to Clipboard”.
Snapshot
A more robust way to save individual results for sharing or long-term storage is by
saving a “Snapshot”. A snapshot will compress your data file, model, and fit results
into a single file with the “.SEsnap” extension. To save a snapshot, simply click the
‘Save Snapshot’ button located in the upper right of the Model panel. Similarly, to
open a snapshot, simply click the ‘Open Snapshot’ button.
Figure 3-111. Open or save snapshots using the buttons in the upper-right corner of the
Model panel.
NOTE: Snapshots are preferred when contacting J.A. Woollam or your local
representative for analysis help.
NOTE: Any material coated with an opaque metal film will be optically equivalent
to a bulk metal substrate. If light is absorbed before it can reach the backside of the
metal, reflect, and exit out of the material into the detector, the film is opaque. For
most metals, this will occur around 100nm or less. The example in this section is a
glass or silicon substrate that is coated with an opaque metal film.
Equation 4-1
1−
2
= 1 + i 2 = n~ = ( n +i k )
2 2
= sin( ) 2 1 + tan( ) 2
1 +
Check the “Show Advanced Config. Options” box and expand the General section.
Find “Display Pseudo Transforms” in the list and check the “Parameter ON”
checkbox. Click “Close” when finished. You will need to restart CompleteEASE for
this change to take effect.
After restart, the pseudo optical constants <n> & <k> (or the pseudo dielectric
functions <e1> & <e2>) of the current data set can be displayed by selecting the
“<Pseudo> Transforms” option from the +Data menu above the graph, as shown in
Figure 4-2. Viewing the data in terms of pseudo optical constants can be useful for
bulk samples.
Figure 4-2. Select <Pseudo> Transforms from the +Data menu above the graph to display
pseudo optical constants or the pseudo dielectric function.
NOTE: The pseudo optical constants are NOT equivalent to the true optical
constants if multiple reflections are present in the data, which occurs when surface
layers are present on the sample.
Open the “Ni Substrate” example data file and view the pseudo optical constants
Shortcut:
shown in Figure 4-3. Notice that <n> and <k> are the same for each angle. Because
CTRL+Y to turn double Y the Ni layer is opaque, only a single reflection occurs from each surface. In this
axis ON or OFF case, the pseudo optical constants are equivalent to the true optical constants. The
data must still be modeled to create a material file that contains the optical
Figure 4-3. Pseudo optical constants for the “Ni substrate” data.
WvlByWvl Layer
Open the “Ni Substrate” example data file if needed. Clear the Model panel by
clicking Analysis > Model > ‘Clear’. With a blank starting model, click “none” to
load a material file for substrate. From the Library tab, Advanced folder, choose the
“WvlByWvl.mat” file and click ‘Open’ (see Figure 4-4).
Figure 4-4. The WvlByWvl.mat file is located in the Advanced folder of the Library tab.
After loading the WvlByWvl layer into the model, expand the layer by clicking the +
sign (see Figure 4-5).
The default starting values for the WvlByWvl layer are n = 1.5 and k = 0 (at all
wavelengths). These values are not representative of a metal as metals are always
absorbing (k > 0). Good starting values are important for the fitting algorithm to
find the correct result. It is best to use starting optical constants close to the
expected values for the material, so you should change the initial values for n and k.
In this case, you can use the pseudo optical constants as a guide for the initial
values. For this example, you can try n = 3 and k = 5 (<n> ranges from 1 to 5; <k>
ranges from 2 to 8).
A more robust way to set the starting values is to load a starting material file into
the WvlByWvl layer. Click on (Starting Mat =) none and choose Ni.mat from the
Metal folder of the Library tab (see Figure 4-6). This will enter the Ni values from
Palik’s Handbook of Optical Constants of Solids as the starting values at each
wavelength within the WvlByWvl layer.
NOTE: Metal optical constants can vary significantly from source to source and are
even discontinuous within Palik from use of multiple references. The
CompleteEASE library has many material files for metals, but they are often best
utilized as starting material files rather than as truly representative of your metal
material.
Right-click on (Starting Mat = ) Ni to graph the starting optical constants (see Figure
4-7), and you should see the values as shown in Figure 4-8.
Figure 4-7. Right-click on “Ni” within the WvlByWvl layer and select “Graph Layer Optical
Constants” to view the starting optical constants.
Click ‘Generate’ to see how closely the library Ni values match the experimental
data. Figure 4-9 shows Psi only. The model-generated data is not identical to the
experimental data because the optical constants from Palik are not identical to the
measured sample.
Figure 4-9. Generated data from “Ni.mat” compared to “Ni substrate” example data.
Now, click ‘Fit’. The WvlByWvl layer allows n and k to vary independently at each
wavelength to best match the experimental data. This produces a near-perfect fit
to the data, as shown in Figure 4-10. Right-click on the WvlByWvl layer to graph the
optical constants (see Figure 4-11). These optical constants can now be saved as a
reference material file for this Ni material. Instructions for saving optical constants
are found in the following sections. Before proceeding, copy the optical constants
graph to the Graph Scratchpad (see Figure 4-12).
Figure 4-11. Optical constants of the WvlByWvl layer after fitting the “Ni substrate” example
data.
Evaluation of fit result: Visually, there is good agreement between the model-
generated data and experimental data, and the MSE is low. The shape of optical
constants is typical for metals with absorption increasing into the IR. Noise in the
optical constants is a direct result of the WvlByWvl layer fitting each wavelength
independently, picking up noise from the data.
B-Spline Layer
While the WvlByWvl layer works well for this simple substrate example, it does not
use neighboring wavelengths to help determine the optical constants. Any noise in
data will produce noise in the resulting optical constants. To avoid this problem,
the B-Spline layer can be used. Full details of the B-Spline layer will be discussed in
a later example. In this simple example, we will build a model to fit any metal
substrate and save this model for future use.
Start by clearing any existing model from the Model panel. (Click Analysis > Model
> ‘Clear’). Click on (Substrate = ) none and load the B-Spline layer from Library tab,
Basic folder (Figure 4-13).
Figure 4-13. The B-Spline layer is in the Library tab, Basic folder.
After loading the B-Spline layer into the model, expand the layer by clicking the +
sign (see Figure 4-14). The B-Spline layer has several subsections which can be
further expanded. Expand the +Nodes section.
For this example, set the “Resolution” to 0.1eV. Click on (Starting Mat =) none
(within the +Nodes section) and load the same Ni.mat file used in the previous
section (see Figure 4-6).
The B-Spline layer specifies the optical constants versus wavelength using a series
of control points (“nodes”) which are equally spaced in photon energy (eV). The
approximate spacing of the control points is controlled by the Resolution. When a
starting material is specified, the nodes are immediately matched to the starting
material file. The starting material file does not have to be the same as the
measured material, but chances of the fitting algorithm finding the correct solution
are improved by choosing a starting material with similar values.
NOTE: For many metal substrates, any metal starting values are usually close
enough.
Click ‘Generate’ to see how closely the starting B-Spline values match the
experimental data. Figure 4-15 shows Psi only.
Now, click ‘Fit’. The algorithm quickly converges to the result shown in Figure 4-16.
Figure 4-16. Fit to “Ni substrate” example data using B-Spline layer.
To view the optical constants, right-click on “B-Spline” and choose “Graph Layer
Optical Constants” (see Figure 4-17 and Figure 4-18). To view the B-Spline nodes,
click on Draw Node Graph within the B-Spline layer (see Figure 4-19).
Figure 4-18. Resulting optical constants from B-Spline fit to “Ni substrate” example data.
Figure 4-19. Nodes at 0.1eV resolution fit to the “Ni substrate” example data.
Evaluation of fit result: Again, there is good visual agreement between the model-
generated data and experimental data, and the MSE is low. The shape of optical
constants is typical for metals with absorption increasing into the IR.
Figure 4-20. Results from WvlByWvl and B-Spline layers for “Ni substrate” example data
compared in the Graph Scratchpad (curve labels and colors altered for easier comparison).
NOTE: The Layer Command Save is different from the ‘Save’ button in the Model
panel. The Layer Command Save saves the layer optical constants as a material
(.mat) file, while the ‘Save’ button in the Model panel saves a model (.mod) file
with the layered model structure and any +MODEL, +FIT, or +OTHER Options.
Alternatively, the layer optical constants can also be saved by right-clicking the layer
name (in this case “B-Spline”) and selecting “Save Layer Optical Constants” (see
Figure 4-23).
Figure 4-23. Right-click on a layer name to choose “Save Layer Optical Constants” from a
drop-down menu.
CompleteEASE will ask how you want to save the optical constants. For B-Spline,
you can choose to save as a Fixed B-Spline, an Editable B-Spline, or Tabulated list of
n and k values.
Save Model
After optimizing the analysis for a sample, the model can be saved for future use.
Let’s use this Ni substrate as an example. If additional Ni substrates will be
measured in the future, a customized model would help reduce analysis time. For
this example, let’s modify two additional settings:
• Replace the Starting Mat. in the B-Spline layer with the metal optical
constants saved in this example (previous step).
• Expand +FIT Options and turn Include Derived Parameters ON. Add
derived parameters for both ‘n’ and ‘k’ of the substrate (layer #0). This will
report n and k at the specified wavelength (default = 632.8nm) in the Fit
Results.
The model should now appear like Figure 4-25.
NOTE: The Layer Command Save is different from the ‘Save’ button in the Model
panel. The Layer Command Save saves the layer optical constants as a material
(.mat) file, while the ‘Save’ button in the Model panel saves a model (.mod) file
with the layered model structure and any +MODEL, +FIT, or +OTHER Options.
NOTE: This example uses the “metal substrate” model created in Section 4.1. You
will need to complete Section 4.1 before proceeding to this example.
When considering a film on a metal substrate, it is strongly recommended to first
measure an uncoated substrate to determine the substrate optical properties. For
this example, data were acquired from a bare Au substrate and from an Au
substrate with self-assembled monolayer film.
First, open the “Au substrate” example data file and fit using the “metal substrate”
model created in the previous section. The starting values should be close enough
to simply click ‘Fit’. Results should appear as shown in Figure 4-27 and Figure 4-28.
Evaluation of fit result: There is good visual agreement between the model-
generated data and experimental data, and the MSE is low. The shape of optical
constants is typical for metals with absorption increasing into the IR, and the n and
k values are similar to library values for Au.
NOTE: Before fitting any overlayers, it is important to now fix the optical constants
from the bare substrate analysis. Turn off the fitting of the substrate optical
constants before proceeding.
To fix the B-Spline optical constants, expand the B-Spline layer and turn off “Fit
Optical Constants” (Figure 4-29). This will prevent the substrate optical constants
from changing when fitting for subsequent films.
Self-Assembled Monolayers
Self-Assembled Monolayers (SAMs) are very thin organic layers that consist of a
single monolayer. They are generally less than 10nm thick and are often closer to
1-2nm. Ellipsometers are very sensitive to layers of this thickness due to the phase
information available from the measured Delta parameter. However, the index of
refraction from such thin layers is not typically attainable. Instead, the nominal
index of refraction must be assumed in order to fit the thickness. As layers become
thicker than 10-20 nm, sensitivity to index of refraction increases. A common
approach for films less than 10-20 nm thick is to measure a thicker film of similar
material. The index is determined from the thicker film and then used for
determining thickness of the thinner films.
NOTE: Assuming optical constants from published values or from thicker films may
not always be true, so measurement of SAMs or other very thin layers is often
qualitative and best used for comparison between multiple samples.
Open the “Organic on Au” example data file and click ‘Generate’. The graph should
appear as in Figure 4-30. The model-generated curves represent a bare Au surface,
as they come from the model which currently contains only the substrate. Notice a
shift in Delta at all wavelengths. This indicates the presence of a thin surface layer.
A larger shift indicates a thicker layer on the Au surface.
Figure 4-30. “Organic on Au” example data compared to model-generated data from bare
Au. The Delta shift indicates a surface layer.
Layers can also be Now, add a layer to the model by clicking the Layer Command Add. Position the
added by using blue bar above the substrate (Au represented by B-Spline in this model) and click to
ALT+plus sign. Use add the layer (Figure 4-31).
arrow keys to position
blue bar, then Enter.
Next, choose Cauchy.mat from the Library tab, Basic folder and click ‘Open’. The
default values for the Cauchy layer will be close to the values needed for most
organic films. We will assume these values are representative of our SAM.
With the Cauchy layer added to the model, activate the thickness of layer 1 as a fit
parameter by right-clicking on the value. The model should now look like Figure
4-33. Make sure that “Fit Optical Constants” within the B-Spline layer is off, as
these values were determined from the bare substrate. Click ‘Fit’ and you should
obtain a thickness of 7.46nm (Figure 4-34).
Evaluation of fit result: There is good visual agreement between the model-
generated data and experimental data, and the MSE is low. The thickness is typical
for SAMs.
Figure 4-36. Uniqueness test result of the thickness parameter for a self-assembled
monolayer on Au with assumed optical constants.
Right-click on the graph area and copy the MSE profile to the Graph Scratchpad.
We will compare this MSE curve with our next test.
NOTE: You may want to clear the Graph Scratchpad (if results from previous
examples are still present) before copying the uniqueness test result. To do this,
open the Graph Scratchpad and click ‘Delete All’. Then go back and add the
uniqueness test result.
Figure 4-37. Model with Cauchy parameters A, B, and C activated as fit parameters.
Repeat the uniqueness test for Thickness #1 with the same test conditions as
before. The result is shown in Figure 4-38. Add this result to the Graph Scratchpad
and then view the Graph Scratchpad to better compare the two results.
Figure 4-38. Uniqueness test result of the thickness parameter for a self-assembled
monolayer on Au with fitted optical constants.
Change the color of one of the curves by clicking on the color box and selecting a
new color from the subsequent window. Give each curve a unique name by
double-clicking and typing in the Curve Name column. The comparison is shown in
Figure 4-39.
The V-shape of the uniqueness test result for thickness only indicates good
sensitivity to the thickness parameter within this model. The shallow curvature of
the uniqueness test result for thickness and Cauchy parameters indicates poor
sensitivity to both thickness and refractive index. This is typical for thin films less
than ~10 nm. When working with very thin films (< 10 nm), it is recommended to
fit for thickness only, while setting refractive index at reasonable values. The
default Cauchy parameters are recommended for many organic or transparent
materials.
Absorbing films are more difficult to analyze than transparent films because the
general structure of an absorbing film’s optical constants versus wavelength is not
always known before the measurement. There are two layer types in
CompleteEASE most commonly used for absorbing films: 1) the B-Spline layer,
which allows arbitrary flexibility in n and k versus wavelength, and 2) the Gen-Osc
layer, which uses a summation of standard oscillator line shapes. B-Spline will be
used in this example; Gen-Osc will be used in Section 4.4.
The B-Spline layer is perfect for materials that are transparent in part of the
measured spectral range and absorbing in part of the measured spectral range.
Examples of such materials for UV-VIS-NIR are:
• a-Si, a-Ge, a-SiGe
• ZnS, ZnSe
• SiC
• TiO2
Figure 4-40. Data from “TiO2 on Si” example data. The interference oscillations in data
suggest the film is transparent at longer wavelengths, while the dampening of these
oscillations at short wavelengths indicates UV absorption.
Figure 4-41. Interference oscillations occur when the light can travel through a thin film and
return from the bottom interface (red arrows). If the light is absorbed, the light only comes
from the top-surface (blue arrows) and will not produce interference oscillations.
‘Set Ranges’
The typical approach for modeling semi-absorbing thin films is to first fit the
transparent region only to determine film thickness and index in this region. In this
NOTE: For the purpose of selecting the transparent range of a semi-absorbing film,
the min. and max. wavelengths do not need to be exact. Typically, for UV-
absorbing materials, you can enter a conservative value in the min. wavelength box
and leave the max. wavelength at the default value (which is the maximum
measured wavelength).
To ensure only the transparent region is selected, enter “400” as the min.
wavelength and click ‘Ok’ to close the dialog box. The graph will update to display
only the selected range (Figure 4-45).
Figure 4-43. Data panel buttons, including the ‘Set Ranges’ button.
Figure 4-45. “TiO2 on Si” example data after selecting wavelengths 400nm and longer.
Alternatively, you can also simply click and drag the mouse within the graph to
select the transparent region. First, you will need to reselect the entire spectral
range. To do this, you can:
1) Re-open the example data file.
2) Reset the range from Data > ‘Set Ranges’ (enter 0 or any value below the
minimum measured wavelength for minimum wavelength).
3) Right-click in the graph and select “Zoom All”, click the “Zoom All” button in the
upper-right area of the graph, or double-click anywhere on the graph to
recapture the full measured range (see Figure 4-46).
Figure 4-46. Right-click in the graph and select "Zoom All" to recapture full range of
measured data.
Figure 4-47. Another way to select a range of data is to click and drag mouse over the graph.
NOTE: Remember to evaluate the result before proceeding. If you do not have a
good result for the transparent region, you may have difficulty expanding the
analysis into the absorbing region.
Evaluation of fit result: The model-generated data and experimental data generally
agree, and the resulting optical constants are physically plausible with index around
the nominal expected value for TiO2 and only increasing into the UV. The MSE is 18
and there seems to be room for improvement in the visual match between the
curves. As learned in Chapter 3, we can use the Try Alternate Models command to
test for common complexities.
Expand +OTHER Options within the Model panel and click Try Alternate Models.
Results are shown in Figure 4-50. CompleteEASE suggests including surface
roughness in the model to reduce MSE to ~8. Click ‘Apply Chosen Model’ to accept
this recommendation and apply the change to the model.
NOTE: If you are only interested in film thickness and/or the index value within this
range, the analysis is complete. It is not necessary to analyze the absorbing region
just because it was measured. The following steps demonstrate expansion into the
absorbing region, assuming that the optical constants or other properties in the
absorbing region are goals of the measurement.
Figure 4-51. Right-click “Cauchy Film” and select “Parameterize Layer”. For this example, we
will choose B-Spline parameterization.
A new window will appear which contains the existing model (Cauchy) values and
“New Layer” (B-Spline) values (see Figure 4-52). The B-Spline will automatically
mimic the Cauchy values. We will learn more about this window in Section 4.4. For
now, simply click ‘Replace Layer’ to finalize conversion of the Cauchy layer into a B-
Spline layer. The model should now appear as shown in Figure 4-53.
Figure 4-53. Model updated from Cauchy to B-Spline. Note the fit results and model curves
are left-over from the previous fit.
B-Spline Layer
Expand the B-Spline layer by clicking the “+” to view layer details. Recall from
Section 4.1 that the B-Spline layer specifies optical constants versus wavelength
using a series of control points which are equally spaced in photon energy (eV). The
Click on Draw Node Graph to display the node positions as shown in Figure 4-55.
The B-Spline layer always works in terms of the complex dielectric function = 1 +
i2 = (n + ik)2, which is often written as “e1 & e2”. One set of control points (and
associated spline curve) is used to specify the dispersion in “e1”, and a second set
of control points is used to describe “e2”. Using a smaller resolution value adds
more control points, resulting in more flexibility to accommodate sharper features
in the dielectric function spectra. However, setting the resolution too low can
result in unwanted noise or unphysical artifacts in the dielectric function spectra.
Further, the more control points you add, the more time CompleteEASE will take to
calculate fits.
Figure 4-55. B-Spline dielectric function “e1 & e2” showing the location of the “control
points” (red and green dots), which are equally spaced in eV.
The “Fit Opt. Const. = ” feature allows you to turn on and off the fitting of control
points from within the B-Spline, as was demonstrated in Section 4.2.
In the B-Spline layer, “Use KK mode” is an advanced calculation that maintains
Kramers-Kronig consistency between the resulting e1 and e2 spline curves. When
this feature is ON, the optical constants will be constrained to a physical shape.
This feature will also reduce the total number of fit parameters, as only the e2
spectrum is described with a series of control points while the e1 spectrum is
Figure 4-56. +OTHER Options in the model, including the Wvl. Range Expansion Fit
command.
The Wvl. Range Expansion Fit command starts with the currently selected
wavelength range, applies the current model, then gradually increases the range to
shorter (and longer, if applicable) wavelengths until the entire data set is included.
A fit is performed at each new increment of wavelengths. The default increment
value is 0.5 eV, which works well for broad absorption features, but smaller
increments may be needed for materials with narrow absorption features. You can
consider setting the increment value to match the B-Spline node resolution such
that the fitting process adds one B-Spline node at a time.
For this example, the default increment of 0.5 eV is fine. Click on the Wvl. Range
Expansion Fit command, and CompleteEASE will prompt you to choose the
wavelength expansion range. The default values will be the min. and max. of the
available data, which is what we want for this example. Click ‘Ok’ to start.
CompleteEASE will add data in 0.5 eV increments, fit the newly expanded range,
and repeat until the full range specified for the Expansion Wvl. Range (Figure 4-57)
is included. The results of this Wvl. Range Expansion fit are shown in Figure 4-58
and Figure 4-59. As always, the results should be evaluated.
Evaluation of fit result: There is good visual agreement between the model-
generated data and experimental data, and the MSE is low. Index increases toward
the UV in the transparent region and decreases in the absorbing region. Are the
results Kramers-Kronig consistent? Does k drop below 0 near 450nm?
Upon evaluation of the optical constants, it appears that the results maintain the
physical relationship between n and k, but it can be difficult to determine by eye.
Turn on the KK Mode feature within the B-Spline layer to ensure that this physical
relationship is enforced.
Click and drag the mouse over the optical constants graph to zoom in on a small
region near 500nm. Notice that k is slightly negative in this range. We can improve
the physicality of the results by constraining the B-Spline layer such that k (e2) is
always positive. Expand the +Nodes section within the B-Spline layer and turn
“Force E2 Positive” to ON. Even with this change, you may notice some small
fluctuations in k around 0 in the transparent region (see Figure 4-61).
Figure 4-61. TiO2 results with “Use KK Mode” and “Force E2 Positive” features on.
These fluctuations are not likely real and can be ignored, or we can further improve
the physicality of the results by assuming a transparent region. This feature is also
found within the +Nodes section within the B-Spline layer and allows you to define
the transparent region with a band gap (Assume Band Gap = ON) or by setting the
min. and max. wavelengths of the transparent region (Assume Band Gap = OFF).
For this example, turn “Assume Transparent Region” to ON, “Assume Band Gap” to
OFF, and set the transparent region from 400nm to 10000nm (infinity
approximation for this data range; effectively selects data 400nm and longer).
The final model and results for the “TiO2 on Si” example data set are shown in
Figure 4-62, Figure 4-63, and Figure 4-64.
Figure 4-64. Final optical constants for the TiO2 layer in “TiO2 on Si” example data.
NOTE: The results of this example will be used for the next section. Save a
snapshot of this result before closing CompleteEASE. See page 3-108 for details on
saving snapshots.
NOTE: Section 4.3 must be completed before proceeding with this example. If
needed, open the snapshot saved at the end of Section 4.3. See page 3-108 for
details on opening snapshots.
Gen-Osc Layer
The Gen-Osc layer has a few advantages over the B-Spline layer. 1) Oscillators
provide a physically meaningful model as they represent the dipole response of the
material. 2) Oscillators can be used to determine comparable, physical parameters
such as band gap. 3) The Gen-Osc layer always enforces Kramers-Kronig
consistency.
A disadvantage is that it can be difficult to know where to place oscillators without
a reference. Therefore, the most common approach with the Gen-Osc layer is to
start with a reference set of optical constants and place oscillators accordingly. The
reference optical constants can be from the CompleteEASE library, from a previous
or published result, or from an initial WvlByWvl or B-Spline fit.
In this example, we will start with the final B-Spline result from Section 4.3. With
this result open in CompleteEASE, right-click on the B-Spline layer and select
“Parameterize Layer”. Choose “GenOsc” from the side menu, as shown in Figure
4-69.
A new window will appear which contains the existing model (B-Spline) values and
“New Layer” (Gen-Osc) values (see Figure 4-70). Unlike B-Spline parameterization,
which automatically mimics the reference values, oscillators must be manually
placed with a Gen-Osc parameterization.
The goal is to match the line shape of the reference values with one or more
oscillators. The Gen-Osc layer allows a combination of various oscillators which are
detailed in Chapter 10. For this example, we will use a Tauc-Lorentz oscillator to
describe the single, asymmetrical absorption feature in this material, which is
typical for many amorphous materials.
Each of these three steps will be demonstrated for this example, where we match
the previous B-Spline results with a Tauc-Lorentz oscillator.
Figure 4-71. From the Display panel, select View/Fit: “Imaginary Part Only”.
The window will simplify to show only imaginary curves and components (see
Figure 4-72).
To add an oscillator, click the Oscillator Menu Add command within the Layer
Parameters panel. CompleteEASE will prompt you to choose the oscillator type you
wish to add. For this example, choose Tauc-Lorentz (see Figure 4-73). You can read
more about this specific oscillator type in Section 10.4. Click ‘Ok’.
CompleteEASE will place a Tauc-Lorentz oscillator into the layer with nominal values
for each of the oscillator parameters (see Figure 4-74).
Next, adjust the oscillator parameters such that the Tauc-Lorentz oscillator shape
resembles the reference curve. You can click on each of the blue, underlined
oscillator values within the Layer Parameters panel to enter new values, but
CompleteEASE provides control boxes in the graph for easier, visual manipulation.
Click and drag on any of the control boxes in the graph and watch how the oscillator
changes. Manipulate the band gap parameter control box such that it is located
near 3.2eV. Manipulate the amplitude and center energy control box such that the
amplitude and center energy of the Tauc-Lorentz oscillator approximately match
the amplitude and center energy of the reference curve. Lastly, manipulate the
broadening such that the broadening of the Tauc-Lorentz oscillator approximately
matches the broadening of the reference curve. When finished, your window
should look something like Figure 4-75.
NOTE: Left-click on the oscillator number in the Layer Parameters panel to select
an oscillator and view its control boxes. Right-click on the oscillator number to
delete the oscillator. Use ‘Expanded Axis’ button to view control boxes that are out
of range of the reference data.
NOTE: The Fit panel within the Parameterize Layer window is NOT the same as the
Fit panel in the Analysis tab. In the Parameterize Layer window, we are NOT fitting
the experimental data. We are fitting the oscillator parameters to reference optical
constants. We will fit the experimental data in a later step.
CompleteEASE varies the oscillator parameters to match the imaginary curve shape
of the reference (B-Spline) values (see Figure 4-76).
Figure 4-77. From the Display panel, select View/Fit: "Real Part Only".
The oscillator list will be hidden from view, as oscillators affect e2 only.
CompleteEASE automatically calculates e1 from e2 through the Kramers-Kronig
relationship (see Figure 4-78).
The e1 curve can be adjusted through a constant offset, UV pole, and/or IR pole.
Poles are unbroadened oscillators placed outside of the measured spectral range to
mimic the effect of absorption outside of the measured spectral range. A UV pole
will tilt the e1 curve upwards at short wavelengths; an IR pole will tilt the e1 curve
downwards at long wavelengths.
Experiment with the values of Einf (constant offset), UV Pole Amp., and IR Pole
Amp. and view the effect on e1. Position your mouse over one parameter at a time
and use SHIFT+CTRL+mouse scroll wheel to view changes. Notice the Einf
parameter raises or lowers the overall curve. The UV Pole Amp. tilts e1 up at short
wavelengths; the IR Pole Amp. tilts e1 down at long wavelengths. The IR pole
position cannot be changed. The UV pole position (UV Pole En.) default value is
11eV but can be higher or lower (farther or closer to measured spectral range) as
needed.
Reset the parameter values to their default values (Einf = 1.000, UV Pole Amp. = 0,
UV Pole En. = 11.000, and IR Pole Amp. = 0). Right-click on the Einf parameter value
to activate Einf as a fit parameter. Then click the ‘Fit’ button.
NOTE: The Fit panel within the Parameterize Layer window is NOT the same as the
Fit panel in the Analysis tab. In the Parameterize Layer window, we are NOT fitting
the experimental data. We are fitting the oscillator parameters to reference optical
constants. We will fit the experimental data in a later step.
See Figure 4-79. Notice the e1 curve needs to tilt up at low wavelengths. Try
adding the UV Pole Amp. and En. as fit parameters. Click ‘Fit’ again. Now the e1
curve closely resembles the reference curve at all wavelengths (see Figure 4-80).
Figure 4-82. New Gen-Osc layer with e2 and e1 curves approximate to reference values.
NOTE: If the reference or initial values were not KK consistent, you will not be able
to get an exact match to the model curves. This is okay as the desired final
outcome is KK consistent optical properties.
Replace Layer
When you are finished optimizing the e2 and e1 curves to match the reference
curves, click ‘Replace Layer’ to apply the new oscillator layer in your model. Click
‘Generate’ to ensure that your model-generated data still resemble the
experimental data (see Figure 4-83).
The new oscillator layer can now be used to fit data. Click ‘Fit’ to see how well the
Tauc-Lorentz oscillator can describe the experimental data (see Figure 4-84).
Figure 4-84. Result from one Tauc-Lorentz oscillator and UV pole to fit “TiO2 on Si” example
data.
Figure 4-85. Zoomed in view of experimental data to show misfit in the UV region.
Let’s look at the Gen-Osc parameterization again. Expand the Gen-Osc layer and
click Show Dialog to reopen the Gen-Osc dialog. Try adding a small Gaussian
oscillator in the UV to better match the reference values; click the oscillator
command Add or hold the SHIFT key while pointing and clicking in the graph (see
Figure 4-86).
NOTE: CompleteEASE will add the most recently used oscillator type. You can click
on the blue, underlined type name to change from Tauc-Lorentz to Gaussian.
Repeat steps 1 through 3 and click ‘Close’ when finished. Fit the data again with the
two-oscillator layer. The final results are presented in Figure 4-87 and Figure 4-88.
Evaluation of fit result: MSE is now in agreement with previous B-Spline result, with
better fit to the experimental data in the UV.
Save Model
If you would like to save a model for future use on similar samples, click the ‘Save’
button at the top of the Model panel (see Figure 4-89).
Figure 4-90. Determine optical properties one at a time through individual layer samples.
Figure 4-91. Determine optical properties one at a time through progression of layers.
Sometimes these methods are not possible or not successful, for example, if the
material properties in the stacked condition differ from the material properties in
the isolated condition. In this case, the typical approach is to build the starting
model with as much information as possible, using library or other published values
as starting values for each layer. In this example, we will consider a simple case of
SiN over SiO2 on Si.
Open “multilayer” example data file. The file comment indicates that the sample
structure is 90nm SiN over 15nm SiO2 on silicon. We can use this information to
build a starting model. First, clear any existing model by clicking the ‘Clear’ button
in the Model panel.
Next, build the expected sample structure using the following library files for each
material. Click on (Substrate = ) none to add “Si_JAW.mat” as the model substrate
(see Figure 4-93).
Then click Add, position the blue bar above the substrate, and click (Figure 4-94).
Add “SiO2_JAW.mat” as the first layer (Figure 4-95) and enter 15nm as the layer
thickness. The model should now look like Figure 4-96.
Figure 4-94. Position blue bar above substrate and click to add layer.
Click Add again, position blue bar above layer 1, and click (see Figure 4-97). Add
“SiNx (CodyLor).mat” as the second layer (see Figure 4-98) and enter 90nm as the
layer thickness. The model should now look like Figure 4-99.
Figure 4-97. Position blue bar above the first layer and click to add a second layer.
Figure 4-98. SiNx (CodyLor).mat is located in the Library tab, Dielectric folder.
It might be tempting to turn on fit parameters for all layer thicknesses and all layer
optical properties, but doing so will usually result in high correlations and
unphysical results. It’s possible that only a few parameters need to be adjusted to
fit the measured data.
First, try fitting for thicknesses only. Activate thickness #1 and #2 as fit parameters,
then click ‘Fit’. The result is shown in Figure 4-101.
Fitting the layer thicknesses was not enough to match the experimental data. Now,
we can consider letting one or more of the layer optical properties to vary. Thermal
SiO2 optical properties are generally very stable, and library values normally work
well for this material. SiNx is more variable, depending on process conditions and
stoichiometry.
Expand the SiNx layer, and you can see that this is a prebuilt Gen-Osc layer with one
Cody-Lorentz oscillator, as the file name indicates. Activate Amp1, Br1, Eo1, Eg1,
and Ep1 as fit parameters. Your model should now look like Figure 4-102. Click ‘Fit’
again and results should appear as in Figure 4-103.
Figure 4-102. Expanded SiN layer with Amp1, Br1, Eo1, Eg1, and Ep1 activated as fit
parameters.
Evaluation of fit result: MSE is significantly improved to ~12 with visual agreement
between the model-generated and experimental data. Can the model be improved
further?
The above result is good and may be adequate for most applications. SiN is a higher
index material with absorption in the UV. Optical contrast to air (n=1, k=0) and
measurement at short wavelengths typically increases sensitivity to surface
roughness. Try adding surface roughness and refit. The result is shown in Figure
4-104.
Evaluation of fit result: MSE is significantly improved again from ~12 to ~6. There
seems to be adequate sensitivity to surface roughness for this sample and
measured spectral range.
The best fit to the data based on MSE includes surface roughness, but what effect
does including surface roughness have on the results? Thickness #2 is reduced by
~2nm and Thickness #1 is increased by ~2nm. The SiN optical properties with and
without roughness in the model are shown in Figure 4-105. The optical constants
are very similar with only small changes in the UV and insignificant changes at long
wavelengths. If this level of change is significant in your research, it will be
important to include roughness in the model.
Superlattice
If a bilayer structure is repeated, you can create a superlattice structure in the
model. Right-click the first layer of the repeated structure and choose “Start
Superlattice”. Then right-click the last layer of the repeated structure and choose
“End Superlattice” (see Figure 4-106).
With the superlattice structure enabled, the model now adds “SL Count” to the top
superlattice layer (Figure 4-107). Click on this value to change the number of
repeated superlattices (Figure 4-108).
To clear the superlattice, right-click on the starting and ending superlattice layers
and select “Clear Superlattice”.
Thickness Pre-Fit
Thickness Pre-Fit can be helpful in fine tuning an unknown thickness of a layer
within a multilayer stack. See Section 3.2 for introductory details.
Global Fit
A global fit for one or more parameters can be helpful in determining thickness or
index of an unknown layer. See Section 3.3 for introductory details.
Parameter Coupling
Individual parameters can be coupled to each other using a ratio, offset, or custom
equation. To access this function in the model, click Configure Options. Turn on
“Parameter Coupling” as shown in Figure 4-109. Click ‘Ok’ when finished, and this
option now appears under +MODEL Options section.
Click Add to open the Create/Edit Coupled Parameter dialog box (Figure 4-111).
Choose the Coupling Mode, Coupling Parameters, and enter the ratio, offset, or
equation. The equation used for coupling will be displayed at the bottom of this
dialog box. Click ‘Ok’ when finished to apply coupling to the model (Figure 4-112).
This feature is often useful for coupling layer thicknesses in a multilayer structure.
Layer Coupling
CompleteEASE can also couple layer optical properties to other layers in the model.
Simply add or replace any layer with “Coupled.mat” (Figure 4-113). Then expand
the layer to designate which layer to couple (Figure 4-114).
Earlier sections in this chapter demonstrate how to analyze opaque films (4.1) and
semi-absorbing films with a transparent region (4.3 and 4.4). What about films
which absorb at all wavelengths but are not yet opaque? This section will
demonstrate methods for analyzing thin absorbing films where k > 0 at all
measured wavelengths.
The challenge with thin absorbing films is that there are more unknown sample
properties (thickness plus n and k at each wavelength) than measured values (Psi
and Delta at each wavelength). This results in correlations between thickness and
optical properties and no unique answer.
Measuring multiple angles alone will not break these correlations. This section will
cover two methods for analyzing thin absorbing films: SE + Transmission and
Interference Enhancement.
SE + Transmission
This approach requires a transparent substrate. By combining SE data with
transmission intensity data, the amount of information contained in the data is now
Evaluation of fit result: MSE is low and there is good agreement between model-
generated and experimental data. Thickness is 3.19nm. Is this result unique? Click
‘Fit’ again and you will get a new thickness result with similar visual fit quality and
similar MSE. This is due to correlations between thickness and optical properties.
Parameter Uniqueness
Perform a uniqueness test for the Cr thickness (see page 4-129 for introductory
details). Expand +OTHER Options in the Model panel and find Fit Parameter
Uniqueness. Click on this command, enter minimum value of 1, maximum value of
30, and 30 fit points (see Figure 4-117). Click ‘Ok’. The uniqueness test result is
shown in Figure 4-118. Notice the MSE does minimize around 20nm, but the MSE
scale over the entire tested range is small, which indicates low sensitivity to the
exact value of this parameter. Copy the results of this test to the Graph Scratchpad
before proceeding.
Figure 4-118. Uniqueness test result for Cr thickness from 1 to 30 nm with SE data only.
Append Data
Now add transmission intensity data to the analysis. Right-click Analysis > Data >
‘Open’ button and select “Append Data” (see Figure 4-119). Browse to the Library
tab, Examples folder, select “Cr on glass_T”, and click ‘Append’ (see Figure 4-120).
This file contains intensity transmission data acquired from the same sample.
Notice the additional graph menus that appear above the graph when multiple data
sets are open. Use the drop-down menus to view each data set (see Figure 4-121).
With data set #2 (transmission intensity) selected, click ‘Generate’. Notice the
model-generated data do not agree with the experimental data in the UV-VIS (for
Layer #1 thickness ~8nm) (see Figure 4-122).
Evaluation of fit result: MSE is low and there is good agreement between model-
generated and experimental data for both data sets. Thickness is 20.86nm. Is this
result unique? Click ‘Fit’ again and you should get the same answer. This is
because the additional information contained in the transmission data breaks the
correlation between Cr thickness and optical properties.
Perform another uniqueness test using the same conditions as before. Notice the
MSE minimum is better defined with a larger scale for MSE (Figure 4-124). Copy the
result to the Graph Scratchpad for easier comparison (Figure 4-125).
Figure 4-124. Uniqueness test result for Cr thickness from 1 to 30 nm with SE+T data.
NOTE: This method works best if you first analyze SE+T from a bare substrate.
Then, use the results from SE+T analysis of the bare substrate in your model when
analyzing SE+T for the coated substrate.
Substrate Thickness
Standard modeling of SE data does not require accurate substrate thickness.
However, if backside reflections are present in the data or if data are acquired in
transmission mode (such as intensity transmission data utilized in the SE+T
approach for thin absorbing films), you may need to enter an accurate substrate
thickness. To do so, you must first turn on Substrate Backside Correction, located
under +MODEL Options. With this option enabled, you can now edit the Substrate
Thickness (see Figure 4-126). You may also need to consider the “# Back
Reflections” value. This value ONLY applies to the SE data. If backside reflections
were suppressed during measurement of the SE data (see Section 3.4 for review on
this topic), set this value to 0.
A new option will now appear under +FIT Options section of the Model panel
(Figure 4-128).
Interference Enhancement
Another approach to thin absorbing films is Interference Enhancement. This
approach requires that the thin absorbing film is deposited over a dielectric layer on
a substrate (thermal oxide on silicon works well) and that multiple angles are
measured. Interference enhancement increases information in the data by varying
the pathlength for different incident angles. This approach works best if the
dielectric layer is around 500nm or more. The advantage of this method over SE+T
is that it only requires one data set.
Open “NiFe on SiO2 on Si” from the Examples folder. Clear the Model panel by
clicking ‘Clear’ and build a starting model with the following details:
• Add “Si_JAW.mat” as the model substrate.
• Add “SiO2_JAW.mat” as Layer #1.
• Add “B-Spline.mat” as Layer #2.
• Expand the B-Spline layer +Nodes section and enter “NiFe.mat” as the
starting mat.
• Turn on Thickness #1 and Thickness #2 as fit parameters.
• Enter 500nm as the starting thickness value for Layer #1, as this is known
or measured prior to depositing the NiFe layer.
• Turn on Global Fit for Thickness #2 from 1-1000nm with 100 guesses.
NOTE: Use Global Fit instead of Thickness Pre-Fit for this example as Thickness Pre-
Fit only operates on the thickest layer in the model. In this case, we know the
thickness of the thickest layer (Layer #1) and want CompleteEASE to find the
thickness of Layer #2.
Evaluation of fit result: MSE is low and there is good agreement between model-
generated and experimental data. Optical constants for NiFe layer (not shown
here) agree with expected values. Thickness #2 is 32.62nm and Thickness #1 is
488.04nm. Are these values unique?
Perform a uniqueness test for each layer thickness (see page 4-129 for introductory
details). For this example, perform a 2D uniqueness test using the settings shown in
Figure 4-131.
Figure 4-131. Suggested settings for 2D uniqueness test for this example.
NOTE: Good sensitivity to the NiFe thickness is a direct result of the interference
enhancement technique and due to the underlying SiO2 layer. The same NiFe film
deposited directly on Si would have strong correlations between thickness and
optical properties and, as a result, a worse parameter uniqueness curve.
NOTE: Not all ellipsometers have mapping capability. If your system does not have
a translation stage, some details specific to analysis of map data will not be
applicable. Other concepts are still more generally applicable, so it is still useful to
work through the exercises.
The sections from this chapter are listed below, along with the primary
CompleteEASE features that are discussed.
In this example, a silicon wafer with thick SiO2 coating was measured at many
locations across the wafer. Our goal is to determine the SiO2 thickness and
refractive index, along with the uniformity of these properties across the wafer.
Figure 5-1. Select Data Range dialog. Use "Graph Wvl." box to specify wavelength for map
graphs.
Right-click in the graph and make sure that “Show Symbols” is checked. This will
mark the individual measurement locations, as shown in Figure 5-2.
Figure 5-3. Spectroscopic data from a single point of the map. This view was accessed by
left-clicking the mouse on a map point.
You can also select a single location from the map view by simply clicking on any
point. Practice selecting different locations by using the “Position” slider bar and by
clicking on individual points within the map. (Remember to check “Show Map
Figure 5-4. Fit result for "Si with Transparent Film" model at single location of "SiO2_Map"
example data.
Evaluation of fit result: MSE is high (>200) but visual fit appears okay. Check optical
constants.
Figure 5-5. Resulting index curve for "Si with Transparent Film" model at center location of
“SiO2_Map” example data.
Evaluation of fit result: Optical constants are not physically plausible as the index
should only increase towards UV wavelengths when k=0.
Thicker films have more interference oscillations, and it can be difficult to visually
confirm the fit quality at short wavelengths when displayed in units of nm.
Wavelength Units – eV
Shortcut: Use Interference oscillations are evenly spaced in units of photon energy (eV) rather than
CTRL+ALT+W to toggle wavelength (nm). Therefore, when working with thicker films, it is often convenient
wavelength units. to view the data in units of eV rather than nm. You can make this change from the
Toggle options depend Options tab. Go to Options > Display Units and select “eV” from the drop-down
on loaded data. menu next to “Wavelength Units” (see Figure 5-6).
With the data displayed versus eV, the interference oscillations are evenly spaced,
and it is easier to see that the model is not fitting the data well in the UV. So, what
happened? We know this is a SiO2 film and should be transparent with n≈1.45 over
this spectral range.
Click ‘Fit’. The Cauchy parameters will adjust to better match this range. The result
is shown in Figure 5-9.
Extend the data range to 5.0eV and refit. Keep adding additional data in 0.5eV
increments and fitting the data until all data are included (up to ~6.5eV). The result
is shown in Figure 5-10 and Figure 5-11.
NOTE: After fitting the data up to 4.5eV, you can perform the additional steps
automatically with the Wvl. Range Expansion Fit command found in +OTHER
Options. Click this command to add and fit small increments of data, up to the full
acquired range.
The MSE is significantly improved (~40) compared to the previous MSE (>200).
Evaluation of fit result: The MSE, visual fit in the UV, and resulting optical constants
are all significantly improved. Index result is physically plausible with index only
increasing toward UV, but MSE is still ~40. Can it be further improved?
Activate all four Sellmeier parameters as fit parameters and click ‘Fit’. Results are
shown in Figure 5-15.
Evaluation of fit result: Sellmeier result better matches the SiO2 index dispersion
into the NIR. The MSE is now < 30. Can it be further improved?
Now, position your mouse on the % Thickness Non-uniformity value (0.00) (see
Figure 5-18). Hold the SHIFT key down and roll the mouse wheel until the model-
generated depolarization data approximately matches the measured depolarization
data, somewhere around 2.4% (see Figure 5-19).
Figure 5-19. Depolarization data with 2.4% Thickness Non-uniformity in model calculation.
Activate % Thickness Non-uniformity as a fit parameter and click ‘Fit’ again. Results
are shown in Figure 5-20.
Evaluation of fit result: The MSE is now < 20. Can it be further improved?
Activate Bandwidth as a fit parameter and click ‘Fit’ again. Results are shown in
Figure 5-24.
Evaluation of fit result: The MSE is now < 18, and depolarization data is matched
better than with Thickness Non-uniformity.
Figure 5-26. Click Configure Options to select hidden option “Include Depolarization Data”.
Now that the option has been made available in the model, we can turn this feature
ON. Expand the +FIT Options section and turn “Include Depolarization Data” to ON
(see Figure 5-27).
Figure 5-27. Model after adding “Include Depolarization Data” to +FIT Options and turning it
ON.
With “Include Depolarization Data” ON, click ‘Fit’ again. The MSE is further reduced
while the bandwidth stays close to its previous value (see Figure 5-28).
Using the final model as shown in Figure 5-29, click Fit > ‘Fit Scan Data’. This will
apply the model to all locations on the map. A status bar will display the progress
as CompleteEASE calculates the fit at each point (see Figure 5-30).
Figure 5-30. A status bar displayed while CompleteEASE fits each point.
Figure 5-31. User slider bar above graph to view fit quality at each location.
Notice the parameters listed in the Fit panel are now blue and underlined. Click on
any of these parameters to view the mapped result, such as Thickness #1, as shown
in Figure 5-32.
Map graphs can be copied to clipboard and pasted as shown in the figures below.
Figure 5-33. Maps of MSE and [email protected] for "SiO2_Map" example data.
Evaluation of fit result: MSE is similar at all locations, indicating a fit quality similar
to the center location which was evaluated independently.
Once again, we will be working with map data from multiple locations across a
sample. This sample is more complex than the previous example. In addition to an
SiO2 coating across the wafer, there are 5 patterned locations on the substrate with
an extra layer of Cr over the SiO2 film. The Cr layers were deposited to nominally
10, 15, 20, 25, and 40nm thick. These layers are thin enough to allow light to
penetrate through to the underlying SiO2 film. They were part of a study of
different ellipsometric methods to measure thin absorbing layers.3 Figure 5-34
shows the location of each of the Cr regions along with their nominal thicknesses in
nanometers.
25
20 40 10
15
Figure 5-34. Overview of sample. The blue region represents a 100nm SiO2 layer. An
additional Cr layer is present at the five orange locations, with the nominal thicknesses in nm
shown for each.
3
J.N. Hilfiker et al. “Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry”, Thin Solid
Films, 516 (2008) pp. 7979-7989.
NOTE: You can also right-click on any location to Unselect, Unselect All, and Delete.
Table 5-1. Shortcut reference for mapping data.
SHORTCUT FUNCTION
CTRL+Click on Point Select/Un-select Point
CTRL+ALT+Click on Point Delete Point
CTRL+ALT+SHIFT+Click on Point Show camera image from point (when
available)
CTRL+space bar Switch view from single point to Map
Blank Model
Open the “Cr on SiO2 MAP” data file. Data from a translation scan will be displayed
as shown in Figure 5-35. Notice the low Psi values (red/yellow) at the 5 locations
coated with Cr. What model should we use to fit the data? In previous examples,
we have started with pre-built models available in the CompleteEASE library. We
can also start from a blank model that has no values or settings pre-determined.
Click Model > ‘Clear’ to clear any previous models. Then, click on the substrate
layer name (“none”) (see Figure 5-36). Choose “Si_JAW.mat” from the Library tab,
Semiconductor folder (see Figure 5-37). Next, click the layer command Add to add
a layer above the substrate. Choose Cauchy.mat from the Library tab, Basic folder
to model the SiO2 layer. Expand the Cauchy layer and right-click on the A, B, and C
values to activate as fit parameters. Make Thickness #1 a fit parameter as well.
Expand the +FIT Options section and turn Thickness Pre-Fit ON. This model should
be adequate to fit any of the areas that do not have a Cr layer (see Figure 5-39).
Figure 5-40. From right-click menu on graph, select the “Set Symbol Size” option.
Zooming on Map
Sometimes it is helpful to zoom in on a region of mapped data, for example, to
better isolate a specific point. To zoom in, click and drag your mouse across a
region of the sample, as shown in Figure 5-42. The graph will update to display only
the selected region, as shown in Figure 5-43. To zoom out to all points, simply
right-click in the graph area and choose “Zoom All” or click “Zoom All” from the
upper-right corner of the graph area.
NOTE: Remember that you can change the scale of the X-axis using CTRL+ALT+W if
needed to match your graphs to this manual.
Check “Show Map Data” to return to the map view. Let’s select data from multiple
points – all of which only contain the SiO2 film – to be graphed and fit at the same
time. To select multiple points, hold the CTRL button down and click on the points
you want to select or use the right-click menu associated with each point. A grey
border will be shown around each data point that is selected, as shown in Figure
5-45.
Figure 5-46. When multiple data points are selected in the map view, they are also available
simultaneously in the spectroscopic view.
Figure 5-48. Choose ‘Set Ranges’ and select only the 65° data from the Selected Angles
panel.
Now, check the “Graph All Data Sets” box above the graph to display Psi curves
from all four locations (see Figure 5-49).
Figure 5-50. Expand +Data Sets menu above graph and choose “Select Current Data Set
ONLY”.
This will exclude all other data points from a fit (see Figure 5-51).
Figure 5-51. Drop-down list of points shows which are not selected and therefore not active
in the fit.
Click ‘Fit’ and the result will be for the selected data set only (see Figure 5-52).
Before proceeding, select each data set individually and click ‘Fit’ to find the
thickness at each of the four selected locations. When finished, expand the +Data
Sets menu and choose “Select ALL Data Sets” before moving on to the next section.
NOTE: The “Graph All Data Sets” checkbox only applies to selected data. Initially,
all data sets are selected by default. If you limit the selected data sets, the un-
selected data sets will not be graphed. Expand the +Data Sets menu and choose
“Select ALL Data Sets” as needed to graph or fit all data sets.
Now, when you expand the +MODEL Options section, you will find a +Multi Sample
Analysis option available (see Figure 5-54). Expand +Multi Sample Analysis and
you will see a column containing all selected data sets. In this example, we have
four (as selected previously, see Figure 5-45).
Click Add Fit Parameter and select a fit parameter to vary between data sets from
the drop-down list. For this demonstration, choose “Thickness # 1”, which is the
SiO2 film thickness (see Figure 5-55).
The thickness for each data set will appear as an individual parameter in a new
column next to the numbered data sets (see Figure 5-56). Here, we can vary and fit
the thicknesses individually while the optical properties (as defined by the Cauchy
layer in this example) remain common for all data sets.
With the Thickness #1 parameter added in the MSA section, click ‘Fit’. The result is
shown in Figure 5-57. Notice that each data set has its own thickness value and
model-generated curve in the graph.
Figure 5-58. +Data Sets menu with "Clear Multi-Data Set Mode" selected.
Use the “Show Map Data” checkbox (or CTRL+space bar) to view map data. Before
we select the Cr coated areas, we want to disable automated fitting. To do so,
right-click in the Fit panel and uncheck “Auto Fit” (see Figure 5-59).
NOTE: Turning off Auto Fit ensures that unintentional clicks do not result in model
changes.
Now, click the center point in the graph. For the Cr analysis, we need multiple
angles of incidence. Recall that we had selected only one angle in a previous step.
Click on ‘Set Ranges’, then ‘Select All Angles’, and ‘Ok’ to restore the additional
angles measured (see Figure 5-60). The data will appear as shown in Figure 5-61.
Figure 5-60. Click 'Select All Angles' to restore all measured angles.
Figure 5-61. Psi data from center location (X=0, Y=0) at all angles.
Recall from Chapter 4 that metals can be described by a B-Spline layer. Choose the
B-Spline.mat as the new layer (see Figure 5-63).
With Layer #2 added in the model, expand the B-Spline layer +Nodes section and
change the Starting Mat. From “none” to Cr.mat (see Figure 5-64). The B-Spline
nodes will update to match Cr optical constants as published in Palik’s Handbook of
Optical Constants of Solids.
Hold the SHIFT key and roll the mouse wheel over the Thickness #2 value until the
model-generated data approximately matches the experimental data. You will find
that no thickness value matches the data exactly. This is because the optical
properties of the Cr layer on this sample are not quite the same as the optical
properties contained in Cr.mat. This is common for metals, which will differ
optically with different deposition methods and processing conditions. Set the
thickness to the nominal expected value of 40nm and click ‘Generate’ (see Figure
5-66).
Figure 5-66. Model-generated data with Thickness #2 set to the nominal expected value of
40nm.
Let’s use the expected thickness of 40nm to bring the optical constants closer to the
sample values. Leave the Cr thickness fixed at 40nm (do not activate as a fit
parameter) and click ‘Fit’. Results are shown in Figure 5-67.
Evaluation of fit result: The MSE is ~4, but there is a visual mismatch between the
model-generated data and experimental data around 360nm. This is an
interference enhancement from the underlying SiO2 film. We will only match this
region well with the correct Cr thickness.
Now that the optical constants of Cr in the model are closer to the measured data,
we can let the thickness adjust to a more accurate value. Add the Cr thickness as a
fit parameter and click ‘Fit’ again. The final result is shown in Figure 5-68.
Evaluation of fit result: The MSE is ~2 and visual fit quality is good across the full
spectrum. B-Spline optical constants trend as expected for Cr, absorbing
everywhere and increasing into the NIR (see Figure 5-69). Thickness appears
unique over a wide range (see Figure 5-70).
Figure 5-69. B-Spline optical properties compared to Palik’s optical properties for Cr.
Next, switch to the Spectroscopic View (“Show Map Data” checkbox or CTRL+space
bar). Turn off the double Y axis and set ranges to only 65 degrees. This will allow a
more convenient comparison of the data sets, as shown in Figure 5-72. From this
data alone, we can estimate the points with thickest-to-thinnest Cr layers based on
the shifts in data. The thickest point was at center (in purple). As the data shifts,
the Cr film gets thinner.
Figure 5-72. Spectroscopic view comparing Psi curves from each of the five selected locations
(65° data only).
Now, let’s prepare the Multi Sample Analysis. Expand the +MODEL Options, then
+Multi Sample Analysis section. If any parameters are leftover from the previous
analysis, click Delete All Parms. Next, click Add Fit Parameter, and choose Thickness
#2. If done correctly, the MSA section will now appear as shown in Figure 5-73.
NOTE: The thickness values are based on the most recent fit result. If your value is
not ~47nm, manually change each thickness in the MSA section before proceeding.
Alternatively, you can right-click the “Thickness #2” column header and select “Set
Parm Values” (see Figure 5-74). Enter 47nm in the subsequent dialog.
Figure 5-74. Right-click the “Thickness #2” column header and select “Set Parm Values”.
NOTE: Make sure you are adjusting the thickness parameter that corresponds to
the selected data set displayed in the graph.
After you have the thickness for data set #1 adjusted, graph data set #2 and adjust
the corresponding thickness parameter. Repeat until the thicknesses for data sets
#1-5 are completed (see Figure 5-75).
Figure 5-75. All five thickness values in the MSA section of the model have been adjusted to
approximately match the experimental data for each data set. Data Set #1 is displayed in the
graph.
After the thicknesses for each data set have good starting values, check “Graph All
Data Sets” again. Your graph should look similar to Figure 5-76. If the model-
generated curves are approximate to the experimental curves, you are ready to fit
the data. Click ‘Fit’. All five data points will be fit simultaneously with a single B-
Spline layer to describe the common Cr optical constants and individual thicknesses
for the Cr layers. The fit result should appear as shown in Figure 5-77.
Figure 5-77. Fit result for all five Cr locations with Multi Sample Analysis.
Evaluation of fit result: The MSE is ~18 and visual fit quality is okay for most of the
data but the model-generated data visually differs from the experimental data
below 300nm and for data set #3.
Metal optical constants can vary with thickness due to microstructure. Data set #3
is the thickest Cr location. Let’s try excluding this location from the multi sample
analysis and see if a better fit to the remaining data sets is achieved.
To do exclude the thickest Cr location, choose the data set with (0,0) coordinates
from the drop-down list above the graph. Expand the +Data Sets menu and choose
“Un-Select Current Data Set” (see Figure 5-78). The curve for the center point
should disappear – leaving only four curves and their corresponding models. Click
‘Fit’ again and the MSE drops from ~18 to <10 (see Figure 5-79).
NOTE: It is important to choose “Un-Select Current Data Set” rather than “Delete
Current Data Set”. If “Delete Current Data Set” is chosen, the mutli sample analysis
renumbers the remaining data sets, which would require re-establishing the
starting thickness value for each data set.
Evaluation of fit result: Excluding the thickest Cr location does in fact yield a better
MSE (~10) and fit quality is improved for the remaining data sets below 300nm.
Metals also typically have roughness and/or oxidation at the surface. To test this,
add surface roughness to your model (toggle “Include Surface Roughness = ON”)
and add it as another fit parameter in the +Multi Sample Analysis list (click “Add Fit
Parameter”, then choose “Roughness”). This will allow each point to have different
amounts of roughness. Click ‘Fit’(see Figure 5-80).
Evaluation of fit result: MSE drops from ~10 to ~6. Surface roughness increases
with the thickness of the film.
With surface roughness included in the model, try adding the thickest Cr point back
into the analysis. See if the model with surface roughness better matches the
center location and if the trend of roughness increasing with thickness is consistent.
To add the center location back to the multi sample analysis, expand the +Data Sets
menu and choose “Select ALL Data Sets” (see Figure 5-81). The graph will again
display all five data sets, and five values for Thickness #2 and Roughness will be
tabulated in the +Multi Sample Analysis section of the model.
Figure 5-81. +Data Sets menu with "Select ALL Data Sets" selected.
With all five data sets in the analysis, click ‘Fit’ again (see Figure 5-82).
Evaluation of fit result: The MSE increases slightly from ~6 (for the same model
applied to the four thinnest data sets) to ~8 but is significantly improved over the
previous result without roughness applied to all five data sets (MSE ~18). .
At this point, research could continue by testing the samples with other techniques
– such as Atomic Force Microscopy – to see if the roughness result agrees for this
sample.
As a final exercise, add all angles back to the analysis. Click ‘Set Ranges’ > ‘Select All
Angles’ > ‘Ok’. Notice that when multiple multi-angle data sets are selected, each
data set is graphed with the same color. For example, all curves for data set #1 are
magenta and all curves for data set #2 are blue. Before fitting again, turn on the
SiO2 thickness as a fit parameter and add Thickness #1 to the list of Multi Sample
Analysis parameters. Click ‘Fit’. The final result is shown in Figure 5-83.
NOTE: Before starting this example, change the Wavelength Units to “eV” and the
Optical Constant Units to “e1 & e2” from Options > Display Units.
4
P.G. Snyder, J.A. Woollam, S.A. Alterovitz, and B. Johs, “Modeling AlxGa1-xAs Optical Constants as Functions of
Composition”, J. Appl. Phys. 68 11 (1990) 5925.
The model is shown in Figure 5-85. Click ADD MATERIAL seven times to add seven
layers to the model. Each of these layers will be used to hold the optical constants
for a specific composition of Si1-xGex. There are 10 Si1-xGex material files in the
Examples folder that were measured from a series of thin films with known
composition (as determined from XRD). In addition, we can use crystalline Silicon
and Germanium as the endpoints for this material file. The compositions related to
each material file are provided in Table 5-2.
Table 5-2. Compositions for each Si1-xGex material file used in this example.
Si_jaw.mat 0% (x=0.000)
SiGe-1.mat 5.2% (x=0.052)
Turn “OC Library Mode” ON to set the compositions for each layer. Change the “x”
value for each material to the corresponding composition from Table 5-2 for each
layer (see Figure 5-87). The temperatures can remain at 25° Celsius for all files.
Before proceeding to build the OC Library from these reference files, set the Wvl.
Range to match the material files. For the SiGe material files, the optical constants
were measured from 248nm to 1240nm (1eV to 5eV). Also, the “# of Wvls” may
You can simplify the graph by changing the “Graph Type” in the Draw Graph
command at the bottom of the Model panel. The default view is e1 & e2. Click on
this value to view other options, including e1 only or e2 only (see Figure 5-89).
Viewing the Shifted Spectra and Wvl Shift Function can help assess whether the
composition library is successful. For advanced users, the Library Resolution and
Spectra Shifting Parameters can be modified, as shown in Figure 5-90.
You can zoom in on each of the graphs to further assess whether the library
algorithm was successful. Figure 5-91 shows a zoomed view of the e2 peak for the
SiGe films. This shows that the peaks are shifted to higher energy with increasing
silicon composition.
Figure 5-91. Zoomed view of the e2 peak for the SiGe compositions, showing a nice shift in
critical point toward higher energy for increasing silicon composition.
Save OC Library
After successful calculation of a composition- or temperature-dependent optical
constant library, click the Save OC Library command at bottom of the Model panel
to save your library as a single material file. For this example, save it in the Projects
tab, Common folder as “SiGe comp.mat” (see Figure 5-92).
Figure 5-92. Save SiGe comp.mat in the Projects tab, Common folder.
The newly created “SiGe comp.mat” can now be used to fit SiGe data files. To
demonstrate what this file looks like and how it operates, load “SiGe comp.mat” as
the Ref. Material in the “Opt. Const. Compare” model. Then, expand the layer to
view the composition value (see Figure 5-93).
To adjust the composition value of the “SiGe comp” layer, hold down SHIFT+roll
mouse wheel. You will be able to visualize the optical constants shifting as the
composition is varied. An example is shown in Figure 5-94, where the composition
value of the “SiGe comp” layer has adjusted to x=0.75 (black curve).
Figure 5-94. “SiGe comp” (Ref. Material) composition set to 0.75. Notice it is well-spaced
between x=1 (Ge) and x=0.539 (sige-10).
In this example, we will allow a layer to have anisotropic optical constants, where
the index normal to the sample surface is different than the index in the sample
surface plane. This is common for many polymer films that are oriented along a
specific direction.
To start, open the “Anisotropic Polymer on Si” data file from the Examples folder.
Psi values for this data set are shown in Figure 5-95. The oscillations show that this
film is transparent in this spectral range. Open the “Si with Transparent Film”
model and click ‘Fit’. The results of this fit should appear as seen in Figure 5-96.
Evaluation of fit result: MSE is high (Out Of Spec.) and visual fit to the data is poor.
Upon closer inspection, the data at 75° shows a common “signature” of anisotropy
in the film. The interference oscillations from anisotropic films will often “tilt” such
that the curves are higher on one side of the peak and lower on the opposite side.
This is demonstrated for a 900nm anisotropic film on Si at 75° in Figure 5-97. The
red curve represents an isotropic film. The green curves are higher on the long
wavelength side of a peak and lower on the short wavelength side. These represent
anisotropic films with Nx < Nz. The blue curves are lower on the long wavelength
side of a peak and higher on the short wavelength side. These represent
anisotropic films with Nx > Nz.
Use the Try Alternate Models feature described in Section 3.5 to test for surface
roughness, grading, and simple anisotropy. Results are shown in Figure 5-98.
Convert to Anisotropic
Right-click the layer name (in this example, “Cauchy Film”) to access the layer
options menu. From this list, choose to “Convert to Anisotropic” (see Figure 5-99).
The Cauchy layer will now become embedded as part of a new layer named
“Biaxial”. Biaxial is a term for anisotropy where Nx, Ny, and Nz are all different.
However, the layer name “Biaxial” is used here to describe any anisotropic film.
Within the Biaxial layer, you can choose either Uniaxial or Biaxial anisotropy. For
this example, we will assume that the film is only uniaxially anisotropic.
Figure 5-99. Right-click the layer name and select “Convert to Anisotropic”.
Biaxial Layer
The biaxial layer can be used in two different ways, and both will work equally well
for this example. The choice is whether to have Difference Mode OFF or ON (see
Figure 5-100 and Figure 5-101).
Figure 5-100. Biaxial layer with Uniaxial anisotropy and Difference Mode OFF.
Figure 5-101. Biaxial layer with Uniaxial anisotropy and Difference Mode ON.
Equation 5-1
𝐵 𝐶 𝐷
𝑛𝑧 − 𝑛𝑥𝑦 = 𝐴 ∗ (1 + 2
+ 4
+ − 𝐼𝑅 ∗ 𝑤𝑣𝑙 2 )
𝑤𝑣𝑙 𝑤𝑣𝑙 𝑤𝑣𝑙 6
This method can be extremely useful when the fit is primarily sensitive to the index
difference and less sensitive to the absolute value of the index.
NOTE: Difference Mode is only recommended for spectral ranges where the
material is transparent. If absorptions are present, it can produce incorrect results.
For this example, turn the Difference Mode ON. Use SHIFT+roll the mouse wheel
over the dZ_A parameter. If you roll this parameter to positive numbers, the
simulated curve will look worse than the isotropic fit (tilt in wrong direction).
However, if you roll the dZ_A parameter to negative values, it will start to match
better.
Turn on dZ_A and dZ_B as fit parameters. Click ‘Fit’. The result is shown in Figure
5-102.
Evaluation of fit result: MSE is significantly improved and visual fit to the data is
good. What are the optical constants of the film?
Right-click Biaxial and choose “Graph Layer Optical Constants” (see Figure 5-103).
This will show ordinary (Nx = Ny) and extraordinary (Nz) optical constants (see
Figure 5-104). You can also choose “Graph Layer Optical Constants (anisotropic
differences)” to display the difference between ordinary (Nx = Ny) and
extraordinary (Nz). The graph will display “o-e” as shown in Figure 5-105.
Figure 5-103. Right-click the layer name and choose "Graph Layer Optical Constants".
You can also view the optical constants of only a single direction by right-clicking on
the individual material file describing that direction (see Figure 5-106). For access
to all directions, you must fit with Difference Mode OFF.
Figure 5-106. When Difference Mode is OFF, you can right-click on the various material files
describing the directions in the Biaxial layer to view them separately.
This chapter includes further examples pertaining to in-situ data analysis. The most
common analysis strategies for dynamic measurements use “Multi-Timeslice”
analysis, which is discussed in the first example. We also demonstrate the use of a
Growth Rate and Optical Constants model (GROC) that is very easy to apply when
the film is an absorbing film with constant growth rate and optical constants.
The sections from this chapter are listed below, along with the primary
CompleteEASE features that are discussed.
In-situ data is dynamic ellipsometric data measured over time. Typically, some thin
film process is occurring during this time. The model may need to account for
changes in film thickness, optical constants, composition, or even temperature
versus time. The navigation, manipulation, and analysis of in-situ data have many
parallels with the corresponding processes for uniformity maps and multi-sample
analysis.
First, navigating and selecting timeslices from in-situ data will be discussed. Second,
the data will be analyzed via a multi-sample-analysis approach. Finally, the data will
be analyzed via a time-dependent data-analysis procedure. Previous chapters
should be reviewed in detail before proceeding with this example.
SHORTCUT FUNCTION
Click on dynamic graph Opens spectroscopic data from that timeslice.
CTRL+click dynamic graph Selects spectroscopic data from that timeslice.
Repeat for multiple timeslices.
CTRL+space bar Switch view from dynamic to spectroscopic
data.
Figure 6-3. To view the spectroscopic data at the selected timeslice, use CTRL+space bar or
uncheck the “Show Dynamic Data” checkbox above the graph.
Figure 6-4. Right-click in the Fit panel and turn off the “Auto-Fit” checkbox.
Building a Model
Now, let’s build a model to fit this timeslice. We’ll start with the assumption that
the sample coating has known optical constants.
First, load “BK7 Glass.mat” from the Library tab, Dielectric folder, into the model
substrate. Next, add a layer over the substrate and load “a-Si parameterized.mat”
from the Library tab, Semiconductor folder. Activate the a-Si thickness as a fit
parameter. When finished, the model should look like Figure 6-5.
Click ‘Fit’ to fit only this selected timeslice. The result is shown in Figure 6-6.
Use the Try Alternate Models command to see if any common complexities
significantly improve the model. Results are shown in Figure 6-7. MSE drops from
near 80 to under 2 with surface roughness. Click ‘Apply Chosen Model’ to update
the model to include surface roughness. The improved fit with surface roughness is
shown in Figure 6-8.
Figure 6-8. Fit result for time near 3 minutes after including the surface roughness.
Evaluation of fit result: MSE and visual fit to the data are significantly improved.
Model is physically meaningful as a-Si typically has surface oxide, roughness, or
both.
‘Fit Dynamic’
Now, we can fit these two parameters versus time to see how they change as the
data vary across the measured time span. Simply click the ‘Fit Dynamic’ button in
the Fit panel, and CompleteEASE will start at the first timeslice and fit through the
last timeslice, using the previous timeslice results as starting values for the next
timeslice. A status bar will appear while CompleteEASE is working as shown in
Figure 6-9. When finished, the spectroscopic view of the last result should appear
as shown in Figure 6-10.
Figure 6-11. Dynamic view of the fit results for all data from 0-10 minutes.
Figure 6-15. Use slider bar above graph in spectoscopic view to select timeslice.
With a timeslice near 0.3 minutes selected, roll the thickness value until the model-
generated curves approximately match the experimental curves. Then click ‘Fit’.
The result is shown in Figure 6-16.
NOTE: It may be easiest to turn off surface roughness, adjust the a-Si thickness, and
repeat the Try Alternate Models command.
After a good fit to the 0.3-minute timeslice is achieved, click ‘Fit Dynamic’ again.
Results are shown in Figure 6-17 through Figure 6-20.
Evaluation of fit result: The model fits well for all timeslices. MSE is low for all
timeslices. Roughness is mostly constant for all timeslices, and a-Si growth is
constant during process.
This time, with better starting values for the beginning of the measurement, the
model worked well for all timeslices.
With multiple timeslices selected, use CTRL+space bar or uncheck “Show Dynamic
Data” to display the spectroscopic view. The selected timeslices can now be viewed
individually using the drop-down menu or simultaneously by checking “Graph All
Data Sets” (see Figure 6-22). This process is similar to viewing multiple selected
locations with mapping data (see Chapter 5).
NOTE: To quickly select multiple consecutive timeslices, use CTRL+click and drag
over the graph area you wish to select. CompleteEASE will ask how many sets you
wish to add to the multi-data set analysis, and it will select evenly distributed
timeslices within the specified range.
Use these options to select or un-select data sets from the multi-data set analysis or
to clear multi-data set mode and return to the full dynamic data.
NOTE: ‘Fit Dynamic’ cannot be used when multiple timeslices are selected.
Now, when the +Model Options section is expanded, there is a +Multi Sample
Analysis subsection that can be further expanded. Expand the MSA section and
click Add Fit Parameter. Choose Thickness #1. When finished, your model should
appear as shown in Figure 6-25.
Next, adjust the starting thickness value for each timeslice. To do so, select each
timeslice individually and scroll each thickness until the model-generated curve
approximately matches the experimental curve for each data set. When finished,
Figure 6-26. Starting points for all timeslices have been adjusted by rolling the mouse wheel
over each individual thickness from within the multi-sample analysis section of the model.
Click ‘Fit’ and all thicknesses (for each timeslice) along with a single roughness value
that is used to fit all data sets are varied. This result is shown in Figure 6-27. If the
roughness was also changing with time, its thickness could be added as a time-
dependent variable within the multi-sample analysis section.
Click ‘Generate’ and notice that the model-generated curves do not quite match the
experimental curves (see Figure 6-29).
Now, click ‘Fit’ and CompleteEASE will adjust the a-Si optical constants via the
B-Spline layer to fit all five data sets simultaneously while allowing the thickness at
each timeslice to fit independently. The result is shown in Figure 6-30, with the
B-Spline optical constants shown in Figure 6-31.
At this point, the B-Spline/a-Si optical constants could be saved and used for fitting
the full dynamic data.
Virtual Interface
A virtual interface can simplify dynamic data analysis by allowing us to ignore some
of the sample structure and only consider the current thin-film growth. The virtual
interface is placed near the surface of the film that is being studied. For example, in
Figure 6-32 below, if we are determining the optical constants of Layer #3, we
would place the virtual interface inside Layer #3 and ignore underlying materials.
Layer 3
Virtual
Layer 3
Interface
Layer 2
Layer 1
Pseudo-Substrate
Substrate
Figure 6-32. A virtual interface allows the underlying sample structure to be approximated by
a single interface. The optical constants at this interface are called the “pseudo-substrate”.
There are different ways to calculate the virtual interface, but we will limit our
discussions to the common pseudo-substrate approximation (CPA). This
assumption replaces everything below the virtual interface by an effective, semi-
infinite substrate that has optical constants equal to the pseudo dielectric values for
the stack below that level. This approximation works amazingly well for
semiconductors and other high-index materials but does not work for low-index
transparent materials, like glass.
The GROC model is shown in Figure 6-34. Notice it does not contain a layered
structure, unlike models in previous examples. It is designed to simplify the
simultaneous extraction of growth rate and optical constants from dynamic in-situ
data. The GROC model utilizes a ‘virtual interface’, which means that the user does
not have to specify an optical model for the underlying layers/materials. The GROC
model assumes a constant growth rate, constant surface roughness, and that the
optical constants do not vary with film thickness over the specified time.
The common pseudo-substrate approximation (CPA) used within the GROC model is
not generally valid for all materials but works well for growth of semiconductors on
semiconductors or the deposition of absorbing materials (such as metals, after
about 5 nm of growth).
NOTE: The GROC model assumptions are not valid during the nucleation phase of
growth.
Rate
Rate specifies the constant growth rate of the layer. The GROC model opens with
this parameter active as a fit parameter. Like any other fit parameter, the starting
value should be close to the actual value.
Layer
The layer is used to determine starting values for optical constants when “Fit Opt.
Const. = ON” and specifies the optical constants of the layer when “Fit Opt. Const. =
OFF”. Any fit parameters defined in the layer will be included in the GROC analysis
of the data when the polynomial fitting is turned off (“Fit Opt. Const. = OFF”).
Angle Offset
NOTE: Angle Offset is only applied when ‘Fit Opt. Const. = OFF’ to avoid 100%
correlation.
Specifies an offset to the nominal angle of incidence specified in the experimental
data file. Fitting the angle offset may be useful when known reference optical
constants are specified in the “Layer” field and are not allowed to vary.
Roughness
Specifies and/or fits the surface roughness of the growing film, which is assumed to
be constant during the selected time range. It is not always possible to uniquely
extract the optical constants, growth rate, and surface roughness; an adequate
thickness of grown material (>> ¼ wave) must be encompassed by the selected time
range. Otherwise, the roughness should not be included in the fit.
Max. Times
To minimize analysis time, the GROC model limits the timeslices during analysis to
the number specified. Selected timeslices are evenly distributed across the selected
time range.
Seed Thickness
To improve the robustness of the fit, the GROC model performs an initial fit with an
initial subset of the selected time range before fitting all of the data. The ‘Seed
Thickness’ specifies how much time should be included in this initial fit (the initial
growth rate is used to calculate the time, given the ‘Seed Thickness’). For most fits,
the default value is acceptable, but in some cases, smaller or (more likely) larger
values could be tried if the fit does not converge properly.
Multilayer Example
Open the “Dynamic Ta-Si Multilayer” data file from the Library tab, Examples folder.
This file is a dynamic in-situ measurement, so it has the “.iSE” extension. If you
cannot locate the file, check the drop-down box to ensure the dialog is showing .iSE
files (see Figure 6-35).
Upon opening, the graph will display Psi versus Time (see Figure 6-36).
The data were collected during growth of six consecutive films, as detailed in Table
6-2. For the first minute, the substrate was monitored without film growth. Then,
six films were deposited, alternating between Ta and a-Si. For each layer, the
sputter gun current was varied to change the growth rate. Our goal in this example
is to determine the growth rate and optical constants for each of the six layers to
characterize the process conditions for this sputter chamber.
Table 6-2. Process conditions for all six layers of the dynamic Ta-Si multilayer.
Figure 6-37. Click the ‘Set Ranges’ button to select the time range for the first Ta film (1 to 6
minutes).
Set the starting values for the virtual-interface optical constants by loading a
starting material file into the “Layer”. Click on none and choose Ta.mat from the
Library tab, Metal folder (see Figure 6-38). The Model panel and Graph should now
look like Figure 6-39. Next, click ‘Fit’ and you should get the results shown in Figure
6-40.
Figure 6-40. Results of GROC analysis over time range from 1-6 minutes for Ta film.
Recall that the GROC model requires the optical constants and growth rate to be
constant over the selected time range. The Ta layer deposition may not have
started at exactly 1 minute and the first few data points of growth may show
nucleation effects where the metal optical constants are not consistent with the
thicker layer. Try selecting data from 2-6 minutes to ignore the early stages of film
growth. Click ‘Fit’ again. Results are shown in Figure 6-41.
Figure 6-41. GROC analysis for Ta film growth from 2-6 minutes, ignoring the early stages of
film growth where the film optical constants may vary during nucleation.
Evaluation of fit result: MSE drops from ~18 to ~1.5. Result is significantly
improved by selecting 2-6 minutes instead of 1-6 minutes.
NOTE: Use the ‘Show Data’ button above the graph if needed when selecting new
time ranges. The ‘Show Data’ button always switches the graph view back to
showing the experimental data.
NOTE: When you start a new region, the GROC model will calculate a new virtual
interface, but the growth rate will be left over from the previous fit. You can adjust
the growth rate to a better starting value if needed by using the mouse wheel to
scroll the parameter until the model-generated data approximately match the
experimental data.
Results for the second and third Ta films are shown below (see Figure 6-42 and
Figure 6-43).
A comparison of all three Ta films using the Fit Log and Graph Scratchpad is shown
below (see Figure 6-44, Figure 6-45, and Figure 6-46).
Figure 6-44. Comparison of MSE and growth rate for Ta from Fit Log.
Figure 6-47. Comparison of MSE and growth rate for a-Si from Fit Log.
3.5
Ta
3 a-Si 2.57
1.5 1.27
1.12
1
0.53 0.46
0.5
0
0 0.1 0.2 0.3 0.4 0.5 0.6
Gun Current
Figure 6-50. Growth Rate for Ta and a-Si films versus sputter gun current.
Figure 7-1. CompleteEASE with the Hardware tab selected. Screen may vary depending on
ellipsometer model.
‘Show Data’
If optical constants (or something else besides data) are being graphed, you can
press this button to go back to the data graph.
Select Range
To “zoom in” on a specific spectral range, click and drag over the desired spectral
range (Figure 7-2). The graph will then redraw, plotting only the selected spectral
range.
Figure 7-2. To select a specific spectral range, hold down the left mouse button and drag the
mouse over the desired range.
The same is true for uniformity maps, as shown in Figure 7-3. Dragging the mouse
over an area (left) will select this region to graph (right).
Figure 7-3. Click and drag the mouse over area of the map (left) to select that area of the
map (right).
NOTE: “Zoom All” does not appear in the top right corner of the graph if “Use
Clipboard Aspect Ratio” is active.
Figure 7-4. “Zoom All” by clicking in the top right corner of the graph or by right-clicking and
selecting “Zoom All”.
Figure 7-5. Right-click menus for a spectroscopic scan (left) and a map (right).
Statistics
The graphed data undergo a variety of statistical calculations. For example, a
straight-through measurement of air can be used to verify measurement accuracy.
The statistics of this measurement can then be calculated, as in Figure 7-6.
Figure 7-7. Choose from X Axis, Y Axis, or X and Y Axes when copying map data to the Graph
Scratchpad. Note the reference point is shown in parentheses.
Figure 7-8. The Graph Scratchpad can be used to compare curves and/or customize graphs.
Show Legend
Show or hide the graph legend box.
Show Symbols
Turn on/off graph symbols. Figure 7-9 shows an example data graph with symbols
on.
NOTE: If symbol size is set to zero, CompleteEASE will attempt to auto-size the
symbols to best fit the graphed data.
Figure 7-10. Enter the number of standard deviations to use for calculating the Z-range.
Cancel Menu
Close the right-click graph menu.
NOTE: The “<Pseudo> Transforms”, as shown in Figure 7-15, are hidden by default
in CompleteEASE. See section below for how to display them.
Psi, Delta
When Psi or Delta are selected, the graphs plot the standard ellipsometry
parameters for amplitude ratio, Psi (), and phase difference, Delta (). These are
traditional representations of an ellipsometry measurement, based on Equation
7-1.
Rs
Re(rho), Im(rho)
Real and Imaginary rho graphs refer to an alternate view of the ellipsometry
measurement, based on rho (), as given in Equation 7-1.
N, C, S
Another alternate form of viewing ellipsometry measurements is based on the
Mueller Matrix formalism. For a standard, isotropic sample with no depolarization,
the Mueller Matrix response would appear as shown in Equation 7-2.
Equation 7-2
1 −N 0 0
− N 1 0 0
M isotropic =
0 0 C S
0 0 − S C
Where
Equation 7-3
The <Pseudo> Transforms menu expands to include <e1>, <e2>, <n>, and <k>, as
shown in Figure 7-18. These are referred to as the pseudo optical functions to
differentiate from the actual material optical functions. They are a direct
calculation based on the measured ellipsometry data with the assumption of a
single reflection from the surface. This calculation is given in Equation 7-4. The
transformation can be performed for any data set, but the pseudo curves lose
meaning when the assumption of single reflection is not valid. In other words, they
only transform the data correctly for a substrate. The pseudo optical constants are
NOT equal to the material optical constants if there are any thin films or surface
layers present during measurement of the ellipsometry data.
Equation 7-4
~ 1−
2
Intensity
This option shows the reflected or transmitted intensity that is collected at same
time as SE data using CompleteEASE. The intensity represented here is an average
of the p- and s- polarization components. The accuracy of the intensity data
depends on the instrument calibration. Please consult your hardware manual to
improve intensity accuracy.
Because M-2000 and RC2 spectroscopic ellipsometers collect data from the AC
signal, the intensity value measured here is also from the AC signal. Similarly, the
model calculations only consider the AC components. Depolarization is measured
from the DC signal and will not be measured (or modeled) as part of the intensity.
NOTE: See p-s (Total) Intensity under +Data > More Options to view the effects of
depolarization on intensity (see Figure 7-20).
Depolarization
Percent depolarization is collected on ellipsometers that incorporate adjustable or
rotating compensators. This information can be used to determine sample and
measurement non-idealities such as thickness non-uniformity, spectrometer
bandwidth, angular spread, and backside reflections.
In the presence of depolarization, the Mueller Matrix for an isotropic sample is
written in Equation 7-5. In ellipsometry, all Mueller Matrix elements are
normalized to the first element, M11.
1 − PN 0 0
− P N P 0 0
M sample =
0 0 P C PS
0 0 − PS P C
Equation 7-6
P = N 2 + C2 + S2
Equation 7-7
%𝐷𝑒𝑝𝑜𝑙𝑎𝑟𝑖𝑧𝑎𝑡𝑖𝑜𝑛 = (1 − 𝑃2 ) ⋅ 100%
Difference Mode
Difference Mode plots the difference between experimental data and model-
generated data.
More Options
Additional graphing choices are listed under “More Options” (see Figure 7-20).
p- s- Intensity
The p- and s- Intensity values are measured from the AC signal. Thus, these values
represent Rp and Rs for reflection and Tp and Ts for transmission. Because they are
calculated strictly from the AC signal of the M-2000 or RC2 ellipsometers, these
values will not contain any effect from depolarized light. When CompleteEASE
models this data, it also calculates values corresponding to AC measurements.
p- s- Intensity (Total)
The p- and s- Intensity (Total) values are measured from both the AC and DC signal
to measure the total reflection or transmission in the p- and s- directions and
include effects of depolarized light. This would be a better comparison to most
spectrophotometric measurements (or even measurements from WVASE) as most
do not distinguish between p-, s- and the unpolarized light along p-, s-.
Error Bars
The error bars of Psi, Delta, Depolarization, Intensity, and Mueller Matrix elements
are calculated during measurement to estimate the random error associated with
each data point.
Equation 7-8
~
rpp ~
rsp
J Anisotropic = ~
rps rss
~
As ellipsometry measurements are a ratio of Jones matrix elements, there are three
measured values possible to access the entire Jones Matrix. These values are
referred to as AnE, Aps, and Asp (see Equation 7-9, Equation 7-10, and Equation
7-11).
Equation 7-9
~
r
AnE = tan( )ei = ~pp
rss
Equation 7-10
~
r
i p s
Aps = tan( ps )e = ~ps
rpp
Equation 7-11
~
r
i sp
Asp = tan( sp )e = ~sp
rss
When Generalized Ellipsometry data are present, you can select “Show GE Items”
from the +Data menu (Figure 7-21). In addition to menu options detailed above,
you will also find “Select Ratios to Graph”.
Equation 7-12
NOTE: The matrix is often normalized to m11. In this case, m11 is not graphed
when “Mueller Matrix Diag” is selected.
1 −N 0 0 1 m12 0 0
− N 1 0 0 m21 1 0 0
=
0 0 C S 0 0 m33 m34
0 0 −S C 0 0 m43 m44
Figure 7-24. Select the Mueller Matrix elements you wish to graph by checking the
appropriate boxes.
The Mueller Matrix elements available for graphing will coincide with the measured
values. The last row/column of the Mueller matrix requires probing and detection
of the handedness of the polarization. This requires a compensator before or after
the sample. The RC2 has rotating compensators before and after the sample, so it
can detect all 16 elements of the Mueller Matrix, though generally represented as
ratios to the M11 element. Other ellipsometer types may have compensators
before or after the sample, which allows them to only collect the first three rows or
first three columns. Rotating analyzer and rotating polarizer ellipsometers (without
compensator before or after sample) can’t detect the fourth row and the fourth
column. These various configurations are shown in Equations Equation 7-14,
Equation 7-15, Equation 7-16, and Equation 7-17.
• • •
• • •
M RAE,RPE =
• • •
Equation 7-15
• • • •
• • • •
𝑀𝑅𝐶𝐸(𝐶𝑜𝑚𝑝𝑒𝑛𝑠𝑎𝑡𝑜𝑟 𝑏𝑒𝑓𝑜𝑟𝑒 𝑠𝑎𝑚𝑝𝑙𝑒) =[ ]
• • • •
× × × ×
Equation 7-16
• • • ×
• • • ×
𝑀𝑅𝐶𝐸(𝐶𝑜𝑚𝑝𝑒𝑛𝑠𝑎𝑡𝑜𝑟 𝑎𝑓𝑡𝑒𝑟 𝑠𝑎𝑚𝑝𝑙𝑒) =[ ]
• • • ×
• • • ×
Equation 7-17
• • • •
• • • •
M RC 2 =
• • • •
• • • •
MM-Jones Quality
This graph helps determine whether the Mueller Matrix can be converted into a
corresponding Jones Matrix. The Mueller Matrix can handle both isotropic and
anisotropic samples with and without depolarization. The Generalized Jones matrix
can also handle both isotropic and anisotropic samples but does not handle
depolarization. Thus, the MM-Jones Quality factor will only be close to zero when
the conversion is successful, signifying that the depolarization is not a significant
issue.
The basic definition of the MM-Jones Quality factor is simply the RMS error
between the measured MM parameters and the "closest" (in a least squared sense)
Jones matrix. There are exact formulas for converting a Jones matrix (4 complex
values) into a Muller Matrix (16 real values). However, there is no exact conversion
from MM to Jones Matrix, so CompleteEASE performs a nonlinear regression fit to
find the closest Jones matrix to the MM data and report the RMS error. In
CompleteEASE, the RMS error is then multiplied by 1000, such that a MM-Jones
Quality of "1" means that the RMS difference between the closest Jones matrix and
the MM data is 0.001, which is the target value for MM data accuracy.
MM Derived Parameter
This option will multiply the specified Stokes vector by the measured Mueller
Matrix to determine the "derived" outcome, as shown in Figure 7-25. The user gets
a choice of source polarization state and polarization state detector, as listed in
Figure 7-26. In addition, there are a large variety of derived parameters, as listed in
Figure 7-27.
In addition to both X-Y and Contour graphing, the user can use the Graph Type
panel select the Data Type from choices of 1) Experimental Only, 2) Exp. and Gen.,
3) Difference: Exp. and Gen., or 4) Generated Only. The standard X-Y Axis will be
Wvl vs. Angle for spectroscopic single-position measurements. However, in the
case of automated rotation stages that record the orientation of the sample for
each measurement, there are also choices of Wavelength (Wvl) vs. Rotation Angle
or Angle of Incidence (AOI) vs. Rotation Angle. In these two cases, the remaining
parameter (AOI or Wvl) can be adjusted to different positions with the sliders.
From the Display panel, click ‘Graph Settings’ to access additional features, as
shown in Figure 7-30. The 15 normalized MM elements range from -1 to +1. Check
“Auto-Scale Y Axis” to view these elements over an appropriate range to view the
full scale of data for each element. Check “Always On Top” to maintain the MM
Graph Utility over other CompleteEASE windows and other software programs. If
“Un-Normalized Mueller Matrix” data was measured, check “Show M11 Graph” to
view M11 which is the reflected or transmitted intensity for an unpolarized
incoming light beam.
NOTE: ALL MM measurements are normalized to M11 (even if the user selects “Un-
Normalized Mueller Matrix” at the time of measurement). The difference is that for
“unnormalized” data, CompleteEASE also measures the intensity information such
that M11 can also be graphed. When “Show M11 Graph” is checked, the scale of
M11 will be 0 to +1, even when the other graphs are between -1 and +1. An
additional benefit of measuring the “unnormalized” Mueller Matrix is that
CompleteEASE can calculate the like- and cross-polarized intensities (pp, ss, ps, sp).
Figure 7-31. +Model menu for the standard multilayer model showing the different options
for graphing optical constants.
Figure 7-32. Plot of “All Layer Optical Constants” with both n and k for the “Si with Thermal
Oxide” model.
Figure 7-33. Plot of “All Layer Optical Constants (No Substrate)” with both n and k for the “Si
with Thermal Oxide” model.
Figure 7-34. Depth profile for a two-layer stack, where the bottom layer is graded.
Figure 7-37. Check “Graph All Data Sets” to view all data sets simultaneously.
When multiple data sets are present, the +Data Sets menu above the graph allows
selection options for viewing and fitting (see Figure 7-38).
Rotation Data
Rotation data is collected versus azimuthal angle, often using an automated
rotation stage accessory. Rotation measurements are often helpful with
anisotropic samples.
In rotation data, each measured data set corresponds to a rotation azimuth. When
rotation data is opened, the graph will initially display spectroscopic data from the
first-measured azimuth (see Figure 7-39). Use the position slider bar above the
graph to change the rotation angle for viewing and fitting.
Figure 7-39. With “Show Rotation Data” unchecked, the graph will display data from a single
rotation angle.
The “Show Rotation Data” checkbox can be used to display data from a single
wavelength versus rotation angle (see Figure 7-40). The wavelength displayed can
be changed from the ‘Set Ranges’ button in the Data panel.
With “Show Rotation Data” selected, you can select multiple rotation angles to set
up a multi-data set list. Use CTRL+click to select multiple rotation angles in the
graph (see Figure 7-41) or CTRL+click and drag to first select a range of rotation
angles and then enter number of data sets to evenly select within that range (see
Figure 7-42). Uncheck “Show Rotation Data” to display spectroscopic data for all
selected rotations and for multi-data set options (see Figure 7-43).
Figure 7-43. Spectroscopic view of selected rotations and multi-data set mode options.
If “Show Map Data” is unchecked, spectroscopic data from a single location will be
displayed (see Figure 7-45). A slider bar will also appear that allows you to change
the selected position.
Figure 7-45. With “Show Map Data” unchecked, the graph will display the spectroscopic
measurements from a single location. Use the slider bar above the graph to change locations
across the wafer.
With “Show Map Data” selected, you can select multiple measurement locations to
set up a multi-data set list. Use CTRL+click to select multiple measurement
locations on the map (see Figure 7-46) or CTRL+click and drag to select a region of
measurement locations (see Figure 7-47). Each selected measurement location will
show a gray border around the location symbol in the graph. Uncheck “Show Map
Data” to display spectroscopic data for all selected measurement locations and for
multi-data set options (see Figure 7-48).
Figure 7-47. Use CTRL+click and drag to select all measurement locations in a region.
With “Show Dynamic Data” selected, you can select multiple timeslices to set up a
multi-data set list. Use CTRL+click to select multiple timeslices in the graph (see
Figure 7-51) or CTRL+click and drag to select a range of evenly spaced timeslices
(see Figure 7-52). Uncheck “Show Dynamic Data” to display spectroscopic data for
all selected timeslices and for multi-data set options (see Figure 7-53).
Figure 7-53. Spectroscopic view of selected timeslices and multi-data set mode options.
An example of the Graph Scratchpad is shown in Figure 7-55. Curves in the Graph
Scratchpad are tabulated on the top panel and labeled C1, C2, C3, etc. Use
checkboxes in the “Graph” column to display/hide curves. Use checkboxes in the
“2nd Y” column to move any curve to a secondary Y axis. Click in the “Color”
column to change curve color. Click in the “Style” column to choose from a drop-
down list of curve styles (available styles include solid (0), dashed (1), circles (2),
thin (3), or thick (4)). Double-click in the “Curve Name” column to customize the
curve name and legend display.
Figure 7-55. The Graph Scratchpad can be used to customize, compare, and add trendlines to
curves.
Delete
Click ‘Delete’ to remove selected curve from the Graph Scratchpad.
Delete All
Click ‘Delete All’ to remove all curves / clear the Graph Scratchpad.
Create Curve
You can create curves in the Graph Scratchpad by clicking ‘Create Curve’. This will
open the Edit Equation dialog, allowing you to enter an equation using standard
mathematical operations (see Figure 7-59). Existing curves are available as
parameters by their curve name and added to an equation by clicking ‘Add
Parameter’ (see Figure 7-60).
Figure 7-60. 'Add Parameter' allows choice of the other curves or values available.
Add Trend
Click ‘Add Trend’ to fit a Linear, Quadratic, or Quartic curve to a selection of the
data (see Figure 7-61). You can extend this curve beyond the selected range by a
selectable number of “x units” and you can add legend information regarding either
the equation or the Y=0 intercept.
Figure 7-61. Click ‘Add Trend’ to open the Trend Editor dialog.
NOTE: Trends will be indicated in the Graph Scratchpad by T1, T2, etc. Curves will
be indicated by C1, C2, etc. Trends and Curves offer different right-click menu
options.
Right-Click Menus
The graph within the Graph Scratchpad contains generally the same right-click
options as described in Section 7.3, including “Copy Graph to Clipboard” for pasting
into other programs.
You can also right-click one or more curves to Add Offset, Graph Difference
(requires two curves), Graph Ratio, Graph Average, and Graph Standard Deviation
(requires three or more curves). See Figure 7-63 and Figure 7-64.
When two linear trends are selected, you can right-click and select “Calculate
Intersection” (see Figure 7-65).
Graph Settings
Click ‘Graph Settings’ to change titles, change font size, show or hide grid lines,
change the line width independent of the line style, and/or use log scale for X or Y
axis (as long as there is no negative or zero data) (see Figure 7-66).
NOTE: Right-click in any title box in the Graph Settings dialog or in the main table of
the Graph Scratchpad to select from common symbols (see Figure 7-67).
Open
Opens a previously saved Graph Scratchpad file with *.scratch extension.
Save
Saves the current Graph Scratchpad with *.scratch extension.
An example Measurement tab is shown in Figure 8-1. This tab consists minimally of
three panels: System Status, Measurement Controls, and Fit Results. The view of
this tab and measurement choices available will vary depending on the hardware
configuration. A brief description of all commands within this tab is provided.
Figure 8-1. Measurement tab for alpha-SE systems. The camera accessory is optional and
may not be available on your system.
For the “Standard” and “Long” modes, the motor home sensors are checked before
and after measurement. Also, they both implement zone-averaging, which collects
data with the input polarizer set to +45° and -45° and then reports the average.
This improves data accuracy.
The M.M. data modes allow measurement of the first three columns of the Mueller
matrix. The absolute intensity of m11 is measured, while all other measured
elements are normalized to m11.
Model
Specifies which model will analyze the data. Models saved in the Common folder
are listed in the drop-down menu. You can also click ‘Choose From File Dialog’ to
open models from other locations. If “None” is selected, data will be acquired but
not analyzed.
NOTE: A model can also be applied later from the Analysis tab.
Figure 8-2. Model drop-down menu includes .mod files saved in the Common folder.
NOTE: Models can be added to the drop-down list by saving them in the
CompleteEASE\MOD folder or from Analysis>Model>‘Open’ by dragging .mod files
from any location to the Projects tab, Common folder (see Figure 8-3).
Figure 8-3. Click Analysis>Model>‘Open’ to drag-and-drop models into the Projects tab,
Common folder.
NOTE: Data can be saved manually after measurement from the Analysis tab.
‘Measure’
Begins a measurement using the settings specified in the “Mode” and “Sample
Alignment” fields. After data is acquired, the model is used to analyze the data.
Results are placed in the box in the upper right corner of the screen.
Figure 8-4. Measurement tab for an M-2000 system with automated angle of incidence,
automated sample alignment, automated sample translation (mapping), focusing optics, and
an integrated camera.
<Select a Recipe>
This listing is not an option but rather a note to the user that they need to select a
recipe or change this setting before they can proceed.
‘Create/Edit Recipe’
Click this button to create a new recipe or edit an existing recipe.
NOTE: Data can be saved manually after measurement from the Analysis tab.
‘Measure’
The ‘Measure’ button begins a measurement according to the recipe or other
option selected from the drop-down list. There are also two right-click options for
the ‘Measure’ button, as shown in Figure 8-8.
Figure 8-8. Right-click on the ‘Measure’ button to choose “Acquire Multiple Measurements”
or “Show Recipe Scheduler”.
Run Recipe
If the step type “Run Recipe” is added (see Figure 8-11), CompleteEASE will prompt
the user to select an existing recipe (see Figure 8-12). The Scheduler will then list
this new step as a row in the Recipe Scheduler (see Figure 8-13).
After a recipe is added to the Recipe Scheduler, a translator offset can be specified
that offsets the recipe’s translator position by a specified amount. To add a
Translator Offset, double-click in the Translator Offset cell next to the recipe.
CompleteEASE will then prompt for the offset values (see Figure 8-14).
NOTE: For the offset to apply, the recipe must be set up such that the Do Not
Reposition Translator box is not checked.
Delay
The Delay step inserts a delay into the schedule. The delay time is specified in
minutes, as shown in Figure 8-15.
Set Temperature
The Set Temperature step is used to change the temperature of a supported
temperature controller and then wait a specified amount of time for the
temperature to stabilize, as shown in Figure 8-16.
Move Translator
The Move Translator step moves the translator to the specified position, as shown
in Figure 8-17.
Move Angle
The Move Angle step moves the angle to specified position.
Move Z-stage
The Move Z-stage step moves the z-stage to specified position.
Display Message
The Display Message step allows the user to have a custom, user-defined message
displayed on the screen in a dialog box. Doing so will pause the running of the
schedule until the user dismisses the message box.
Hardware Check
The Hardware Check step allows the user to define a check that can be performed
based on the values of parameters relating to the hardware (such as “Z Align”,
“SigInt”, “Tilt X”, “Tilt Y”, “Hardware OK”, etc.). See Figure 8-22for an example of
the dialog box for the Hardware Check step. The hardware check allows the user to
specify a custom equation for the values of a hardware parameter for each previous
recipe measurements. (In the dialog box, “[P1]”, “[P2]”, etc. stand for the values of
the specified parameter for each recipe measured in the schedule, in sequence.)
The custom equation will result in a “Test Value”, which will then be checked
against the “Test Value Range”. If the test value falls within the test value range,
then the hardware check will have passed and the recipe schedule will continue
without warning. If the test value falls outside of the test value range, then the
recipe schedule will pause and a message will be displayed to the user, asking if
they want to continue with the recipe schedule, repeat the previous recipe, or stop
the schedule altogether (see Figure 8-23). This message can optionally contain a
custom user-defined warning message about the significance of this hardware
check.
Figure 8-25. Acquisition Parameters Setup for M-2000 and RC2 systems. Choices will vary
from system to system.
Data Type
The Data Type specifies the type of data to collect during the measurement, as
shown in Figure 8-26.
Standard
Applies to most applications. This is simply a standard Spectroscopic Ellipsometry
measurement. The data collected will include Psi and Delta versus wavelength and
angle of incidence. In addition, the depolarization and reflected intensity will be
measured. However, the measurement accuracy of depolarization and reflected
intensity depends on the accuracy of recent DC calibrations and intensity baselines,
respectively. For more details, please consult your hardware manual. Most models
will ignore the depolarization and intensity measurements unless configured to
consider these extra data.
Transmission Intensity
Measure intensity of transmitted light through the sample.
Reflection Intensity
Measure intensity of reflected light from the sample.
Generalized Ellipsometry
Generalized ellipsometry measurements include the complete Jones matrix of a
sample, including the off-diagonal elements (which are assumed equal to zero for
Standard SE measurements). This type of measurement is useful for anisotropic
samples where the optical axis is not aligned parallel or perpendicular to the plane
of incidence. Generalized Ellipsometry measurements are not compatible with
measurements that exhibit depolarization, as it is based on a Jones-matrix
description of the interaction between measurement beam and sample.
Generalized Ellipsometry measurements consist of three ratios, so you will end up
with three Psi curves and three Delta curves for each measured angle of incidence.
Mueller Matrix
Measurement of the polarization change using Stokes vectors to describe the light
beam is done with the Mueller Matrix. The Mueller Matrix is a 4 x 4 matrix, but not
all elements can be measured with each ellipsometer. For example, the M-2000
measures 12 elements, the first three rows of the Mueller Matrix. The only
ellipsometer that can measure all 16 elements of the Mueller Matrix is the RC2. For
most samples, there is significant redundancy in the Mueller Matrix and no need to
measure all 16 elements. For isotropic samples (with or without depolarization),
the complete interaction can be described by measuring 4 elements (M11, M21 or
M12, M33 or M44, and M34 or M43). If the sample also contains anisotropy, the
Sample Alignment
Sample alignment options depend on the type of system and configuration. In
general, there are two basic steps to sample alignment: tilt alignment and height
alignment. Common selections for each are described in this section.
Tilt Alignment
The sample surface should be perpendicular to the plane of incidence such that the
reflected beam is aligned on the receiver unit at the correct angle of incidence.
Tilting the sample surface to achieve this condition is required for most samples.
Tilt alignment options include Skip, Manual, or Automatic (see Figure 8-27).
Tilt alignment is sometimes skipped for flat, coplanar samples (if sample stage has
been previously aligned) or when using focusing probes (the measurement is less
sensitive to sample tilt with a small measurement beam).
When tilt alignment is set to manual or automatic, the ellipsometer uses a four-
quadrant detector to adjust the sample tilt until the reflected beam is centered
onto this detector and all quadrants have the same intensity. This method allows
very repeatable alignment of the beam from sample to sample. An example of the
tilt alignment step for an automatic system is shown in Figure 8-28.
The Scan Patter Editor (see Figure 8-32) can be used to create custom patterns.
Choose from Circle or Rectangle for the Substrate Dimensions (or for the pattern
perimeter) and enter the corresponding diameter or dimensions. Next, add points
to the Point List. Points can be added one at a time (click ‘Add Point’) or
automatically filled using ‘Cartesian Grid Fill’, ‘Polar Grid Fill’, or ‘Line Fill’. Points
can also be created in a separate spreadsheet program and pasted into
CompleteEASE using the ‘Paste From Clipboard’ button. Test each option to gain
familiarity with these features. Click ‘Delete All’ to clear the Point List panel as
needed.
Figure 8-34. Updated Scan Pattern Editor after using Cartesian Grid Fill to Scan Region of
Interest.
The Scan Pattern also describes where the sample alignment procedure will occur.
For example, you can choose to align at the specified Alignment Position (often
center) only. You can also choose to fully align at each point or from other options
shown in Figure 8-35.
Right-Click Menu
Right-click in the Fit Results panel to copy results from the panel to clipboard.
% Range
The percent range is defined as:
MAX − MIN
% RANGE = 100%
AVERAGE
% Uniformity
The uniformity is defined as:
STDEV
%UNIFORMITY = 100%
AVERAGE
NOTE: You may need to scroll to view fit parameters (see Figure 8-38).
Figure 8-38. Scroll File Information panel to view all available information.
NOTE: Fit parameters will only be available if a model was designated at time of
measurement or if the data was resaved with fit results appended.
For map data, the ‘Graph Data’ button can be selected to open a new window that
allows users to select the fit result they wish to view (see Figure 8-40).
Previously measured data can be re-analyzed by selecting a file from the Files panel
and clicking ‘Load Data for Analysis’. This button opens the data file, but not any
model previously applied.
The Analysis tab is shown in Figure 9-1. This tab consists of three panels: Data,
Model, and Fit.
Figure 9-2. The right-click menu for ‘Open’ from the Data panel gives access to “Append
Data”, “Append Intensity Data From Text File”, and a list of up to 10 recently opened files.
Table 9-1. Types of CompleteEASE data that can be appended to other data.
DATA FILE TYPE EXT DATA FILE TYPES THAT CAN BE APPENDED
Standard Other standard data files and one-point translation
maps can be appended to standard .SE data. (One-
point translation maps will be converted to standard
.SE data files when appended.)
Translation No other data files can be appended to a translation
.SE
(Uniformity Map) data file.
Rotation Other rotation scans and standard data files can be
appended to rotation scans. (Standard data files will
be converted to one-point rotation scans when
appended.)
In-situ Only other in-situ data files can be appended to in-
(Dynamic Data) situ data files; however, appended in-situ data is
added, timewise, to the end of the current in-situ
.iSE
data (with an optional time delay), forming one
composite in-situ data set. This does not put
CompleteEASE in multi-data-set mode.
<Comment_Line>
<Data_Type> <Optional_AOI#1> <Optional_AOI#2> <…>
<Wavelength_Units>
<Wavelength> <Data_AOI#1> <Optional_Data_AOI#2> <…>
…
The first three lines in the file describe the content of the data. The first line is for a
comment. The second line describes the type of data in the file. The options are
“uT” for unpolarized transmission data and “uR” for unpolarized reflection data. By
default, the angle of incidence is assumed to be 0°, but additional items on the
second line are used to specify the angle(s). The third line specifies the wavelength
units for the file. The choices are “A”, “nm”, and “eV” for angstroms, nanometers,
and electron volts respectively. The rest of the lines specify the data in ascending
wavelength order. Example data files are shown below:
Recent List
Up to ten recently opened data files are stored in a “Recent List”, accessed by right-
clicking on the ‘Open’ button. See Figure 9-2 for an example.
‘Save’
Saves the current data file. CompleteEASE data files are saved as encrypted files
that can only be opened with CompleteEASE. The file extensions are “.SE” for
standard measurements or “.iSE” for dynamic measurements. The right-click menu
with options for “Save Data Subset” and “Export to Text File” is shown in Figure 9-3.
Figure 9-3. The right-click menu for ‘Save’ from the Data panel gives access to “Save Data
Subset” and “Export to Text File”.
Figure 9-4. The “Save Subset” dialog box that allows the data subset to omit the data at
certain evenly-spaced wavelengths by specifying a wavelength resolution in nm or eV.
Figure 9-5. The “Save Subset” dialog box with options for saving a data subset when multiple
translation map points are selected in multi-data-set mode.
‘Info’
Shows information about the current data set opened in CompleteEASE. An
example of the “Exp. Data Information” dialog box is shown in Figure 9-7.
‘Set Ranges’
Choose the wavelength range and selected angles for use with the current data set
during fit. This also allows the selection of selected translation point from
uniformity maps, as shown in Figure 9-8. When uniformity maps or rotation scans
are graphed, this dialog box also allows the choice of the selected point and the
graph angle and wavelength. When in-situ data are graphed, this dialog box also
allows selection of the time range and the selected timeslice.
‘Fit’
Fits the model-generated data to the experimental data based on the current
model and data set open. Pressing ‘Fit’ starts a regression analysis in which model
fit parameters selected for fitting are varied to match the model-generated data to
the experimental data. A warning message will be shown if no fit parameters are
selected for fitting in the current model or for other common modeling issues that
can be encountered. For translation-map data, dynamic data, and rotation data,
only the currently graphed data set will be fit using the current model (unless
otherwise defined within the model options). When CompleteEASE is in multi-data-
set mode, all currently selected data sets will be matched using the current model.
The shortcut keystroke to fit data is Alt+F.
‘Fit Dynamic’
When a dynamic (in-situ) data set is open, the third button in the Fit panel will read
‘Fit Dynamic’, which fits each timeslice from the dynamic data set starting with the
first timeslice in the selected time range and moving sequentially to the last
timeslice in the selected time range.
Right-clicking ‘Fit Dynamic’ gives options to “Append Fit Results”, “Fit Backwards in
Time”, or “Fit Backwards and Append”.
Figure 9-9. All fit parameters and derived parameters are displayed as blue, underlined text
after ‘Fit Scan Data’, ‘Fit Dynamic’, or ‘Fit Rotator Data’ are pressed. Click on these to show a
graph of the fit-parameter results over all map points, timeslices, or rotation positions.
Figure 9-10. An example of graphing a fit parameter, in this case “Thickness #1”, over all
points in a uniformity map.
Figure 9-11. The Reset List allows the user to reset to any recent model states, which are
automatically saved before and after each fit.
Figure 9-12. Right-click options from the Fit panel after a fit to standard data and uniformity-
map data, respectively.
Figure 9-13. “View Fit Stats” shows statistics such as the 90% confidence intervals in the “Fit
Parameters” section on the left side and the correlation matrix values after a fit on the right
side. High correlation values (above 90%) are highlighted in the correlation matrix.
‘Delete’
Deletes the selected log entry from the Fit Log.
‘Compare’
Compares statistics of multiple selected log entries, as shown in Figure 9-19. From
this comparison dialog box, you can “Add Statistics”, “Reverse Columns/Rows” and
even ‘Compare Optical Constants’, which brings up a new dialog box as shown in
Figure 9-20. (Section 3.6 contains an example using ‘Compare Optical Constants’.)
Figure 9-19. Fit Log comparison shows results from each fit log entry.
Figure 9-20. ‘Compare Optical Constants’ brings up a dialog box that shows each model and
allows you to choose the different layers to graph from each model.
‘Reanalyze’
Since some data files from CompleteEASE contain not only the experimental data
but also the results of the analysis of that data using a model (for example, when
using a measurement recipe including a model), the Reanalyze Data feature is used
To add an analysis step to the table, press ‘Add Row’. This brings up the Choose
Files dialog, as shown in Figure 9-22. By default, the only file group available is the
“Selected Log Entries” group which contains the files from any fit-log entries that
were selected before pressing the ‘Reanalyze’ button. To add a group of files to the
available file groups, press the ‘Add’ button. This brings up the standard file dialog
except that it allows multiple files to be selected. After selecting the desired files
and closing the dialog, you are given the chance to name the file group, as shown in
Figure 9-23. Note that if only one file is selected for a group, then the name is
automatically set to the name of the file. After giving the group a name, it now
shows up in the Choose Files dialog, as in Figure 9-24. The file groups that are
created will be available until CompleteEASE is closed.
Figure 9-24. The new group name shows up with the associated files.
To finish adding the row, choose a file group from the Choose Files dialog and press
‘Ok’. A row is now displayed in the reanalysis table with the file group specified, as
shown in Figure 9-25. A different group can be specified by double-clicking on the
cell you wish to change. This also applies to the Model and Log Name items. To
finish setting up the reanalysis, specify a model and log name by double clicking the
appropriate cell and entering these parameters, as demonstrated in Figure 9-26.
Figure 9-25. File Groups show ups as a row in the Reanalysis dialog box.
Figure 9-26. Click to add Models and optional Log Names for each row.
Figure 9-27. Fit Log after reanalysis, with each file from the file group added as a log entry.
‘Generate Reports’
Copies the results of the selected log entries into a report in RTF (“Rich Text
Format”), which is saved to a file. Generating reoprts will clear the currently open
model and data set. (For an example using ‘Generate Reports’, refer to Section 3.6.)
‘Clear Log’
Clears the fit log of all its entries.
‘Close’
Closes the Fit Log dialog box.
Figure 9-28. After fitting uniformity-map data or dynamic data (shown above), there are
“Advanced Graph Options”, which allow various combinations of parameters.
Figure 9-29. Using Advanced Graph Options, the thickness is plotted versus temperature from
a heat-cell measurement after a dynamic data analysis.
Figure 9-31. Enter number of curves to draw, which will be equally spaced over the fit time or
position range.
Figure 9-32. Example of 10 index graphs from equally spaced sections of a dynamic fit.
‘Open’
Clicking on the ‘Open’ button opens a new model selected from the file dialog box.
Right-clicking on ‘Open’ gives the option to merge models together and shows a list
of up to ten models that have been recently opened by CompleteEASE, as shown in
Figure 9-34.
Merge Models
Right-click on the ‘Open’ button to merge models together. This is usually used with
in-situ applications, where fit parameter values from one model need to be
transferred to another model that contains additional layers. (Note: To perform a
merge correctly, fit parameter and layer names must be identical in order for
parameter values to merge correctly.)
Figure 9-34. Right-click on model ‘Open’ button to either “Merge Models” or get a list of
recently opened models.
‘Save’
Clicking on the ‘Save’ button saves the current model and all model settings to a
.mod file. Right-clicking on ‘Save’ gives the option to “Save Changes” to the already
open model file. In CompleteEASE, clicking on ‘Save’ is analogous to what is
sometimes called “Save As…” in other programs, and right-clicking on ‘Save’ is
analogous to what is typically called simply “Save”.
Save Changes
Right-click on ‘Save’ to just save the changes made to the model file that is already
open instead of saving the entire model to a new file.
‘Open Snapshot’
Clicking on ‘Open Snapshot’ opens a snapshot file. A snapshot is a single file that
compresses all information from the CompleteEASE screen, including the data
measurement, model, and fit results. This is a convenient way to save and store all
information in order to restore CompleteEASE to a previous state at a later time.
Right-clicking on ‘Open Snapshot’ shows a list of up to ten recently opened
snapshots to open.
‘Save Snapshot’
Clicking on ‘Save Snapshot’ saves a snapshot file, which is a single file that
compresses all information from the CompleteEASE screen, including the data
measurement, model, and fit results. This is a convenient way to save and store all
information in order to restore CompleteEASE to a previous state at a later time.
Because it includes all the data, the snapshot can be overwhelming in size if created
from large uniformity-map data. Snapshot files have the “.SESnap” file extension.
NOTE: Holding the CTRL key down when clicking the Add button will automatically
add the new layer on top of the current model layer stack rather than showing the
“Add Layer To Model” dialog box and asking for the position.
NOTE: Layers from .mat files that are already tabulated cannot be saved as
“Dispersion Parameters” because they are not described by a dispersion equation
to begin with. Also, anisotropic layers (such as the Biaxial layer) cannot be saved as
tabulated, since they require multiple directions to describe their optical constants.
NOTE: Saving a layer’s optical constants can also be done by right-clicking on the
layer in the main model panel and clicking “Save Layer Optical Constants”; for
certain layers (such as the B-spline), there may be more options than just
“Dispersion Parameters” and “Tabulated”. See Section 9.5 for more details.
(a) (b)
Figure 9-38. Model with layers collapsed (a) and with Cauchy layer expanded (b).
(a) (b)
Figure 9-42. Model with layers collapsed (a) and with Cauchy layer expanded (b).
𝐼 = 𝐼0 𝑒 −𝛼𝑑
The absorption coefficient α is then described by Equation 9-2, where k is the
extinction coefficient (imaginary part of the complex refractive index) and λ is the
wavelength:
Equation 9-2
4𝜋𝑘
𝛼=
𝜆
Clicking on this option will bring up a dialog box as shown in Figure 9-44, which
allows you to select whether you want to graph the absorption coefficient or the
logarithm of the absorption coefficient and which units (cm, mm, or μm) you want
to use for the reciprocal wavelength.
Figure 9-44. Graphing the absorption coefficient allows the selection of standard or
logarithm graphing and reciprocal wavelength units.
Table 9-2 below for different values of this coefficient), t is the thickness in
nanometers, nX is the index of refraction in-plane (the ordinary direction), and nZ is
the index of refraction out-of-plane (the extraordinary direction):
Equation 9-3
𝛿 = 𝑐 ∙ 𝑡 ∙ |𝑛𝑋 − 𝑛𝑍 |
Nanometers 𝑐=1
1
Waves 𝑐= where λ is the wavelength in nanometers
𝜆
a) b)
Figure 9-45. “Graph Anisotropic Differences” dialog box for uniaxial anisotropy (a) and for
biaxial anisotropy (b), which allows the graphing of various differences between the different
anisotropic optical-constant directions and the retardance.
Figure 9-46. Graph of “sub-layer” ε2 dielectric functions, which displays ε2 for each slice of the
graded layer.
Figure 9-47. “Rename Layer Options” dialog box, which includes options for renaming the
layer in the model, renaming the layer fit parameters, and renaming the thickness that is
reported in the fit results.
NOTE: Layers from .mat files that are already tabulated cannot be saved as
parameterized because they are not described by a parameterized dispersion
equation to begin with. (If you want to save a tabulated material file as a dispersion
equation, you will have to parameterize the layer, which can be done by right-
clicking on the layer and selecting “Parameterize”. See the next part of this section.)
Also, anisotropic layers (such as the Biaxial layer) cannot be saved as tabulated,
since they require multiple directions to describe their optical constants.
The B-Spline layer contains special options for saving its optical constants, as shown
in Figure 9-49. ‘Tabulated’ saves the B-Spline optical constants as a normal
tabulated .mat file as described above. An ‘Editable B-Spline’ is a parameterized
.mat file that allows all B-Spline node and parameter values to be fully editable
when it is reopened. A ‘Fixed B-Spline’ is a parameterized .mat file that does not
allow the B-spline parameter and node values to be edited by the user when it is
reopened. While its node positions are fixed once it is saved, the parameter and
node values of a ‘Fixed B-Spline’ can be varied by CompleteEASE during a fit when it
is reopened and used, unlike a tabulated file. Still, the positions of the nodes in a
“Fixed B-Spline” cannot be edited by a user after it is reopened.
Figure 9-49. “Save Layer Optical Constants” dialog box for a B-Spline layer.
Parameterize Layer
Right-click a layer to select this option to parameterize the optical constants of that
layer using a dispersion model, such a Gen-Osc, B-Spline, or Cauchy layer. This will
open the layer optical constants as reference values in the “Parameterize Layer”
dialog box, as shown in Figure 9-50. The three most common choices are the Gen-
Osc, B-Spline, and Cauchy models, which are easily selected from the Parameterize
Layer sub-menu. To parameterize to a different layer, such as a Sellmeier, simply
select “GenOsc” in the Parameterize Layer sub-menu. When the “Parameterize
Layer” dialog box opens, select ‘Open Material File’ and choose the layer you wish
to parameterize to (in this example, the Sellmeier). Refer to Sections 4.3 (B-Spline
example) and 4.4 (Gen-Osc example) for a detailed explanation and example of
using the Parameterize Layer functionality.
Figure 9-51. Example of a layer comment for Cesium optical constants. The comment shows
the source of the optical constants (Palik’s Handbook of Optical Constants of Solids) and the
valid wavelength range.
Convert to EMA
Right-click on a layer to select this option which replaces the layer with an Effective
Medium Approximation (EMA), in which the original layer is now embedded as the
host material (Material 1). By default, the other material (Material 2) is set to
“Void” with “EMA %” set to 0 but selected as a fit parameter. Click on “Material 2”
to fill in the second material in the EMA. An example is shown in Figure 9-52.
Once the transparent region is fit, right-click on the Cauchy layer and select
“Convert to Transparent B-Spline”. You will be asked to set the eV resolution for the
B-Spline layer, as shown in Figure 9-54. Typically, values of 0.2 eV or 0.3 eV work
best. Then, you will be asked to perform a “wavelength expansion fit” as shown in
Figure 9-54. Prompt to enter the B-Spline resolution for “Convert to Transparent B-Spline”.
Figure 9-56. Prompt to enter the wavelength range for the wavelength-range-expansion fit
with “Convert to Transparent B-Spline”. Generally, default values will work fine.
Figure 9-57. Example of a fit to both the transparent region and absorbing region of a
material using “Convert to Transparent B-Spline”.
Convert to Isotropic
Right-click on an anisotropic layer (such as the Biaxial layer) to select this option
which replaces the anisotropic layer with an isotropic layer. The isotropic layer will
contain the layer parameters from the Ex direction of the anisotropic layer.
Grade Layer
Right-click on a layer to select this option to replace the layer with a Graded layer,
where the original layer is embedded as the average refractive index. A Graded
layer will incrementally vary the index of the film in a specified way throughout the
thickness of the layer. The “% Inhomogeneity” is set to 0% by default but can be
varied to allow the index to increase or decrease from the bottom to top of the
layer. An example of this is shown in Figure 9-59. (Refer to Section 10.18 for more
information on how to use the Graded layer.)
Remove Grading
After grading a layer, you can right-click on Graded Layer and select “Remove
Grading” to unwrap the host film (from the “Material =” section) back to a standard
layer without grading.
End Superlattice
Right-click on a layer to select this option in order to set the layer as the end or top
of the repeated superlattice structure. When selected, an additional parameter will
be added to this layer to control the number of repeats (called “SL Count” for
“Superlattice Count”), as shown in Figure 9-60.
Figure 9-60. Model with superlattice start, end, and number of counts (repeats).
Clear Superlattice
Right-click on a superlattice layer to select this option which removes the layer from
the repeated superlattice structure. To clear the entire superlattice structure, you
must select “Clear Superlattice” on both the “SL Start” and “SL End” layers. (Note
that if you only “Clear Superlattice” on the “SL Start” layer, the “SL End” layer will
be automatically converted to the “SL Start” layer.)
Figure 9-61. Example of a fit parameter with parameter value activated for fitting.
Left-clicking on the fit parameter value (e.g. 100 nm) brings up a dialog box for
editing the value and other settings of the fit parameter (Figure 9-62). Right-clicking
on the fit parameter value toggles the fit parameter between being active in the fit
(allowing its value to be varied) and being inactive in the fit (holding its value
constant). Holding the SHIFT key down on the keyboard and rolling the mouse
wheel with the mouse pointer positioned over the fit parameter value will change
the parameter’s value in small increments and adjust the generated-data curves on
the graph accordingly to reflect the change in value. Holding down the CTRL and
SHIFT keys with the mouse pointer positioned over the fit parameter value and
rolling the mouse wheel will change the parameter’s value in even smaller
increments. This is generally referred to as “rolling the parameter value”, and it is a
useful way to easily adjust the value of the fit parameter and visualize the effect of
the parameter on the generated data at the same time.
Fit parameters have several settings that change how they appear in fit results or
how they behave during a fit. These options can all be found by left-clicking on the
Figure 9-62. “Edit Fit Parameter” dialog box containing all settings for fit parameters.
Edit Value
The text field at the top of the “Edit Fit Parameter” dialog box contains the current
value of the fit parameter. To edit this value, simply type a new number in this field
and click “Ok” or press the “Enter” key on the keyboard. Keep in mind that the
number entered here cannot be outside the “Minimum” and “Maximum” values for
the fit parameter range.
Fit
The “Fit” checkbox indicates whether the fit parameter is turned on for fitting; in
other words, it controls whether the fit parameter is active in the fit, meaning its
value will vary when fitting, or whether the fit parameter is inactive in the fit,
meaning its value will be held constant during the fit. This option can also be
toggled without opening the “Edit Fit Parameter” dialog box by right-clicking on the
blue, underlined text of the parameter value (e.g. 100 nm) in the model panel.
Minimum / Maximum
The “Minimum” and “Maximum” values define the range in which the fit parameter
is allowed to vary when it is being fit (i.e. when the fit algorithm is varying its value).
The fit algorithm will never let a fit parameter wander outside of its specified
“Minimum” and “Maximum” values. In addition, CompleteEASE does not allow a fit
parameter to be rolled outside of its range with the mouse wheel, and entering a
value outside of the range for the fit parameter is not allowed as well. Therefore,
these fit parameter range values can be used to keep a parameter from having
Parameter Name
The “Parameter Name” area contains options to rename a fit parameter. To give a
fit parameter a different name than its default name, check the “Rename”
checkbox, and type the desired new name in the “Name” field. This is useful for
giving fit parameters unique names, which is required when using advanced model
features such as certain Derived Parameters, Custom User Equations, Parameter
Coupling, and Multi-Sample Analysis. This is mainly used when the model layer
stack contains two layers of the same type that have the same default names for
their fit parameters. This option can then help to differentiate fit parameters from
layers of the same type by making their names unique. However, note that
renaming fit parameters will break existing references to these fit parameters used
in Derived Parameters, Custom User Equations, Parameter Coupling, and Multi-
Sample Analysis. Therefore, use caution when renaming fit parameters, and
remember that it is best to give layers and fit parameters unique names before
using these advanced features. In order to rename all the fit parameters in a layer
in the same manner all at once, simply right-click on the layer name and choose
“Rename Layer and Fit Parameters”.
All fit parameters in the model are shown in the Fit Results (in the Fit panel and in
automatically generated analysis reports) by default. However, in order to hide a fit
parameter and prevent it from appearing in the fit results, check the “Hide”
checkbox in this section.
Parameter Specification
The “Low Spec.” and “High Spec.” values define the range in which a parameter is
considered to be within specification. When a fit parameter’s value ends up outside
of this range after a fit, it will be tagged with the “Out of Spec.” designation in the
Fit Results and any analysis reports (e.g. “(Out of Spec.)”). This feature is mostly
used when using CompleteEASE for quality control purposes, which allows the user
to be warned when a certain sample does not meet predetermined specifications.
The MSE for a fit can also have a maximum specification; this is set with the “Max.
Derivative Increment
The “% Nominal Derivative Increment” controls how quickly a parameter will
change its value during a fit. It is specified as a percentage of the “nominal”, or
default, derivative increment for that parameter. Usually, this value should be left
at 100% as most CompleteEASE parameters are tuned to have derivative
increments that work well for optimal fitting. However, this feature is usually useful
when custom fit parameters are defined in user-defined equations. Since these
parameters are not created by CompleteEASE, this value may need to be adjusted
for them to vary correctly in a fit. When the Levenberg-Marquardt fitting algorithm
is varying a fit parameter, it will iteratively adjust its value slightly on each iteration
by the derivative increment value. The derivative increment is also used when the
fit parameter values are rolled up and down by the mouse wheel while holding
down the SHIFT key. In order to test whether the derivative increment is optimal for
a parameter, roll the mouse wheel over the parameter while holding down the
SHIFT key. The increment by which the parameter’s value changes with each roll is
the derivative increment. If large jumps are observed, then decrease the “%
Nominal Derivative Increment”. Likewise, if the parameter value doesn’t change
fast enough, then increase the “% Nominal Derivative Increment”.
Query Parameter
This section of the “Edit Fit Parameter” dialog box is only visible when
CompleteEASE is configured to ask a remote system (outside of CompleteEASE) for
what its parameter values should be. To turn on the ability for CompleteEASE to
query for parameter values from a remote source and see this section, go to the
Options tab and press ‘Edit Configuration’. In the “CompleteEASE Configuration”
dialog box, check “Show Advanced Configuration Options”, expand the “Remote
Communications” section under “Configuration Parameters”, and set “Allow
Parameter Query” to “True” (“Parameter ON”). Doing this will enable
CompleteEASE to ask a remote system for the fit parameter’s value on a port two
positions above the one specified with the “TCP/IP Port #” configuration setting. (By
default, this main port specified is 4444, meaning that in this case, the remote
parameter querying will happen on port 4446.) Once this is established, checking
the checkbox “Ask Remote Computer For Value” in the “Edit Fit Parameter” dialog
box will instruct CompleteEASE to ask for this parameter’s initial value from a
remote computer (on port 4446 by default) before performing a fit. Refer to
Appendix 14.8 for more information about remote communication features
available in CompleteEASE.
Angle Offset
The “Angle Offset” applies a constant offset to the angle of incidence when
calculating the model, which can account for slight shifts or inaccuracies in the
angle-of-incidence data. By default, this parameter is a constant offset applied
equally to all angles of incidence in the data set. Generally, only one constant offset
for all angles of incidence is sufficient for most data sets requiring the “Angle
Offset”. However, by turning on “Multiple Angles of Incidence” in Configure
Options, this parameter can be fit individually for each angle of incidence in the
experimental data, as shown above in Figure 9-63.
Figure 9-64. When “Include Substrate Backside Correction” is ON, there are additional
options to consider transmission SE data, reverse direction measurements, and the number of
reflections from front and back.
For more explanation of the substrate backside correction and to see an example of
correcting for substrate backside reflections, refer to Section 3.4. Whenever
“Include Substrate Backside Correction” is turned ON, the substrate is given a
thickness value, as shown in Figure 9-65. This is often used with transmission data.
For an example of transmission data fitting using the substrate thickness, consult
Section 4.6. Also, when “Include Substrate Backside Correction” is turned ON,
CompleteEASE allows layers to be added below the substrate, also as shown in
Figure 9-65. To add layers below the substrate, use the Add command at the top of
the model and position the blue cursor below the substrate.
Figure 9-65. When “Include Substrate Backside Correction” is ON, the substrate is given a
thickness value, and CompleteEASE allows layers to be added below the substrate.
NOTE: When fitting transmission intensity data (not transmission SE data), even
when “Include Substrate Backside Correction” is OFF, CompleteEASE still uses the
value of “% 1st Reflection” and the value of the substrate thickness in the model
calculation. (“% 1st Reflection” is used to correct for the percentage of your
baseline intensity that could be lost at the detector due to scattering or other
reasons.) Therefore, if “% 1st Reflection” is not at its default value of 100% or if the
substrate thickness is set at a strange value, this will still affect the fit in an
undesired manner even though “Include Substrate Backside Correction” is OFF and
these fit parameters are not shown in the model. Thus, when fitting transmission
intensity data, make sure to set “% 1st Reflection” back to 100% and check the
value of the substrate thickness if you turn off the backside correction. (However, if
you leave “Include Substrate Backside Correction” ON when fitting transmission
intensity data, you’ll need to set “# Backside Reflections” to 0 to get the correct fit.)
Model Calculation
The “Model Calculation” section allows you to choose different model calculations
to handle nonideal sample situations. For most samples, the default setting of
“Ideal” is preferred. However, there are many choices related to spectrometer
bandwidth, film thickness nonuniformity, and beam angular spread to use (as
shown in Figure 9-66) when these nonideal situations are suspected. These
nonideal options are best used in conjunction with depolarization data fitting, as an
ideal sample/measurement will not produce any depolarization.
Figure 9-67. Expansion of the Model Calculation section to include settings for Bandwidth,
Thickness Non-uniformity, and Angular Spread.
+Parameter Smearing
“Parameter Smearing” is a very advanced feature that allows other parameters to
be “smeared” to account for very specific nonidealities. Smearing a parameter acts
similarly to the nonidealities of “Bandwidth” (which is technically a smearing of
wavelength) and “Angular Spread” (which is a smearing of angle of incidence) as
described in “Model Calculation” above. “Parameter Smearing” can accommodate
smearing of any of the fit parameters. When turned on, this section expands as
shown in Figure 9-68. (A common use of this feature is when dealing with a
material, like a twisted liquid crystal, where you want to smear the amount of
“twist” present on the surface of a Biaxial grading.)
Figure 9-68. Parameter Smearing expands to allow smearing of any fit parameter.
Figure 9-69. “Patterning” allows calculation with partial coverage of a single layer or multiple
layers over the layer below.
NOTE: The Patterning option is not suitable to describe periodic structures on the
surface of the sample with dimensions smaller than the wavelengths for which
coherent overlap of grating modes occurs on the detector.
Figure 9-70. Ambient Index > 1 allows another material file to describe ambient index.
Delta Offset
The “Delta Offset” is used to correct for windows in the beam path, such as with a
Heat Cell or a prism. CompleteEASE can account for Delta offsets from a “Prism
(Cauchy)” or a “Window (1/)”. For most applications involving J.A. Woollam
attachments (such as the Heat Cell or Environment Cell), “Window Effects” are
automatically calibrated during a “System Check” and data is corrected for such
effects; thus, there is no need for this model option to be applied in these cases.
Psi Offset
The Psi offset can be used to model prisms in the beam path before and after the
sample. J.A. Woollam company instruments that use prisms for beam steering
already have a defined calibration method that accounts for these offsets, so this
feature of the model is rarely used.
a-Si Film
Cr Film
SiO2 Film
Cr Film
Silicon Substrate
To set up the multi-model pattern for this sample, we will need three different
models – one for each of the areas that are different on the sample (within the
measurement beam spot). The first area is just a Cr film on Si (for this example, it
was assumed to be 25% of the measurement area). The second area is Cr on SiO2
on Si (assumed to be another 25% of the area). Finally, the complete stack of
surface oxide on a-Si on Cr on SiO2 on Si exists over the remaining 50% of the area.
To build this example using multi-model patterning, first choose “# of Models” to be
3, since there are three distinct areas of the film surface. Then, you can select the
various areal percentages. Next, add a fit parameter for each of the layers that will
vary from area to area – in this case, 3 of the 4 layers have less than 100% coverage.
The Cr film is coating the entire surface, and if we make the assumption that it is
the same thickness in all areas, then we do not need to add this parameter to the
list. However, it may be easier to add this parameter to the list for the sake of
easier visualization. The individual thicknesses in the different areas can be set,
fixed, or even fit. The final model for this sample is shown in Figure 9-73.
Figure 9-74. Options available in parameter right-click menu for Multi-Model Patterning.
Figure 9-76. Options available in parameter right-click menu for Multi-Sample Analysis.
It is possible to set different fit weights for each data set in the MSA. Right-click on
the Data Set number and select “Set Fit Weight” (see Figure 9-77). This will open a
dialog box allowing you to enter a custom weight for that data set in the fit. By
default, all data sets are weighted equally (100%). You may wish to increase or
decrease the fit weighting of a particular set or sets if, for example, one set is
significantly noisier than others. The fit weight can also be used to balance a fit
result when a good fit can be achieved with one set but not others. (Be sure to
consider sample structure and model first before editing the fit weighting.) To
remove the custom fit weights from all data sets, you can right-click on Data Set
and select “Reset Fit Weights” (see Figure 9-77).
NOTE: The names of the parameters in the model are very important when using
+Multi-Sample Analysis. If any parameters share the same name in the model,
CompleteEASE may not choose the correct parameter to use in the MSA. Thus,
before setting up MSA, make sure that all parameters to be used in the MSA have
unique names. If not, you can rename layer fit parameters by right-clicking on the
layer and choosing “Rename Layer and Fit Parameters”. If, after MSA has been set
up, a parameter involved in the MSA has its name changed, it will break the link
with the MSA, and the parameter with the new name will have to be re-added to
the MSA.
+Parameter Coupling
Parameter coupling allows users to enforce relationships between different fit
parameters in the model. There are three types of coupling: simple constant ratio,
simple constant offset, or custom equation. Figure 9-78 shows an example of
parameter coupling. The corresponding “Parameter Coupling” dialog is shown in
Figure 9-79. As an example, the thickness of the first and second data sets in a
multi-sample analysis, “Thickness #1 (1)” and “Thickness #1 (2)”, are set to be
double the thickness of the third data set in the MSA, “Thickness #1 (3)”. This ratio
will be enforced, and the thicknesses will vary together during the fit. Only active fit
parameters can be coupled to other fit parameters. The final coupling equation is
shown at the bottom of the dialog box to ensure that it is correct. To see an
example of a data fit using Parameter Coupling, see Section 4.5.
Figure 9-78. Example of Parameter Coupling, where thicknesses in an MSA are coupled by a
factor of 2 to another thickness in the MSA.
Figure 9-79. Example of Parameter Coupling, where thicknesses in an MSA are coupled by a
factor of 2 to another thickness in the MSA.
Figure 9-80. Example of Parameter Coupling with a custom equation, where a thickness in an
MSA is coupled by a factor of 2 to another thickness in the MSA.
NOTE: The names of the parameters in the model are very important when using
+Parameter Coupling. If any parameters share the same name in the model,
CompleteEASE may not couple either of those parameters correctly. Thus, before
setting up parameter coupling, make sure that all parameters to be coupled have
unique names from other parameters. If not, you can rename layer fit parameters
by right-clicking on the layer and choosing “Rename Layer and Fit Parameters”. If,
after a coupling relationship has been set up, a parameter involved has its name
changed, it will break the parameter coupling link to this parameter. In this case,
any coupling relationships involving this parameter will have to be re-added.
If using a B-Spline layer to fit for the optical constants of the first (underlying)
measurement, make sure that two settings in the +Advanced section of the
B-Spline layer are turned ON. Turn “Show Parameters in Fit” ON so that all of the
B-Spline node parameters are saved into the results section of the data file. Also,
you may want to turn “Fix node bounds when all wavelengths selected” ON so that
the wavelength range for the B-Spline is consistent between both measurements.
Refer to the +Advanced part of Section 10.3 for an explanation of these options.
If a model is not loaded during data acquisition (i.e. as part of a recipe), then no
analysis results will be recorded in the measured data file. In this case, it will be
necessary to use the Fit Log’s reanalysis feature to get the model results saved into
the data file (using the “Resave Results to Data Files” checkbox) before this feature
can be used. Refer to Section 9.3 for a reference on the various Fit Log functions
used for the reanalysis of data. Also refer to Section 3.6 for an example of using the
Fit Log to reanalyze data.
The “Parse From Acquisition File Name” option is to be used instead of “Results
File” if the data file containing the results is not explicitly specified by “Results File”
but rather by a prefix of the current data file being analyzed. Turning this option ON
tells the model that the data file containing the results (“Results File”) should be
found by looking at the file name given to the current experimental data file. (Thus,
when using “Parse From Acquisition File Name”, the “Results File” option should be
set to “<None>”. This field can be cleared by clicking on the blue underlined file
path and then clicking “Cancel” on the file dialog without opening a file.) The
“Delimiter” option tells the model how to parse the name of the data file containing
the previous results from the current experimental data file name. Note that this
parsing feature will only occur during a recipe measurement.
For example, say a wafer is initially measured, its data file is saved as “wafer.SE”,
and its fit results are saved into the same experimental data file, “wafer.SE”. Then,
the wafer undergoes some sort of post-processing. After that, the post-processed
wafer is measured, its data file is saved as “wafer-post.SE”, and it uses a model with
“Use Previous Results” turned ON and “Parse From Acquisition File Name” turned
ON with “-” as the “Delimiter”. In this case, to obtain the fit results for the pre-
processed wafer in order to fit the post-processed wafer, CompleteEASE will
acquire the previous results by parsing the experimental data file name, “wafer-
post.SE”, using only the text before the specified delimiter, in this case “-”, so that
the file name “wafer.SE” will be parsed from the beginning of the file name “wafer-
post.SE”. CompleteEASE will then extract the previous results from “wafer.SE” in
order to analyze the data in “wafer-post.SE”. (Note that the pre-processed data file
containing the previous results must be in the same directory as the post-processed
data file.) If the delimiter is not found in the data file name, then an error message
will appear and the data will be analyzed only with the values in the current model.
Figure 9-82. List of all +FIT Options, including hidden advanced options.
Figure 9-83. “Include Initial Fit Stage” allows you to define a subset of fit parameters that will
be included in a global fit that occurs before the main model fit with all of the fit parameters.
As stated above, the menu of options under “Perform Thickness Pre-Fit” should
rarely be changed from its default values. Only in rare cases should this be required.
Generally, if the thickness pre-fit fails to work properly, a global fit on the thickest
layer in the model should be used instead. Each extra thickness-pre-fit parameter is
briefly described below:
• Auto Wavelength Range: The thickness pre-fit algorithm operates by
looking for zero crossings in the C and S data. “Auto Wavelength Range”
indicates that CompleteEASE will automatically select the range over which
to look for zero crossings, generally looking for zero crossings in a subset of
the selected wavelength range. Turning “Auto Wavelength Range” to OFF
means it will use the full selected wavelength range when looking for zero
crossings. If thickness pre-fit fails, this is generally the first parameter to
change before attempting to use thickness pre-fit again.
• # of Compare Points: “# of Compare Points” affects the speed of the
thickness pre-fit algorithm. The algorithm compares generated and
experimental data to determine which thickness produces the best results,
but it does not use all the wavelengths in the spectral range. Rather, it only
selects 20 wavelengths from the full range by default, but this can be
changed with “# of Compare Points”.
• Subtract Average: Sometimes, the C- and S-curve oscillations are not
centered around zero and thus zero crossings may not be representative of
the thickness. To correct for this, “Subtract Average” can be turned ON to
subtract the mean value of the C and S curves (i.e. normalize them) when
searching for zero crossings.
• S or C Only: The thickness pre-fit algorithm looks at the data and
automatically decides whether to use S or C data when finding zero
crossings. When the thickness pre-fit algorithm generates “test” data
Figure 9-85. Visual representation of what the Global Fit does with two fit parameters. It
scans an entire grid of parameter-value combinations and finds the one that will produce the
lowest MSE.
Parameters
The “Parameters” section defines the fit parameters from the model that will be
used in the Global Fit. Parameters in the model must be turned on as fit parameters
before they can be used in the Global Fit.
Add
Select Add to add fit parameters from the model to the Global Fit.
Delete All
Select Delete All to delete all of the fit parameters present in the Global Fit. If “Use
Global Fit” is turned on but no parameters are specified, then no Global Fit will be
performed. To delete only one Global Fit parameter and not all of them, simply click
on the red x to the left of the Global Fit parameter you wish to delete.
# of Data Points
When performing a Global Fit, CompleteEASE does not use all of the measured data
to calculate the MSE values in order to increase speed and efficiency. Instead,
CompleteEASE selects a representative subset of data points from the data set
when performing the Global Fit. This option allows the user to specify the number
of data points CompleteEASE will use. A lower number means a faster Global Fit and
a higher number means a slower Global Fit.
# of Iterations
When performing a Global Fit, CompleteEASE does not perform all of the fit
iterations that it would normally perform for a regular fit while testing the global-fit
parameters. This is done to increase speed and efficiency because calculating the
full number of iterations for every parameter-value combination in the Global Fit
would be very time-consuming. Generally, a lower number of iterations is sufficient.
This value allows the user to specify how many iterations should be performed for
each parameter-value combination in the Global Fit grid. (A value of 0 entered here
will tell CompleteEASE to only calculate the MSE of the model using the nominal
values of each parameter, with no fit iterations performed.)
Random Search
By default, when CompleteEASE performs a Global Fit, it searches through the
parameter value combinations sequentially, similar to that shown in Figure 9-85.
However, the time taken to reach the results can be greatly reduced if
CompleteEASE does not have to exhaustively search all the parameter-value
combinations. If “Random Search” is turned ON, CompleteEASE will instead test
parameter-value combinations in random order until a result is found that is below
the desired “MSE Threshold”. When that result is found, the Global Fit terminates,
and a regular fit is performed to finalize fit parameter results and reach the
minimum MSE possible.
Selected Data
This option specifies the type of data used to calculate the MSE during the fit.
Choices include Standard Ellipsometry (SE) data (Psi and Delta), Generalized
Ellipsometry (GE) data, Mueller Matrix data, and Intensity data only, as shown in
Figure 9-87. If any of these are selected, then the data set must have been acquired
with that type of data included. If Mueller Matrix data is selected, there are more
options available. You can choose whether or not the first element (m11) of the
Mueller matrix should be included in the fit. You can also specify which specific
Mueller-matrix elements should be included by turning “Use MM Elements Selected
for Graphing” to ON. Then, to select the elements, open the +Data menu above the
graph and choose “Select Mueller Matrix Elements” (refer to Section 7.4).
Fit Weight
This option is only available if Standard Ellipsometry data or Generalized
Ellipsometry data is specified in the “Selected Data” option. The Fit Weight setting
allows you to select the fit weighting, as shown in Figure 9-88. Fit weighting
determines which values affect the calculation of the MSE, which drives the fit
procedure as it is being minimized during the regression analysis. The quality of fit
for the model, as determined by the match between model-generated and
experimental data, is evaluated solely based on the data types selected in this
option, as the MSE is only calculated on types of data selected here. By default,
CompleteEASE uses N, C, and S data for fit weighting, as shown in Equation 9-4,
where n is the number of data points (which includes wavelengths × angles of
incidence × rotation angles/timeslices/map points if present, etc.), m is the number
of fit parameters, N = cos(2), C = sin(2)∙cos(), and S = sin(2)∙sin(). NE
represents the experimental data for N, and NG represents the generated data for
N. The same is true for both C and S. Changing this fit weighting will change the
data types which Equation 9-4 includes in its sum.
Equation 9-4
𝑛 2 2 2
1 𝑁𝐸 − 𝑁𝐺𝑖 𝐶𝐸 − 𝐶𝐺𝑖 𝑆𝐸 − 𝑆𝐺𝑖
𝑀𝑆𝐸𝑁𝐶𝑆 = √ ∑ [( 𝑖 ) +( 𝑖 ) +( 𝑖 ) ]
3𝑛 − 𝑚 . 001 . 001 . 001
𝑖=1
Figure 9-90. Fit panel showing a derived parameter, the index of the SiO2 layer at 632 nm.
Figure 9-91. Examples of derived parameters in the “Include Derived Parameters” section.
Clicking on the blue, underlined text after “Type =” (e.g. n as in derived parameter
1: in Figure 9-91) allows you to change the type of derived parameter being
calculated using the dialog box shown in Figure 9-92. Many of the available types of
derived parameters have additional associated options for controlling how the
derived parameter is calculated and how it is displayed in the Fit Results. A brief
description of each type of derived parameter is shown in Table 9-3, and more
detailed descriptions of a few of the derived parameters are given below that.
User Equation
The “User Equation” derived parameter allows the user to enter a custom equation,
based on the model fit parameters, that will be evaluated after the fit has finished
and displayed in the Fit Results on the Fit panel. If there is an error with the
equation, then the user equation derived parameter will not be displayed in the Fit
panel after a fit is completed.
To edit the equation for the derived parameter, press the Edit Equation command.
This brings up the “Edit Equation” dialog box as shown in Figure 9-93. The variables
used in an equation are fit-parameter names specified in enclosing brackets. An
example would be “[Thickness # 1]”. Any fit parameter name can be specified as
well as any other derived parameter names in the list of derived parameters. For
more information on how to use the equation editor and its available operators and
functions, refer to the “Custom Oscillator” subsection of Section 10.4 and Table
10-3. In addition to specifying the equation, this dialog allows the user to enter the
number of decimal places that should be displayed.
Figure 9-94. Color Coordinates shown as a derived parameter along with the fit results using
the L*a*b* type.
Sheet Resistance
This derived parameter, shown in Figure 9-95, calculates the sheet resistance of
layers between the specified starting and ending layer numbers. It sums the
resistivities as if they are parallel resistors, as shown in Figure 9-96. There are
“Offset” and “Multiplicative Corrections” available for matching ellipsometry-
measured values to alternative techniques if desired (e.g. a four-point probe). The
sheet resistance calculation rules are as follows:
• The calculation assumes all layers in the selected range “touch” the contacts.
The user sets the selected range (start and end layer numbers) appropriately.
• By default, all layers have an infinite resistivity.
• Gen-Osc layers with a Drude(RT) oscillator will use the “Resistivity” parameter
for the calculation. Gen-Osc layers with a Drude(NMu) oscillator will calculate
the resistivity from the “N” and “mu” parameters, assuming the current
effective mass is valid (see “Drude(RT) & Drude(NMu) Oscillators” in Section
10.4 for calculation details).
• Graded Gen-Osc layers using the parametric grade type will have the resistivity
of the slices summed up as if they are individual layers.
• EMA layers and graded layers not using the parametric grade type are
considered to have infinite resistivity even if they include a Gen-Osc layer with a
Drude oscillator.
• Intermix and Surface Roughness layers are ignored.
5
B. Johs, H. Arwin, T. Wagner, D. Appel, and D. Peros, “Accuracy of color determination from spectroscopic
ellipsometry measurements”, Thin Solid Films 519 (2011) 2711-2714.
Figure 9-96. Calculation of sheet resistance from multiple layers in a graded model using the
parallel-resistor model.
All Angles
0.045
45° Only
0.04
55° Only
0.035 65° Only
Standard Deviation in Angstroms
0.025
0.02
0.015
0.01
0.005
0
Actual Std. Dev. Fit Stats Error Bars MC Bootstrap MC
Figure 9-103. Random Error tests for a native oxide on silicon, comparing results for all
angles of incidence with results from various single-angle measurements.
Bootstrap Method
The Bootstrap method6 also fits the experimental data multiple times to check for
“precision”. The subset of data points used by each trial fit are selected at random
from the total population of experimental data points. As the name suggests, each
time an individual data point is selected, it is replaced back into the general
population of experimental data points. This means that, during any single trial fit,
the trial sample can contain one, two, or more copies of any given data point – or
no copies at all, if it is never selected. The user determines the size of the trial
sample relative to the total available data points by entering a “% Replacement”.
Parameter Perturbation
The experimental data are fit multiple times. However, before each trial fit, the fit
parameters in the model are perturbed by a percentage of their current value to
check if the fit is robust enough to return to the same solution.
6
R. Rosa, “The inverse problem of ellipsometry: a bootstrap approach,” Inverse Problems 4 (1988) 887.
Angle Offset
Fit results are compared with and without an angle offset.
Wavelength Shift
Fit results are compared with and without a wavelength shift.
Psi Offset
Fit results from the standard data set are compared to a data set that is
manipulated by applying a constant offset to the Psi values.
Delta Offset
Fit results from the standard data set are compared to a data set that is
manipulated by applying a constant offset to the Delta values.
Transmission Offset
Fit results from the standard data set are compared to a data set that is
manipulated by applying a constant offset to the Transmission Intensity values.
Substrate ‘n’
The standard fit is compared to a fit where the model substrate index of refraction
(n) is manipulated by applying a constant offset.
Substrate ‘k’
The standard fit is compared to a fit where the model substrate extinction
coefficient (k) is manipulated by applying a constant offset.
0.015
Difference: Exp Data and Model
0.01
0.005
-0.005
-0.01
-0.015
300 400 500 600 700 800 900
Wavelength in nanometers
Figure 9-104. Difference Graph between experimental data and the model-generated curves
for a P3HT film on SiO2-Si substrate.
0.005
Magnitude
-0.005
-0.01
-0.015
-0.02
300 400 500 600 700 800 900
Wavelength in nanometers
Figure 9-105. “Fit Error Magnitudes (+/-)” calculated from the difference graph.
2
1
3 1.5
2 1
1 0.5
0 0
0 200 400 600 800 1000 1200 1400 1600 1800
Wavelength in nanometers
Figure 9-106. Optical constants for the P3HT layer ordinary direction (in-sample-plane) where
“Fit Error Magnitudes” show the accuracy of the ordinary direction to be very good.
3 0.6
2.5 0.5
2 0.4
2
1
0 0
0 200 400 600 800 1000 1200 1400 1600 1800
Wavelength in nanometers
Figure 9-107. Optical constants and “Fit Error Magnitudes” for the extraordinary direction
(out-of-plane, normal to surface) of the P3HT film show less sensitivity to the values in this
direction.
Simulate Data
Experimental data can be simulated in CompleteEASE from the model using the
Simulate Data feature. This feature generates ellipsometric data from the current
model and uses it as though it were experimental data. This feature must be turned
on in Configure Options before it can be used.
To use this feature, click on Simulate Data to open the “Simulation Settings” dialog
box as shown in Figure 9-108. This dialog allows the user to specify the wavelength
range and angle range for the simulated data as well as choose the data type to be
simulated. Click “Ok” to create the simulated data set. (The checkbox called
“Perform Sensitivity Calculation” is a rarely used function that is designed to give
the user an idea of which angles and wavelength ranges give the most sensitivity to
a particular fit parameter. This option simulates data with the current model, then
increments a selected fit parameter by a specified amount, and then simulates the
Color Calculation
This feature is used to estimate the perceived color of a sample described by the
current model by calculating standard color coordinates assuming specular
reflection from the sample when illuminated by a standard illumination source of
predefined spectral intensity distribution under a defined angle of incidence and
considering the color sensitivity of the eye of a standard observer 7.
Press Color Calculation to show a dialog box representing the color coordinates of
the current model, as shown in Figure 9-109. The type of color coordinates (L*a*b*,
Tristimulus, or RGB), the angle of incidence for calculation of the reflectivity, the
7
B. Johs, H. Arwin, T. Wagner, D. Appel, and D. Peros, “Accuracy of color determination from spectroscopic
ellipsometry measurements”, Thin Solid Films 519 (2011) 2711-2714.
NOTE: The Color Calculation feature displays the CIE L*a*b* color coordinates for
the model, using ASTM Standard E308-99.
Figure 9-109. Color Calculation dialog box shows the color coordinates and estimated
graphical “color” for specular reflection based on current model, specified Angle of Incidence
(AOI), standard observer, and illuminant light.
Figure 9-110. Color Calc Parameter Simulation dialog box lets the user simulate the values of
the color coordinates by varying the values of one or two parameters.
Configure Options
Choose this command to show hidden advanced features in the +MODEL Options,
+FIT Options, and +OTHER Options sections of the model. The “Show Model
Options” dialog box is shown in Figure 9-112, which contains a brief description of
each of the available advanced options.
Figure 9-112. Show Model Options dialog box, which displays hidden options for the model.
Retardance Model
The Retardance model is designed to simplify the analysis of certain anisotropic
substrates which are typically classified as “linear retarders”. Common examples of
such anisotropic samples are birefringent polymeric sheets (e.g., PET, PEN,
Polyimide), waveplates, quartz, and sapphire substrates. This model requires
ellipsometry data measured in transmission mode. The first part of the model is
based on the Jones decomposition9. The Jones decomposition shows that the
product of any number of retarders and rotators can be equivalently described by
the product of a retarder and a rotator. The Retardance model applies the
decomposition method on generalized ellipsometry (GE) data through a 2×2 matrix
diagonalization. The output parameters are the linear retardance, fast axis, rotary
power, and any nonidealities of the data. This model is also capable of finding the
polarizing parameters through ellipsometric modeling rather than using direct
calculation. When the “In-Plane and Out-Of-Plane” option under “Model Analysis”
is selected, CompleteEASE will create a biaxial Cauchy model for the data. Before
8
P.G. Snyder, J.A. Woollam, S.A. Alterovitz, and B. Johs, “Modeling AlxGa1-xAs Optical Constants as Functions of
Composition”, J. Appl. Phys. 68 11 (1990) 5925.
9
R.C. Jones, “A New Calculus for the Treatment of Optical Systems I. Description and Discussion of the Calculus”, J. Opt.
Soc. Am. 31, p. 488-493 (1941).
Table 10-1. Layer types in CompleteEASE. Most of these layers can be found in the
CompleteEASE material files library. The asterisk (*) indicates layers that are not present in
the CompleteEASE library but are obtained in other areas of CompleteEASE.
10.1. Tabulated
Most of the layers in the CompleteEASE material file library are standard tabulated
optical-constant lists. The optical constants for this type of layer are represented as
a table of optical-constant values versus wavelength. The table can contain the real
and imaginary parts of a material’s dielectric function (1 and 2) or the material’s
complex index of refraction (n and k). If you find optical constant tables in literature
and wish to use them in CompleteEASE, you can type the table into a text file in the
correct format (tab delimited), give it the “.mat” extension, and then open it as a
layer in a CompleteEASE model.
Figure 10-1 shows how typical tabulated layers are represented in the model.
Unlike the rest of the layer types described in this chapter, these have no user-
adjustable parameters to define the optical properties, making tabulated materials
the simplest layer type to use as only the thickness of the layer can be varied.
Figure 10-1. A model constructed of standard tabulated layers. Each set of optical constants
is described by an underlying table of optical-constant values versus wavelength.
10.2. Cauchy
The Cauchy layer is the most commonly used layer for determining the optical
constants of a transparent or partially transparent film (such as dielectrics and
semiconductors below the fundamental bandgap). Over part of the spectral range,
the optical constants of these materials can be represented by an index that varies
slowly as a function of wavelength and an exponential absorption tail. The index of
refraction of the Cauchy layer is represented by an inverse power series containing
only even-power terms, and the extinction coefficient is represented by a simple
exponential tail (called the Urbach absorption tail).
The Cauchy is a dispersion layer that describes the index of refraction using a three-
term equation, as shown in Equation 10-1, where λ is the wavelength in μm. (For
the Cauchy layer, the A, B, and C parameters always correspond to a wavelength in
𝐵 𝐶
𝑛(𝜆) = 𝐴 + 2
+ 4
𝜆 𝜆
In addition to the three terms for index of refraction (n), there are three extra
(optional) terms to describe an Urbach absorption tail, as shown in Equation 10-2,
where α is the “k amplitude”, the amplitude of the absorption tail; β is the
“Exponent”, which scales the shape of the absorption tail; γ is the “Band Edge”,
which is measured in μm in Equation 10-2; and λ is the wavelength in μm. (Once
again, Equation 10-2 assumes both a band edge and wavelength in μm; however,
CompleteEASE allows entry of the band edge in whichever light units are
configured, and it will automatically modify the scaling factor in Equation 10-2
accordingly.) The Urbach absorption is optional and is only used if the material
being measured is not completely transparent across the whole spectral range and
captures the onset of a stronger absorption feature outside the measured spectral
range. Note that the n and k values in the Cauchy layer are described independently
of one another entirely; in other words, no Kramers-Kronig consistency is enforced.
Equation 10-2
1.24 1.24
𝑘(𝜆) = 𝛼 exp (𝛽 ( − ))
𝜆 𝛾
Figure 10-2 shows the Cauchy layer as displayed in the CompleteEASE model, and
Figure 10-3 shows an example graph of Cauchy optical constants. The “A”, “B”, and
“C” parameters are variable fit parameters that determine the index (n) dispersion.
The Urbach parameters are found under the +Urbach Absorption Parameters
section. The “k Amplitude” and “Exponent” are fit parameters for determining the
shape of the extinction coefficient (k) dispersion. The “Band Edge” parameter can
be set manually, but it is not a fit parameter since it is entirely correlated with the
“k Amplitude” parameter. (In other words, the extinction coefficient is equal to “k
Amplitude” at the “Band Edge”, which corresponds to k(γ) in Equation 10-2.) For
examples of data analysis using a Cauchy layer, refer to Section 3.3, Section 3.5, and
the “Transparent Region Analysis” part of Section 4.3.
Figure 10-2. Cauchy dispersion layer in CompleteEASE with Urbach Absorption Parameters
section expanded.
10.3. B-Spline
The B-Spline layer describes the optical constants versus wavelength of a material
using a series of basis-spline functions, which rely on a series of control points,
called “nodes”, whose positions are fixed in photon energy (eV). The approximate
spacing of the nodes is controlled by the “Resolution (eV)” value, and the resulting
number of nodes within the current spectral range is listed after this value. The
basis-spline curves are used to interpolate between the control points10,11.
B-Spline curves are defined by a series of nodes, which have a fixed position and a
variable amplitude. Basis polynomial functions at each node are defined by the
recursive B-Spline formula12 in terms of the positions of the adjacent nodes.
Summing the basis functions together (weighted by the amplitude of each node)
produces the resulting curve. B-Spline curves have many desirable properties for
modeling dielectric functions:
• B-Spline curves and their derivatives (up to the spline order minus one) are
continuous. (The B-Spline layer uses third-order B-Splines.)
• The B-Spline node amplitudes affect only the “local” shape of the curve;
e.g., changing a node amplitude in the UV does not affect the curve in the
visible spectrum.
• B-Spline curves exhibit the “convex hull” property; e.g., if all the node
amplitudes are non-negative, then the B-Spline curve is also non-negative,
thus avoiding nonphysical, negative 2 values.
• Since the basis functions depend only on the node positions, the node
amplitudes which define the resulting curve are linearly independent,
which greatly increases computation efficiency.
• The Kramers-Kronig (KK) integral can be applied to the B-Spline recursion
formula to generate KK-consistent basis functions and thus KK-consistent
dielectric functions; i.e., the 1 curve is defined by the KK transform of the
2 curve, which is built with basis-spline functions.
10
B. Johs and J. S. Hale, “Dielectric Function Representation by B-Splines”, Phys. Status Solidi A 205 (2008).
11
J. Mohrmann, T. E. Tiwald, J. S. Hale, J. N. Hilfiker, and A. C. Martin, “Application of a B-spline Model Dielectric
Function to Infrared Spectroscopic Ellipsometry Data Analysis”, J. Vac. Sci. Technol. B 38 (2020).
12
W. Cheney and D. Kincaid, Numerical Mathematics and Computing, 5th ed. (2004), Chap. 9, pp. 419–436.
NOTE: The B-Spline layer will automatically recalculate node positions and
interpolate node amplitudes if the selected spectral range of the experimental data
is adjusted, if the node resolution is changed, or if “KK Mode” is toggled ON or OFF.
Figure 10-4. B-Spline layer in CompleteEASE with “KK Mode” turned OFF.
Figure 10-5. B-Spline layer node graph with “KK Mode” turned OFF.
Figure 10-7. B-Spline layer node graph with “KK Mode” turned ON.
NOTE: In the graph of Figure 10-7, the solid red and green lines for “e1” and “e2”
represent the reference material used to initialize the B-spline layer and might not
match the “Spline Model” curves (black dotted lines) after fitting experimental data.
This is expected behavior and is not something to be concerned about necessarily,
because the dielectric function implied by your fit results should be a more accurate
representation of the material you are fitting than any reference optical constants
that you used as a starting point.
To see examples of data analysis using the B-Spline layer, refer to Section 4.3. All
the available options for the B-Spline layer are shown in Figure 10-6 for a B-Spline
with “KK Mode” OFF and Figure 10-8 for a B-Spline with “KK Mode” ON. A brief
description of each option follows:
Resolution (eV)
The resolution (also called the “node spacing”) defines the uniform spacing of the
B-Spline nodes across the spectrum in eV. The resolution must be small enough to
capture variation in the experimental data but large enough to avoid matching
thickness interferences or noise. (A warning will be shown if unusually small
resolution values are entered.) The resolution can be adjusted in specific, smaller
subregions of the spectrum by using the “Node Spacing Spectral Regions” option
described in the +Nodes section below.
Use KK Mode
When “Use KK Mode” is set to OFF, separate, unrelated B-Spline curves are
calculated and fit for 1 and 2. When “Use KK Mode” is set to ON, a B-Spline curve
is used to define 2, and 1 is calculated from the KK transform of 2 (plus
contributions from absorption outside the measured spectral range). This option
adds the additional +Kramers-Kronig menu. KK Mode is being used when “Use KK
Mode” is turned on and when “(In Use)” appears to the right of the “Use KK Mode”
option, indicating that KK Mode is being used. If “(Not In Use)” appears to the right
of the “Use KK Mode” option, this means that there are not enough nodes to allow
the KK integration to be calculated, and therefore KK Mode is not being used, even
though “Use KK Mode” is set to ON. In order to activate KK Mode in this case,
decrease the “Resolution (eV)” value to add more nodes to the spectrum; KK Mode
requires at least four nodes to be used.
+Kramers-Kronig
This section is only visible when “Use KK Mode” is set to ON. It contains the variable
parameters that are only applicable when KK Mode is enabled, such as “Einf”, “IR
Amp”, “IR Br”, and extra nodes outside the measured range (called “tie offs”) to
accommodate the KK transformation and determine the correct 1 curve. The
options in the +Kramers-Kronig section are shown in Figure 10-9.
E Inf
This represents the 1 value “at infinity”. When in KK mode, this accounts for the
effects of absorption far outside the measured spectral range by adding a constant
offset to the 1 curve.
IR Br
This value is the broadening of the zero-energy oscillator mentioned in “IR Amp”
above. By default, this value is fixed at zero in order to describe a pole which
accounts for strong IR absorption outside the measured spectral range. Allowing
this value to be nonzero turns the IR pole into a Drude absorption tail, which might
be useful for some metallic dielectric functions, but it can lead to unwanted
correlation with the tie-off nodes.
+Nodes
This section contains all the parameters that affect node amplitude values and node
position values. The options in the +Nodes section are shown in Figure 10-10.
Init. Values
Entering values for n or k in the “Init. Values” fields will reset all node values across
the entire spectrum to these constant values. Usually this option should only be
used when setting up the B-Spline layer before the first fit or with a Global Fit if
good starting values for n and k are not known.
Starting Mat.
Loading a material file in the “Starting Mat.” field will reset all the node values to
match this reference material file across the spectrum. This can be an effective way
to seed reasonable “starting” node values into the B-Spline layer. Generally, a
B-Spline layer will not converge to the correct solution without good starting values.
When using the “Parameterize Layer to B-Spline” feature (see Section 9.5), the
material file being parameterized is added as the “Starting Mat.” and can thus be
replaced here if needed.
Force E2 Positive
Setting this to ON prevents 2 nodes within the measured spectral range from going
below zero, which is unphysical behavior for the 2 dielectric function. The tie-off
nodes outside the spectral range are still allowed to go below zero to accommodate
effects outside the measured spectral range, so it is possible that 2 may still go
negative at the edge of the spectrum. While forcing 2 positive maintains “physical”
dielectric functions, sometimes allowing slightly negative 2 values improves the fit
convergence algorithms by allowing flexibility for noise in the data.
Figure 10-11. Optical Constants for GaP from ultraviolet to near infrared.
Figure 10-13. GaP optical constants described by a B-Spline layer with 0.5-eV node spacing
above 500 nm (below 2.48 eV) and 0.1-eV spacing below 500 nm (above 2.48 eV).
+Advanced
A few additional options are hidden in the +Advanced section, as shown in Figure
10-14, to avoid unneeded complexity since these are only used for special purposes.
10.4. Gen-Osc
The Gen-Osc layer is a generalized oscillator material that allows the summation of
different oscillator line shapes. Figure 10-15 shows a Gen-Osc layer with two
oscillators of different types, along with the associated graph of the resulting optical
constants. For examples that involve using the Gen-Osc layer to analyze data, refer
to Section 4.4.
Show Dialog
Press Show Dialog (as shown in Figure 10-15) to bring up the Gen-Osc layer editor
to manipulate the Gen-Osc fit parameters while visualizing the changes to the
optical constants graphically. This “Edit Layer” dialog allows the oscillator
parameters to be matched to reference optical constants. This dialog box functions
in a similar manner as the “Parameterize Layer” dialog box and is shown in Figure
10-16.
Figure 10-16. “Edit Layer” dialog box to view and manipulate the Gen-Osc parameters.
NOTE: The oscillators in the Gen-Osc can be selected or deleted by pressing the
number to their left. Use care when clicking on the oscillator number, as each
mouse-button has a different function: Left-clicking on the oscillator selects the
oscillator and shows the gray “drag boxes”. Right-clicking opens a dialog asking
whether to delete the oscillator from the list.
Einf
“Einf”, or “” as it is often referred to in scientific literature, is a purely real
constant added to 1. This represents the 1 value “at infinity”, which accounts for
the effects of absorption far outside the measured spectral range.
𝐴𝑛
𝜀uv_pole (𝐸) = 2
𝐸𝑛 − 𝐸 2
IR Pole Amp.
The IR Pole describes absorptions that occur at lower energies outside the
measured spectral range. The IR pole is always centered at 0 eV (which is
technically implemented as 10-8 eV for calculation purposes), thus the IR pole is
defined as in Equation 10-4 where ir_pole(E) is 2 of the IR pole as a function of the
energy (E) in eV and An is the amplitude of the pole (“IR Pole Amp.”) in eV2.
Equation 10-4
−𝐴𝑛
𝜀ir_pole (𝐸) =
𝐸2
Oscillator Menu
The Oscillator Menu contains commands to manipulate the list of oscillators by
adding, deleting, and sorting them.
Add
This command adds a new oscillator to the list. If there are no oscillators present in
the list, then a dialog box will appear allowing you to select the oscillator that you
want to add as shown in Figure 10-17. If there are already oscillators present in the
list, then Add will just add another copy of the last oscillator type that was added.
In order to change the oscillator type, simply click on the blue underlined text of the
oscillator type name (e.g. Gaussian), and the dialog box to select the oscillator type
will appear as shown in Figure 10-17.
Figure 10-17. Choices for oscillator types within the Gen-Osc layer.
Delete
This command deletes the oscillator from the list which was last selected. To select
an oscillator, simply left-click on the number to the left of the oscillator type name.
To quickly delete a specific oscillator, you can also right-click on the number to the
left of the oscillator type name (e.g. 1:) to open a dialog box asking whether to
delete the oscillator, or you can hold the SHIFT key down and right-click on the
number to the left of the oscillator type to delete an oscillator without warning.
Delete All
This command opens a dialog box asking whether to delete all the oscillators
present in the list.
Sort
This command toggles the visibility of the “Sort Menu”, as seen in Figure 10-18,
which allows you to move each oscillator to a new position in the list or sort all
Figure 10-18. Choices for oscillator types within the Gen-Osc layer.
Changing the order of oscillators in the oscillator list by using the “Sort Menu”
should not change the resulting optical-constant values. Its only purpose is to allow
easier visualization of which oscillators are present in the Gen-Osc layer. Typically,
when constructing a Gen-Osc layer model, oscillators are added in arbitrary order,
and thus navigating a long, unsorted list of oscillators can become tedious.
NOTE: Since the fit parameters associated with an oscillator are named with the
number of the oscillator’s position in the list (e.g. “Amp2”, “En3”, “Br1”), sorting or
moving any oscillator will rename all of its associated fit parameters to reflect its
new position in the list. Changing oscillator fit parameter names will break
parameter references if they are used with Parameter Coupling, Derived
Parameters, Custom Equations, or Multi-Sample Analysis. Use caution when moving
or sorting oscillators in the oscillator list. If you happen to break the parameter
relationships by sorting oscillators, the Reset List (see Section 9.2) can be used to
restore previous parameter relationships if a fit had been performed before sorting
the oscillators.
Fit Menu
The Fit Menu contains commands to turn on or off some or all of the fit parameters
of all oscillators in the list for convenience.
Lorentz Oscillator
This is a version of the classic Lorentz oscillator model described in Equation 10-5
where Lorentz(E) represents the complex dielectric function contribution of the
oscillator as a function of photon energy (E) in eV, En is the center energy of the
𝐴𝑛 𝐵𝑟𝑛 𝐸𝑛
𝜀Lorentz (𝐸) = 2
𝐸𝑛 − 𝐸 2 − i𝐵𝑟𝑛 𝐸
In this style of the Lorentz oscillator, An approximately equals 2 at its peak value,
and Brn is approximately the full width at half-maximum (FWHM). Note that the
maximum position shifts to lower energies compared to the center energy En as
broadening (Brn) increases.
Harmonic Oscillator
The Harmonic oscillator function is similar to that derived from perturbation theory
in quantum-mechanical treatments of single-electron transitions, and it is typically
written in the literature as a two-term sum13. The Harmonic oscillator is shown in
Equation 10-7 where Harmonic(E) represents the complex dielectric function
contribution of the oscillator as a function of photon energy (E) in eV, En is the
center energy of the oscillator in eV, Brn is the broadening of the oscillator in eV, An
is the unitless amplitude of the oscillator, and i is the imaginary unit.
Equation 10-7
𝐴𝑛 𝐵𝑟𝑛 1 1
𝜀Harmonic (𝐸) = ( + )
2 1 1
𝐸𝑛 − 𝐸 − i 𝐵𝑟𝑛 𝐸𝑛 + 𝐸 − i 𝐵𝑟𝑛
2 2
An approximately equals 2 at its peak value, and Brn is approximately the full width
at half-maximum (FWHM). When the broadening becomes much less than the
center energy (Brn << En), the Harmonic oscillator is effectively equivalent to the
Lorentz oscillator above.
13
For example, see S. Adachi, Optical properties of crystalline and amorphous semiconductors: materials and
fundamental principles,” (Kluwer Academic Publishers, Norwell, MA, USA, 1999), p. 64.
Gaussian Oscillator
The Gaussian oscillator produces a Gaussian line shape in 2 with a Kramers-Kronig
consistent line shape for 1. The Gaussian oscillator is shown in Equation 10-9
where Gaussian(E) represents the complex dielectric function contribution of the
oscillator as a function of photon energy (E) in eV, En is the center energy of the
oscillator in eV, Brn is the broadening of the oscillator in eV, An is the unitless
amplitude of the oscillator, i is the imaginary unit, is a convergence series that
produces a Kramers-Kronig-consistent line shape for the 1 dielectric function14,15,
Z + and Z – (equivalent to Gaussian “Z-values”) are defined in Equation 10-10, and σn
(equivalent to Gaussian “standard deviation”) is defined in Equation 10-11.
Equation 10-9
Equation 10-10
𝐸 + 𝐸𝑛 𝐸 − 𝐸𝑛
𝑍+ = 𝑍− =
𝜎𝑛 𝜎𝑛
Equation 10-11
𝐵𝑟𝑛
𝜎𝑛 =
2√ln 2
An approximately equals 2 at its peak value (~Enn). By defining σn as in Equation
10-11, Brn approximately equals the full width at half maximum value (FWHM).
14
See section 3 of D. De Sousa Meneses, M. Malki, & P. Echegut, J. Non-Cryst. Solids 351 no.2 (2006) 769-776.
15
K.-E. Peiponen and E. M. Vartiainen, Phys. Rev. B 44 (15) (1991) 8301-8303.
−ℏ2
𝜀Drude(RT) (𝐸) =
𝜀0 𝜌𝑛 (𝜏𝑛 ∙ 𝐸 2 + iℏ𝐸)
Drude(NMu) has the carrier concentration, N, in cm-3; the carrier mobility, , in
cm2V-1s-1; and the carrier effective mass, m*, which is unitless and is given as a
multiple of the free-electron rest mass, as fit parameters. These parameters are
related to the resistivity, , and mean scattering time,, by Equation 10-13 where
me is the free-electron rest mass in kilograms and q is the elementary charge in
Coulombs. (Note that m*, , and N are all completely correlated, so the user will
have to choose one to fix and then let the other two fit. The usual choice is to fix m*
to a known value and then let and N vary in the fit.)
Equation 10-13
me 𝑚∗ 1
𝜌= 2
=
𝑁q 𝜏 q𝜇𝑁
Substituting Equation 10-13 into Equation 10-12 for and yields the Drude(NMu)
equation, shown in Equation 10-14, where Drude(NMu)(E) represents the complex
dielectric function contribution of the oscillator as a function of photon energy (E)
in eV, ħ is Planck’s constant divided by 2π with units of eV∙s, ε0 is the permittivity of
free space (vacuum dielectric constant) in F∙cm-1, me is the electron rest mass in
kilograms, q is the elementary charge in Coulombs, Nn is the carrier concentration in
cm-3; is the carrier mobility in cm2V-1s-1, m* (called “mstar” in CompleteEASE) is
the unitless carrier effective mass, and i is the imaginary unit.
Equation 10-14
−ℏ2 q2 𝑁𝑛 𝜇𝑛
𝜀Drude(NMu) (𝐸) =
𝜀0 (𝜇𝑛 𝑚𝑒 𝑚∗ ∙ 𝐸 2 + iqℏ𝐸)
(Note that in all of the definitions for the Drude oscillators, CompleteEASE uses the
pre-2019 values for ħ, the elementary charge q, and the permittivity of free space
ε0. The values of these constants were changed with the 2019 SI Units Redefinition.)
16
T.E. Tiwald, D.W. Thompson, J.A. Woollam, W. Paulson, R. Hance, Thin Solid Films 313-314 661 (1998).
(𝐸 − 𝐸𝑔)2
𝜀2 (𝐸) ∝
𝐸2
Equation 10-16
𝜀2 (𝐸) ∝ (𝐸 − 𝐸𝑔)2
The Cody-Lorentz oscillator also includes an Urbach absorption term with two extra
fit parameters to model absorption at energies below Eg.
Tauc-Lorentz Oscillator
The equation for the Tauc-Lorentz oscillator function is given in Equation 10-17,
which depends on Equation 10-18 and Equation 10-19. In these equations,
Tauc-Lorentz(E) represents the complex dielectric function contribution of the
oscillator as a function of photon energy (E) in eV, Eon is the center energy of the
oscillator in eV, Egn is the bandgap energy of the oscillator in eV, Brn is the
broadening of the oscillator in eV, An is the amplitude of the oscillator in eV, and i is
the imaginary unit. Equation 10-19 is the Kramers-Kronig transformation, where PV
indicates the Cauchy Principal Value of the integral. The bandgap energies (Egn) of
any Tauc-Lorentz oscillator can be coupled to Eg1, the Eg of the first Tauc-Lorentz
oscillator in the oscillator list, by turning “Common Eg” to ON.
Equation 10-17
17
G.E. Jellison, Jr. and F.A. Modine, “Parameterization of the optical functions of amorphous materials in the interband
region,” Appl. Phys. Lett. 69, 371 (1996), Erratum, Appl. Phys. Lett. 69, 2137 (1996).
18
A.S. Ferlauto, G.M Ferreira, J.M. Pearce, C.R. Wronski, R.W. Collins, Xunming Deng, and Gautam Ganguly, “Analytical
model for the optical functions of amorphous semiconductors from the near-infrared to ultraviolet: Applications in thin
film photovoltaics,” J. Appl. Phys. 92, 2424 (2002).
Cody-Lorentz Oscillator
The Cody-Lorentz oscillator is similar to the Tauc-Lorentz in that it defines a
bandgap energy, “Eg”, and a Lorentzian absorption peak (with parameters “Amp”,
“Eo”, and “Br”). However, for the Cody-Lorentz, Equation 10-16 applies in the
region just above the bandgap energy. The Cody-Lorentz also defines two
transition-energy fit parameters: “Ep” and “Et”. “Ep” is the offset from the bandgap
energy where the absorption transitions from Lorentzian to Cody behavior, and “Et”
is the offset from the bandgap energy where the absorption transitions from Cody
to Urbach behavior. The fit parameter “Eu” defines the exponential rate of the
Urbach absorption. See Figure 10-19 below for a graphical representation of these
fit parameters.
The equation for the Cody-Lorentz oscillator function is given in Equation 10-20,
which depends on Equation 10-21, Equation 10-22, Equation 10-23, and Equation
10-24. In these equations, Cody-Lorentz(E) represents the complex dielectric function
contribution of the oscillator as a function of photon energy (E) in eV, Eon is the
center energy of the oscillator in eV, Egn is the bandgap energy of the oscillator in
eV, Epn is the relative Lorentz-to-Cody transition energy of the oscillator in eV, Etn is
the relative Cody-to-Urbach transition energy of the oscillator in eV, Eun is the
exponential rate of the Urbach absorption of the oscillator in eV, Brn is the
broadening of the oscillator in eV, An is the amplitude of the oscillator in eV, and i is
the imaginary unit. G(E), defined in Equation 10-22, is the near-bandgap function
which defines the Cody behavior of the oscillator. L(E), defined in Equation 10-23, is
the Lorentz oscillator function for the Lorentz behavior of the oscillator. Equation
10-24 is the Kramers-Kronig transformation, where PV indicates the Cauchy
Principal Value of the integral. The bandgap energies (Egn) of any Cody-Lorentz
oscillator can be coupled to Eg1, the Eg of the first Cody-Lorentz oscillator in the
oscillator list, by turning “Common Eg” to ON.
Equation 10-20
Equation 10-21
(𝐸 − 𝐸𝑔𝑛 )2
𝐺(𝐸) =
(𝐸 − 𝐸𝑔𝑛 )2 + 𝐸𝑝𝑛 2
𝐴𝑛 𝐵𝑟𝑛 𝐸𝑜𝑛 𝐸
𝐿(𝐸) = 2
(𝐸 2 − 𝐸𝑜𝑛 2 ) + 𝐵𝑟𝑛 2 𝐸 2
Equation 10-24
∞
2 𝜔 ∙ 𝜀𝑛2 (𝜔)
𝜀𝑛1 (𝐸) = 𝑃𝑉 [∫ 2 𝑑𝜔]
𝜋 𝜔 − 𝐸2
0
Eo
Eg+Et
Eg
Eg
Ep
In Equation 10-21, G(E) represents the Cody behavior (defined in Equation 10-22)
while L(E) is a Lorentz oscillator (defined in Equation 10-23). The sum Eg + Ep is the
energy where the oscillator transitions from a Cody absorption (Equation 10-16) to
a Lorentzian absorption. Note that G(E) → (E – Eg)2/Ep2 when E → Eg+, and
G(E) → 1 when E >> Ep.
The sum Eg + Et is the energy that marks transition between Urbach absorption and
Cody absorption. It is important to note that there are differences between the
Ferlauto18 and CompleteEASE definitions. Ferlauto defines Et as an absolute energy,
while CompleteEASE defines it as relative to the gap energy, as shown in Equation
10-25.
Equation 10-25
𝑔𝑛 𝜉 1
𝑔̃(𝜉) = −2𝜓 ( ) − − 2𝜓(1 − 𝜉) −
𝜉 𝑔𝑛 𝜉
Equation 10-28
2
𝜉 (𝐵̃𝑛 (𝐸)) =
̃ (𝐸) 𝐸 ∙ 𝑔𝑛 − 𝐵̃𝑛 (𝐸) 4
√𝐸 ∙ 𝑔𝑛 − 𝐵𝑛 +√ +
𝑅𝑛 𝑅𝑛 𝑔𝑛
Equation 10-29
𝑑 ∞
𝜓(𝑧) = ln Γ(𝑧) Γ(𝑧) = ∫0 𝑥 𝑧−1 𝑒 −𝑥 𝑑𝑥, ℜ(𝑧) > 0
𝑑𝑧
The parameter gn is a screening factor that can vary between 0 and (excluding
zero). As g → , it approaches an unscreened Coulomb potential, and as g → 0, it
approaches total screening. In CompleteEASE, since gn is bound between 0 and ,
the gn parameter is not fit for directly. Instead, the fit parameter called “lng#” fits
for the natural logarithm of gn; thus, Ing = ln(gn). Substituting the relationship
gn = exp(ln(gn)) = exp(Ing) into Equation 10-27 and Equation 10-28 above yields
equations directly using the CompleteEASE fit parameter “Ing#”.
19
Christian Tanguy, “Optical Dispersion of Wannier Excitons,” Phys. Rev. Lett. 75, 4090 (1995).
Errata, Phys. Rev. Lett. 76, 716 (1996).
20
Christian Tanguy, “Analytical expression of the complex dielectric function for the Hulthén potential,” Phys. Rev. B.
60, 10660 (1999).
WR
Amp=10
Br=0.05eV
O2R=0 AR=0.8
AR=0.5
AR=0.3
PR=0.5
PR=0.6
Figure 10-20. Graph of 2 showing the effects on the line shape of the Psemi-M0 oscillator
for different AR and PR values.
21
The psemi.mat layer is described in detail in the WVASE® software manual.
Figure 10-21. Two views of Psemi-Tri oscillator. Top: Graph of 2 showing the “Amp”, “Ec”,
endpoints and control-points. Bottom: Psemi-Tri for 3 different “Br” values.
Table 10-2. Variable and fixed parameter values for Psemi oscillator functions.
22
D. E. Aspnes, “Modulation Spectroscopy/Electric Field Effects on the Dielectric Function of Semiconductors,” from
Handbook on Semiconductors, Vol. 2, edited by M. Balkanski (North Holland, 1980), pp. 125 – 127.
𝐸 + i𝐵𝑟𝑛
𝜒𝑛 =
𝐸𝑛
Equation 10-32
𝐴𝑛
𝜀CPM0 (𝐸) = (2 − √1 + 𝜒𝑛 − √1 − 𝜒𝑛 )
𝐸𝑛1.5 𝜒𝑛 2
Equation 10-33
−𝐴𝑛
𝜀CPM1 (𝐸) = ln(1 − 𝜒𝑛 2 )
𝜒𝑛 2
23
S. Adachi, Phys. Rev. B 35, 7454 (1987).
24
S. Adachi, “Optical dispersion relations for GaP, GaAs, GaSb, InP, InAs, InSb, Al xGa1-xAs, and In1-xGaxAsyP1-y” J. of Appl.
Phys. 66, 6030 (1989).
25
M. Schubert, T. Hofmann, B. Rheinländer, I. Pietzonka, T. Sass, V. Gottschalch, and J. A. Woollam, “Near-band-gap
CuPt-order-induced birefringence in Al0.48Ga0.52InP2” Phys. Rev. B 60(24), 16618 (1999).
26
M. Schubert, T. E. Tiwald, and C. M. Herzinger, Phys. Rev. B 61 8187 (2000).
27
J. Humlíčcek, R. Henn, and M. Cardona, Phys. Rev B 61(21) 14554 (2000).
(𝐸𝐿𝑂𝑛 )2 − 𝐸 2 − i(𝐵𝐿𝑂𝑛 )𝐸
𝜀TOLO (𝐸) = 𝐴𝑛
(𝐸𝑇𝑂𝑛 )2 − 𝐸 2 − i(𝐵𝑇𝑂𝑛 )𝐸
The broadening parameters, BLO and BTO, are associated with the LO phonon and TO
phonon resonance, respectively. If BTO = BLO, then the TOLO resonance assumes the
classic Lorentz line shape. According to Schubert26, will remain physical (i.e., 2 ≥
0) only if ∑𝑘𝑛=1(𝐵𝐿𝑂𝑛 − 𝐵𝑇𝑂𝑛 ) > 0 for all k TOLO oscillators. On the other hand,
Humlíčcek27 states that ∑𝑘𝑛=1(𝐵𝐿𝑂𝑛 − 𝐵𝑇𝑂𝑛 ) = 0. Regardless of which is correct,
these conditions are not automatically enforced by the Gen-Osc layer and must be
enforced manually by the user.
Custom Oscillator
The custom oscillator allows the user to define a layer’s complex dielectric or
refractive-index function by entering a custom equation.
Operator List
A number of built-in operators and functions are available for use in the Custom
Oscillator equation. They are listed in Table 10-3.
Table 10-3. List of built-in operators and functions available in the CompleteEASE equation
editor dialog box for building a custom oscillator.
Figure 10-23. Custom Oscillator “Edit Marker Parameters” dialog box for Lorentz equation.
Once the common markers are set, the user-defined parameters can then be varied
by simply dragging the marker boxes around the Graph (Figure 10-24) using a
mouse. Setting the common markers also includes the user-defined parameters in
the specific Amp., Br., and En. toggle switches in the “Fit Menu”.
Broadening Broadening
marker marker
Center Energy
marker
Figure 10-24. Graph panel with markers identified for a user-defined oscillator.
Pole
Poles, which the 1 part of the dielectric function will approach asymptotically, are
equivalent to Lorentz oscillators with zero broadening. As such, they only affect the
real part of the dielectric function (1) and not the imaginary part (2). A pole is
defined mathematically by Equation 10-3, the same as for the UV pole. However,
poles added in the oscillator list can be placed anywhere the user desires; they are
not restricted to the UV region.
There are many ways to implement an EMA in CompleteEASE. The EMA Layer
described here is the most general way to construct an EMA; however, some
simpler methods include surface roughness (Section 9.4), which is a Bruggeman
EMA with 50% of the top layer in the model and 50% void; the Intermix Layer
(Section 10.6), which is a Bruggeman EMA with 50% of the layer above and 50% of
the layer below; and the Graded Layer (Section 10.18), which can increase or
decrease the index of a material by mixing it with void. (For more advanced
applications, such as porosimetry measurements, see Section 10.20 for the Porous
EMA layer.)
28
D. E. Aspnes, “Optical properties of thin films,” Thin Solid Films, 89 (1982).
29
D. E. Aspnes, J. B. Theeten, and F. Hottier, “Investigation of effective-medium models of microscopic surface
roughness by spectroscopic ellipsometry,” Phys. Rev. B, 20 (1981).
30
H. Fujiwara, J. Koh, P. I. Rovira, and R. W. Collins, “Assessment of effective-medium theories in the analysis of
nucleation and microscopic surface roughness evolution for semiconductor thin-films,” Phys. Rev. B, 61 (2000).
Figure 10-27. Choose “Intermix” before adding a layer between two layers to create an
Intermix between materials.
An example of the Intermix layer is shown in Figure 10-28. Notice the Intermix is
not a numbered layer. Intermix thickness is an independed thickness quantity, with
half of its thickness extending into the layer below, and half of its thickness
extending into the layer above. The thickness of the numbered layers remains the
same. Defining the Intermix “layer” in this manner maintains the total optical
thickness of the film stack, independent of the intermix thickness. This helps to
orthogonalize the layer thickness and intermix thickness fit parameters, as the layer
thickness essentially specifies the optical thickness of the film (which, for example,
determines the period of any thin-film interference oscillations), and the intermix
thickness specifies how diffuse or non-abrupt the interface is (which, for example,
may affect the magnitude or damping of any thin-film interference oscillations).
10.7. Void
The Void layer is a special case of a tabulated layer where the optical constants are
fixed for all wavelengths at the nominal values for air (vacuum): n=1 and k=0. The
void layer is often used in combination with other layers, such as the EMA layer
(Section 10.5) and the Graded layer (Section 10.18) when using the “Standard” type
of grading.
Figure 10-30. Additive layer example of adding a constant offset of e1=1 to SiO2 optical
constants.
The Additive layer can also be used to sum together the dielectric-function tensors
of anisotropic materials (such as the Biaxial and Full Tensor layers). When an
anisotropic material is loaded into the Additive layer, it will automatically detect the
anisotropy and will add the dielectric tensor elements together instead of just ε1
and ε2. When in anisotropic mode, Euler angle rotations within each constituent
anisotropic material (“internal Euler Angles”) are applied before summing up the
tensor elements. Then, a set of "External Euler Angles" allows the total, summed
dielectric-function tensor to be rotated to account for sample surface cuts and
orientations. An example of the Additive layer in anisotropic mode is shown in
Figure 10-31.
10.9. Biaxial
The Biaxial layer allows the user to model anisotropic materials for which an eigen
coordinate system exists in which the dielectric-function tensor is diagonal for all
wavelengths (orthorhombic and higher symmetry). This layer is used for both
uniaxial anisotropy (two independent diagonal elements) and biaxial anisotropy
(three independent diagonal elements). It has three Euler-angle terms to rotate the
orientation of principal axes relative to the ellipsometer measurement orientation.
There are two modes which can be used within the Biaxial layer. With “Difference
Mode” OFF, the optical constants along the principal directions (two for uniaxial,
three for biaxial) are independently described by separate material files. This is
shown in Figure 10-32. With “Difference Mode” ON, the optical constants along the
x-direction (“Ex”) are described by a material file while an extended Cauchy
“difference” is established for the index difference between the x-direction and the
other principal directions. This is shown in Figure 10-33. An isotropic layer can be
converted to a Biaxial layer by right-clicking on the layer name and choosing
“Convert to Anisotropic”. For examples of data analysis using the Biaxial layer, see
Section 5.4.
Figure 10-32. The anisotropic Biaxial layer with “Difference Mode = OFF”.
Figure 10-33. The anisotropic Biaxial layer with “Difference Mode = ON”.
10.10. Biaxial 2
The Biaxial 2 layer is a special version of the Biaxial layer that contains different
Euler angle definitions in order to make the analysis of specific materials more
convenient. Biaxial 2 allows two different theta Euler angles, “Theta X” and “Theta
Y”, to compensate for small X and Y tilts so that the phi Euler angle (here called
“Phi2”) does not need to be rotated by 90° to describe the optical axis orientation.
The Biaxial 2 layer can be seen in Figure 10-34.
The standard Biaxial layer uses an Euler-angle definition that works well if the theta
angle is large. However, if the c-axis of a crystal is only slightly tilted away from the
normal, it always favors the tilt along the y-direction. A slight tilt along the y-
direction only needs a small theta value. Then, with the standard Biaxial layer, if a
slight tilt along the x-direction is needed, phi needs to be rotated by a full 90° and
then theta can be slightly tilted. To solve this, the Biaxial 2 layer contains the Euler
angles in terms of a slight x-tilt and a slight y-tilt. (Thus, there are two theta angles
and no psi angle). The behavior of Biaxial 2 is very similar to the standard Biaxial
layer, and you can create the same tensor symmetries with Biaxial 2 as with Biaxial,
but the Biaxial 2 layer is much simpler if you are dealing with small x-tilts and y-tilts
in the crystal, perhaps due to a mis-cut. The relationship between Biaxial Euler
angle definitions and the Biaxial 2 Euler angle definitions are given in Equation
10-38 where φ, θ, and ψ are the Euler angles of the Biaxial layer and φ 2, θX, and θY
are the Euler angles of the Biaxial 2 layer.
Equation 10-38
tan 𝜃𝑋
𝜙 = 𝜙2 − arctan
tan 𝜃𝑌
Figure 10-34. The Biaxial 2 layer is a special version of the Biaxial layer for handling rotation
when there are small X and Y tilts.
𝐵 𝐶
𝑛𝑑 + 2 + 𝜆4
𝑛(𝜆) = 𝜆
𝐵 𝐶
1+ +
𝑛 𝑑 𝜆𝑑 2 𝑛 𝑑 𝜆𝑑 4
Figure 10-35. The Cauchy_Wvl layer is the same dispersion shape as Cauchy, but it allows
entry of the refractive index (n) at a design wavelength in place of the “A” parameter of the
standard Cauchy.
10.12. Cauchy_Extended
The Cauchy_Extended layer is a special representation of the Cauchy layer. It
provides a similar shape to the standard Cauchy layer, but it contains the ability to
more precisely describe the refractive-index dispersion with an additional “D”
parameter, and it can decrease index quickly toward the NIR spectral region by
adding an “IR” term. An example layer is shown in Figure 10-36 with the resultant
optical constants shown in Figure 10-37. The refractive index is given in Equation
10-40 where λ is the wavelength in m. The extinction coefficient is given in
Equation 10-41 where λ is the wavelength in m, γ is the band edge energy in eV,
E(λ) is the energy of λ relative to the band edge in eV, η(λ) determines whether the
Cody Amplitude should be included (i.e., is the wavelength greater than the band
edge?), α is the Urbach amplitude, β is the Urbach exponent, and ρ is the Cody
amplitude.
Equation 10-40
𝐵 𝐶 𝐷
𝑛(𝜆) = 𝐴 + + + − 𝐼𝑅 ∙ 𝜆2
𝜆2 𝜆4 𝜆6
Equation 10-41
Figure 10-37. Optical constants from a Cauchy_Extended layer. Note the downwards bending
at the longest wavelengths and the absorption at the shortest wavelengths due to inclusion
of the "IR" parameter and Urbach/Cody absorption, respectively.
10.13. Coupled
The Coupled layer has the same optical constants as another layer specified
elsewhere in the model layer stack. As the optical constants of the layers in the
model change during a fit due to adjustment of fit parameters, the optical constants
of the Coupled layer will also change to match the layer to which it is coupled. An
example is shown in Figure 10-38. The Coupled layer is often used as a constituent
material within another layer, such as the EMA layer (see Section 10.5). The
Coupled layer is also often used in multilayer stacks where different layers share the
same optical properties; however, for a repeating structure that alternates between
two layers, using the superlattice feature is more convenient (see Section 4.5 for an
example of using the superlattice).
Figure 10-38. The Coupled layer gets optical constants from another layer in the model. In
this case, it is using the optical constants from Layer #1, the Cauchy layer.
10.14. EMA-Coupled
The EMA-Coupled layer is a combination of the EMA and Coupled layers. The EMA-
Coupled layer operates exactly like the EMA layer described in Section 10.5, except
Figure 10-39. Example of the EMA-Coupled layer, where “Material 1” receives its optical
constants from a separate layer in the model, referenced by the layer number.
10.16. GenOsc 3D
The GenOsc 3D layer is an anisotropic layer that can combine oscillators of arbitrary
eigen-dielectric polarizability unit vectors to create every physically possible
dielectric function tensor, according to Equation 10-43. Within this model, each
oscillator has its own set of Euler angles, “Alpha#” and “Beta#”, which rotate the
eigen polarization direction within the x-y plane and away from the x-y plane,
respectively. The GenOsc 3D layer can be used to model monoclinic and triclinic
materials by using any oscillator model available in CompleteEASE (see Section 10.4
for descriptions of available oscillators). The GenOsc 3D layer is shown in Figure
10-41.
Equation 10-43
𝑁
Clicking on Show Dialog will show the specialized “Edit Layer” dialog box for the
GenOsc 3D layer, as shown in Figure 10-42. Reference materials can be added as
any dielectric-function tensor model (e.g. a Full Tensor layer or Biaxial layer) by
clicking on the ‘Open Material File’ button. Individual tensor elements can also be
Figure 10-42. The specialized “Edit Layer” dialog box for the GenOsc 3D layer.
Figure 10-43. Optical constants of Ga2O3 modeled using the GenOsc 3D layer.
𝐵1 𝜆2 𝐵2 𝜆2 𝐵3 𝜆2
𝑛(𝜆) = √1 + + +
𝜆2 − 𝐶1 𝜆2 − 𝐶2 𝜆2 − 𝐶3
10.18. Graded
Most layer types can be graded to model the optical variation with depth through
the film. This is achieved by right-clicking a layer and choosing to “Grade Layer”. An
example of a Graded layer is shown in Figure 10-45. There are three types of
grading that can be used in this layer: Simple, Standard, and Parametric. Parametric
grading has several grading profiles which allow linear, exponential, one-segment,
two-segment, and custom grading. Grading is accomplished by dividing the thin film
into a series of ‘slices’ that will have varying optical constants to approximate the
index gradient profile, as demonstrated in Figure 10-46. The number of slices can be
designated. The primary fit parameter for simple grading is the “% Inhomogeneity”,
which will be a positive number when the index is larger toward the surface of the
film than it is toward the substrate interface and a negative number when the index
is smaller toward the surface.
Figure 10-46. Grading by “slices” demonstrated for a sample of TiO2 on a glass substrate.
If you right-click on the title Graded Layer, several options are given to either
remove the grading or graph the optical constants, as shown in Figure 10-47.
“Remove Grading” simply converts the Graded layer material to a simple layer with
uniform optical constants throughout. “Graph Layer Optical Constants” will show
either n and k or 1 and 2 at both the top and bottom of the film, as shown in
Figure 10-48. Choosing to “Graph Sub-Layer Optical Constants” will graph the
optical constants for each slice in the grading model, as shown in Figure 10-49.
In order to graph a profile of the graded optical constants versus film thickness for a
specific wavelength, you can select the “+ Model” menu above the graph and
choose either “Optical Constants Profile” or “Optical Constants Profile (No
Substrate)”. These options will produce graphs like in Figure 10-50. Note that these
options apply to the model as a whole, so they will graph the optical-constant
profiles of all layers in the model, not only the Graded layer.
Figure 10-47. Right-click menu of the Graded layer allowing the graphing of optical
constants.
Figure 10-48. Example graph of graded optical constant at the top and bottom of the layer by
choosing “Graph Layer Optical Constants”.
# of Slices
For each type of grading, the profile is described by an equation between the top
and bottom of the film. Then, the number of slices, specified by “# of slices”, is
evenly distributed through the film and the value of each slice is taken from the
value at the center of each slice.
NOTE: The bottom and top “slice” do not have to be equal to the values of the
equation at the bottom and top of the film, as they get their value from the “slice”
center.
Grade Type
There are three different types of grading available, as shown in Figure 10-51.
Details for each are described below.
Simple Grading
Simple grading allows linear variation of the index of the film by fitting or adjusting
the “% Inhomogeneity” parameter. The index can either increase or decrease from
the bottom of film to the film surface, depending on whether “% Inhomogeneity” is
positive or negative, respectively. An example of simple grading is shown in Figure
10-52, where a Cauchy layer exhibits 4% inhomogeneity. The Cauchy layer remains
embedded in the Graded Layer, so the “average” index of the layer can still be
adjusted by the Cauchy parameters. The grading of the refractive index will occur in
both directions of the Cauchy – with a total range of index between the top and
bottom of the layer equaling the “% Inhomogeneity”.
NOTE: Simple grading only affects the index (n) of the film; it does not affect the
extinction coefficient (k).
Standard Grading
Standard grading uses an EMA to mix the current material being graded with
another material. Usually, the Void material (Section 10.7) is used, and it is selected
by default when standard grading is chosen. Unlike simple grading, standard
grading affects both index of refraction (n) and extinction coefficient (k) of the film.
Standard grading only uses the EMA mixing in order to vary the optical constants
between the bottom and top of the layer. The EMA top and bottom percentages
are not necessarily a physical mixture of the material with void. Rather, the EMA is
a mathematical calculation to adjust the optical constants up or down to vary with
film thickness. In fact, the EMA percentages can go negative to specify the index
and extinction coefficient going “up” (further away from the other material) rather
than “down”.
Standard grading with the “Exponent” parameter fixed at a value of “1.0” is
sometimes referred to as “linear grading”, while allowing the exponent to vary to
other values is sometimes referred to as “nonlinear grading”. Specifying that
“Symmetric Profile” should be ON indicates that the exponential variation should
be symmetric about the center of the film, whereas turning “Symmetric Profile” to
OFF indicates that the exponential variation should proceed from the bottom to the
top of the film.
Figure 10-54. Grade profile for a Graded layer with 5 slices and standard grading with
“Exponent = 1.0” (linear grading).
Figure 10-55. Grade Profile for a Graded layer with 21 slices and standard grading with
“Exponent = 0.2” and “Symmetric Profile” turned ON.
Figure 10-57. Grade Profile for a Graded layer with 21 slices and standard grading with
“Exponent = 0.2” and “Symmetric Profile” turned OFF.
Figure 10-58. Grade Profile for a Graded layer with 21 slices and standard grading with
“Exponent = 2.5” and “Symmetric Profile” turned OFF.
Parametric Grading
Parametric grading allows certain dispersion-model parameters to vary with depth
through the film, while the remaining parameters are constant with respect to film
depth. Thus, parametric grading only works with parameterized layers (not
tabulated layers) such as the Gen-Osc and Cauchy. An excellent example for the use
of parametric grading is modeling the free-carrier profile in transparent conductive
Figure 10-59. Example of parametric grading with a linear variation of the Drude resistivity
term.
After the “Grade Type” is selected to be “Parametric”, there are five choices for the
grading equation, called the “Profile”, as shown in Figure 10-60. The “Linear” and
“Exponential” grade profiles allow the parameters to be varied through the film in a
linear or exponential fashion. However, these grade profiles can be difficult for
parameters that are close to zero. The “One Segment” grading profile allows the
specific parameter values to be specified for the bottom and top of the film with
linear grading in between. The “Two Segment” grading profile splits the film into
two segments, where the values of the parameter being graded can be specified at
the bottom, middle (midway split between segments), and top of the film, with
linear grading in between. The “Custom” grading profile allows the user to enter
their own equation to describe the parameter grading.
Figure 10-60. Choice of “Profile” (the grading equation) for parametric grading.
Figure 10-61. Example of an exponential grading profile for the Drude resistivity parameter.
NOTE: Even though the grade profile has two segments, the 21 slices specified in
the Graded layer are distributed equally through the entire layer.
Figure 10-63. Grade profile for resistivity associated with the two-segment profile in the
previous figure.
Figure 10-66. A custom grade profile has been applied. The user-defined parameter
“% Grade” is now available as a fit parameter.
10.19. KK Material
The KK Material layer is used to perform the Kramers-Kronig (KK) transform
integration. The optical constants of either the real part or the imaginary part of the
dielectric function are specified by another material file, and the KK Material layer
will then calculate the other part of the dielectric function using the KK transform,
as given in Equation 10-45 and Equation 10-46, where 1 and 2 are the real and
imaginary parts of the dielectric function, respectively; E is the energy in eV; is
the offset of the real part, called “e1 Offset” in the KK Material layer (See the “Einf”
part of Section 10.4); and PV denotes the Cauchy principal value of the integral. An
example of the KK Material layer is seen in Figure 10-67. Often, the KK Material
layer is used in conjunction with the User Defined layer (Section 10.23), where the
user can specify one component of the dielectric function and then let the KK
Material layer calculate the other component. (In order to add flexibility for the
shape of the real part of the dielectric function, two poles are given that can be
specified. For more information on poles, see the “UV Pole”, “IR Pole”, and “Pole”
subsections of Section 10.4.)
Equation 10-46
∞
2𝐸 𝜀1 (𝜔) − 1
𝜀2 (𝐸) = − 𝑃𝑉 [∫ 2 𝑑𝜔]
𝜋 𝜔 − 𝐸2
0
10.21. Sellmeier
The Sellmeier layer is another dispersion layer that can be used to represent
dielectrics. It can be considered a slightly advanced version of the Cauchy layer. It is
used to represent the optical constants of transparent dielectric materials.
CompleteEASE uses a two-term Sellmeier model to account for UV and IR
absorption. The representation for the index of refraction is given in Equation 10-47
where n(λ) is the refractive index as a function of wavelength λ in μm, is an index
offset (“Einf”), A is the amplitude (“Amp.”) of the absorption, E is the center energy
𝐴𝜆2
𝑛(𝜆) = √𝜀∞ + − 𝑃𝜆2
𝜆2 − 𝐸 2
Figure 10-70. A Comp. & Temp. Library layer as displayed in the model. The composition and
temperature values are editable fit parameters.
Figure 10-71. The User Defined layer with an example Cauchy equation entered.
Figure 10-72. “Edit Equation” dialog box with an example Cauchy equation entered.
Actual Simplified
Sample Model
Layer 4 Layer 4
Layer 3
Virtual Layer 3
Interface
Layer 2
Layer 1
Pseudo-Substrate
Substrate
The “pseudo substrate” optical constants are obtained from a direct inversion of Psi
and Delta from experimental data using the bulk-substrate assumption. This
approximation is nearly exact for materials with a high index of refraction and low
index contrast (e.g. growth of semiconductors on semiconductors).
The Virtual Substrate layer is always used with dynamic data from in-situ
experiments. To set the timeslice in the dynamic data at which the “pseudo
substrate” optical constants calculation should occur, hold down the ALT key and
10.25. WvlByWvl
The WvlByWvl layer (short for Wavelength-by-Wavelength layer), as shown in
Figure 10-75, allows the optical constants to vary independently at each wavelength
(without regard to neighboring wavelengths measured). This layer has the utmost
flexibility but also the largest number of fit parameters and great propensity for
poor-quality results. Due to its use of only individual wavelengths, the WvlByWvl
layer will often reflect any measurement noise present in the data. As it does not
maintain Kramers-Kronig consistency or even smooth, continuous curves for the
optical constant dispersion, it should be used with extreme caution.
In the days before the widespread use of the B-Spline layer, the WvlByWvl layer
was the most common method for obtaining a test set of optical constants on
which to begin constructing a Gen-Osc model. Now, however, this process works
better when using a B-Spline layer instead of a WvlByWvl layer since the B-Spline
layer is guaranteed to produce smooth, continuous, and KK-consistent optical
constants. (Refer to Section 4.1 for a simple WvlByWvl layer example and refer to
Section 4.3 and Section 4.4 for examples of using the B-Spline to construct optical
constants for building a Gen-Osc model.)
10.26. Zero
The Zero layer is a layer with optical constants of ε1 = 0 and ε2 = 0 for all
wavelengths that is mostly used with the Full Tensor layer (Section 10.15) to set
certain elements of the dielectric tensor to zero.
The In situ tab is used for real-time dynamic ellipsometry measurements where the
sample properties might change with time. It provides several useful options for
real-time dynamic data acquisition and display. The In situ tab may be required for
M-2000 and RC2 systems mounted onto a chamber or for accessories such as liquid
cells or heat stages mounted onto M-2000, RC2, and alpha-SE systems.
3. When finished, click ‘Close’ and then ‘Yes’ to apply changes (see Figure
11-3).
Figure 11-5. Hardware control section shown prior to start of data acquisition.
NOTE: The settings for Standard and Fast acquisition modes are specified in the
Hardware Configuration. To access this, click ‘Edit Hardware Configuration’ in the
Hardware tab.
Trigger Acquisition
When the acquisition mode is set to Trigger (via “Hardware Configuration” dialog
box, see Figure 11-8), a ‘Trigger’ button will also appear after starting acquisition
(see Figure 11-9). Selecting this button will trigger a single data acquisition event.
Align Hardware
This allows the user to align the ellipsometer source and receiver units or the
sample stage.
System Check
Starts a System Check. See your ellipsometer’s hardware manual for more details.
Display Signal
Displays the raw intensity signal output by the CCD array spectrometer.
• Selecting a Model
Select the desired model from the “Model File” list.
NOTE: Only model files that have been saved in or copied to the COMMON folder
will appear in this list.
• Clearing a Model
Select “(none)” if you wish to clear the model slot.
• Parameter Corrections
With a model selected, all fit parameters from that model will appear in
the parameter list. Highlighting any fit parameter in the list allows the user
to include corrections (Offset, Multiply, and AlignX) to that fit parameter.
• “Do thickness control”
This checkbox directs CompleteEASE to send a signal to another program
or device to stop growth or etch when a target thickness is reached.
• “Write report”
This checkbox activates a report-writing function.
• “Merge with current model”
This checkbox allows the user to merge the selected model with the
current model in the Analysis tab. If the models match on all layers except
the top one, we can retain the fitted parameters from previous layers
when modeling additional layers.
For example, consider two models: 1) thermal oxide on silicon (Figure
11-13) and 2) metal on thermal oxide on silicon (Figure 11-14). The models
are identical except for the top layer.
A sample of thermal oxide on silicon is measured and analyzed with Model
1. The fitted thickness is 568.15 nm. Next, a metal is deposited over the
same sample and analyzed with Model 2 with “merged with current
model” checked. The previously fitted thermal oxide thickness is copied
into Model 2, but is no longer a fit parameter.
Figure 11-13. Model 1: thermal oxide on silicon. Note that the thickness of Layer
#2 is 568.15 nm and is an active fit parameter.
View
This panel selects which information to display in the graph. Select from
“Parameters”, “Log”, “Fit”, or “Dynamic Data” (see Figure 11-15).
Parameters
This button graphs the value of the fit parameters and hardware alignment
information during data acquisition. Figure 11-16 shows the parameter graph
during a practice in-situ measurement of a thermal oxide on silicon wafer. It is
displaying the “Total Thickness”, “MSE”, and “Hardware OK” versus time. The
parameters displayed are selected from the four drop-down menus above the
graph. Parameters listed in the two left boxes are shown on the left y-axis and
parameters listed in the two right boxes are displayed on the right y-axis. Besides
fit parameters and MSE, the following hardware parameters can also be displayed:
SigInt, Intensity, AlignX, AlignY, Hardware OK, and Fit OK. Custom parameters
added through a remote system can also be displayed here if available.
Fit
This displays ellipsometric data vs. wavelength for the last recorded timeslice as
well as data generated from the model if applicable (see Figure 11-18).
NOTE: More details of the Hardware tab can be found in the hardware manual for
your ellipsometer, which can be accessed by pressing F2 on the keyboard when
CompleteEASE is open. This chapter is meant only as a general reference.
hardware.cnf
Describes the hardware configuration and options available with the current
system. These settings should not be edited by the user unless instructed by a
Woollam representative.
CompleteEASE.cnf
Configuration file for user-settable software parameters. These parameters should
be accessed by choosing ‘Edit Configuration’ from the Options tab.
CompleteEASEhard.cnf
Configuration file for user-settable hardware parameters. These parameters should
be accessed by choosing ‘Edit Hardware Config.’ from the Hardware tab.
Privileges.cnf
Contains user privileges when password-protected user log-ins are created.
Hardware
Re-initialize
Re-initializes the ellipsometer hardware, which initiates communication over the
USB link, scans the spectrometer, moves the motors to their home positions, and
tests the motors. Details of any errors that occur during hardware initialization can
be found in the “Hardware” and/or “Error” logs.
Park Z-Stage
Moves the Z-stage to the “park” position such that the Z-stage shipping lock can be
engaged. This should be done before moving/shipping the alpha-SE unit to avoid
damage to the Z-stage motor.
Signal
Display
Displays signal intensity of the light collected by the spectrometer. Average,
maximum, UV, and IR intensity values are also reported in the status box, along
with the current spectrometer “Dark Count” and electronics “Temperature”. An
example is shown in Figure 12-2.
Z-Stage Scan
Scans the Z-stage to generate an intensity vs. sample height profile. A sample
should be mounted and the source and receiver should be set to 65, 70, or 75
degrees before clicking this button. The resulting signal intensity profile should
appear symmetrical, similar to the graph shown in Figure 12-3. The black dashed
curve is a polynomial fit to the measured profile, and the reported “MSE=” value
quantifies the symmetry of the profile. If the MSE value is greater than 0.02,
contact your J.A. Woollam representative.
Off-Sample Baseline
This acquires data at the current angle of incidence over a range of optical element
(polarizer and compensator) positions to improve data accuracy, especially for
intensity and Mueller-matrix measurements. Because this baseline is angle-
dependent, the best intensity and Mueller-matrix data follow an Off-Sample
Baseline at the angle of incidence intended for measurement.
This option also calibrates and stores the angle of incidence which is used for
subsequent measurements. For best angle of incidence accuracy, perform an Off-
Sample Baseline after moving the source or receiver units or after mounting the
sample chuck.
Angle Offsets
Calculates the angle offsets. This is usually performed as part of a calibration
procedure.
Show Logs
Hardware / Error
These buttons display the Hardware and Error logs, which contain information
useful for diagnosing and debugging problems with the instrument. An example
Error Log is shown in Figure 12-4. Use the ‘Copy to Clipboard’ button to paste the
log information into another program such as Microsoft Word.
You can use the “Date Range” fields to limit the range of data shown in the log.
Enter starting and ending dates and click ‘Update Range’. To return to the full log,
click ‘Show Full Range’.
If the instrument is not working properly, your J.A. Woollam representative may
require these files to diagnose potential problems. From the Options tab, click
‘Create Debug File’. This will create a zip file containing both logs
(C:\CompleteEASE\CompleteEASE_Debug.zip). Email this zip file to your J.A.
Woollam representative.
NOTE: If the size of the ErrorLog.txt file is greater than 5 MB, it is compressed and
saved to C:\CompleteEASE\cnf\Archive and a new file is created.
Camera
The camera is an optional accessory for the alpha-SE that may or may not have
been purchased with your system.
NOTE: The measurement beam will not be visible on smooth, specular surfaces, but
the beam position can still be identified using the “Show Beam Position” checkbox,
if ‘Mark Beam Position’ has been completed.
Illumination On
Use this checkbox to illuminate the sample if needed for better camera image.
Figure 12-7. Example results from routine test measurements performed over ~1 month.
NOTE: Full details of the Hardware tab can be found in your hardware manual.
This chapter is meant only as a general reference.
Hardware Status
Displays the current state of the hardware. The same information is also displayed
in the System Status panel of the Measurement tab.
General
Contains several panels and buttons and is nearly the same for all M-2000 and RC2
configurations (Figure 12-9).
Alignment
Align Sample
Starts sample alignment procedure without acquiring data after alignment is
complete. For systems with automated alignment capabilities, a dialog is displayed
allowing the user to choose between manual alignment and automated (“full”)
alignment (see Figure 12-10). Choosing ‘No’ in the dialog will proceed with manual
alignment. An alignment screen with 4-quadrant detector position and Z-intensity
is shown in Figure 12-11.
Figure 12-10. The “Sample Alignment” dialog gives the user a choice of automated (“full”)
alignment or manual alignment.
Display Signal
Displays the raw signal intensity (see Figure 12-12). This screen is useful for
diagnosing light intensity problems. The Average AC Intensity includes all channels
of the CCD spectrometer. The DUV AC Intensity is an average of the first 3
channels, while the UV AC Intensity is an average of the first 10% of CCD channels.
The IR AC Intensity is an average of the last 10% of CCD channels.
Show Results
Shows all past results of the “Routine Test Measurement”. This is a convenient way
to track the performance of a system with results on the same sample. The values
that can be graphed include any fit parameters for the model of the designated test
sample (thickness, refractive index, etc.) and many hardware parameters such as
intensity and alignment values.
Initialize Hardware
Re-initializes the ellipsometer hardware, which initiates communication over the
USB or TCP/IP link, scans the spectrometer and moves motorized components to
their home positions. Details of any errors that occur during hardware initialization
can be found in the error log.
NOTE: ‘Coarse Calibrate’ and/or ‘Fine Calibrate’ should only be used when
instructed by your J.A. Woollam representative.
NOTE: ‘Standard Calibration’ should only be used when instructed by your J.A.
Woollam representative.
Lamp ON (RC2)
Turns the ellipsometer light source (lamp) on or off.
System
Controls in the System tab vary depending on the ellipsometer base type and
configuration or accessories available. Figure 12-16 shows an example System tab
for a horizontal-base system and Figure 12-17 shows an example System tab for a
vertical-base system. Brief descriptions of the different buttons on this panel can
be found below. See hardware manual for more details.
Misc.
Other functions that are dependent on the ellipsometer base and installed
accessories (see Figure 12-19). Some systems will not have a Misc. tab.
System Information
This panel displays information about the ellipsometer including the system type,
EID number, base type, wavelength range, and current motor positions. This panel
also provides access to the hardware configuration dialog, hardware manual, and
hardware log.
NOTE: J.A. Woollam representatives may ask for information from the System
Information panel when providing assistance.
Figure 12-24. Expand category to view parameter descriptions and edit values.
+Window Effects
Window effects are used only when an attachment is employed that has windows
through which the ellipsometer beam must pass when measuring the sample.
Examples include liquid cells, heat stage, environment cell, etc.
Out‐of‐Plane Effects
Out-of-plane effects are measured when performing a calibration such as a System
Check if Window Effects are enabled.
“WinRet1” and “WinRet2” are the out-of-plane window retardance for the entrance
and exit windows respectively.
“WinDisp1” and “WinDisp2” are the dispersion terms for the out-of-plane window
retardance of the entrance window and “WinDisp2-1” and “WinDisp2-2” are the
dispersion terms for the exit window.
“RotDisp1” and “RotDisp2” are terms for the rotary power of the entrance window
and “RotDisp1-2” and “RotDisp2-2” are the terms for the rotary power of the exit
window.
NOTE: The effects of the out‐of‐plane window retardance on ellipsometric data are
canceled out (at least to the 1st order) when performing a zone-averaged (high
accuracy) measurement.
In‐Plane Effects
In-plane effects are measured during a System Check or a Delta Offset Calibration if
Window Effects are enabled.
“Delta Offset Mode” sets whether the effects are describing prism dispersion or
window (1/λ) dispersion.
“Delta Offset Err. Tolerance” specifies the maximum error allowed on a Delta Offset
parameter. If the error bar is above this tolerance then the calibration is considered
to have failed.
“Min Delta Offset1 Limit” specifies the smallest Delta Offset 1 parameter before the
higher order terms will be set to 0 (turned off).
“# of Higher Order Terms” specifies the number of Delta Offset terms to fit for
beyond Delta Offset1 during a System Check or Delta Offset calibration.
“Delta Offset(1-4)” parameters are the terms for describing the in-plane window
retardance. The in-plane window retardance as a function of wavelength for a
prism (Delta Offset Mode=1) is given in Equation 12-1 where δ is the retardance as
a function of the wavelength λ in angstroms and Δn is the nth delta offset.
Equation 12-1
5000 2 5000 4 𝜆 2
δprism (λ) = Δ1 + Δ2 ( ) + Δ3 ( ) + Δ4 ( )
𝜆 𝜆 5000
Psi Offsets
Psi Offset parameters can be used to correct the Psi data when using prisms to
bend the beam and are only necessary when the ellipsometer beam enters the
prism(s) at angles away from normal incidence. Users must determine the correct
Psi offset values – they are not determined during calibration. The Psi correction is
given by Equation 12-3 where ψ is the Psi correction as a function of the
wavelength λ in angstroms and Ψn is the nth psi offset.
Equation 12-3
+Alignment Parameters
A table of acquisition parameters will appear in the File Information panel. Click
‘Graph Data’ to graph parameters versus position (see Figure 12-27).
Figure 12-27. Example graph of signal intensity (“SigInt”) vs. translator position.
If you select more than one file, you can also select ‘Calc Multi-Sample Stats’ to see
parameters from more than one data file in the table and graphs (see Figure 12-28).
The Options tab is shown in Figure 13-1. This tab consists of four panels: Display
Units, Configuration Controls, About CompleteEASE, and Miscellaneous. A brief
description of all commands within this tab is given.
Wavelength Units
Choose from Å, nm, m, eV, and 1/cm for the wavelength units.
Wavelength is the distance between adjacent peaks of an electromagnetic wave,
commonly given in angstroms (Å), nanometers (nm), or microns (m).
Wavenumber refers to the number of waves in a length of one centimeter, with
units of reciprocal centimeters (1/cm).
If light is treated as a quantum of radiant energy (photon), its energy is given in
electron volts (eV) which is proportional to frequency. Choice of units depends
largely on the spectral range and application. Equation 13-1 shows the conversion
between wavelength and photon energy used in CompleteEASE.
Equation 13-1
1240
𝜆𝑛𝑚 =
𝐸𝑒𝑉
Thickness Units
Choose from Å, nm, m, and mm for the thickness units.
𝜀̃ = 𝑛̃2
NOTE: All settings are saved when the program is exited and remain selected when
the program is restarted.
‘Use Defaults’
Return all settings to their default values, which include wavelength in nm,
thickness in nm, and optical constants as “n & k”.
13.2. Miscellaneous
The Miscellaneous panel contains five buttons, as shown in Figure 13-2.
‘Manage Users’
Opens the “User Management” window where a user list can be created, along with
access levels and passwords (see Figure 13-3). Access level is selected from SysOp,
Engineer, or Technician.
• SysOp – access to all software features.
• Engineer – customizable from a list of select privileges.
• Technician – access to Measurement tab only. Users limited to technician
level cannot create or edit recipes or analysis models.
The Engineer level can be customized by clicking ‘Define Engineer Privileges’. A list
of selectable privileges for this level is shown in Figure 13-4. User customization is
further defined in the Configuration Controls (see section 13.3).
Figure 13-4. “Edit User Privileges” window for Engineer access level.
NOTE: From the instrument computer, you can press F2 to open a PDF copy of the
hardware manual. Hardware manuals are specific to ellipsometer hardware
configuration.
NOTE: The manual(s) are in the C:/CompleteEASE folder and can be accessed
directly from there as well.
‘Deactivate’
Refer to Appendix 14.2 for information on Activation or Deactivation.
Font Name
Name of CompleteEASE font family. Changes are made from the drop-down menu,
as shown in Figure 13-9.
Font Size
Point size of CompleteEASE font.
NOTE: Changing the default setting for “System Time Mode” is not recommended.
NOTE: Use CTRL+ALT+SHIFT+U to access the In situ tab during the current session
of CompleteEASE only.
Use Unicode
Specifies the character encoding for saving configuration files and models. Must be
set on 'ON' to use extended (non-Latin) character sets; setting to 'OFF' improves
backwards compatibility with versions of CompleteEASE before CompleteEASE 4.
NOTE: This option can cause unexpected and erratic behavior if not used properly.
Memory Management
Maximum number of wavelengths and timeslices for which to allocate space (see
Figure 13-11).
NOTE: This option also controls the amount of memory required for translation and
rotation points, multiple data sets, multiple angles of incidence, etc. For example, if
you have a uniformity map with 500 points and each one has four angles of
incidence, then this number needs to be at least 2000 (500 * 4).
Display Units
Changes the units that different parameters are displayed in (see Figure 13-12).
Light Units
Units to display light wavelength or photon energy with choices of Å, nm, m, 1/cm,
or eV (see Section 13.1).
Time Units
Units for time with choices of seconds, minutes, and hours.
Rate Units
Units for rate of dynamic growth/etch with choices of Å/s, Å/min, Å/hr, nm/s,
nm/min, nm/hour, and m/hour.
Temperature Units
Units for temperature with choices of °C or K.
Translator Units
Units for translator coordinates with choices of cm or mm.
% Range Calculation
This allows the choice of calculation for “% Range” in the map statistics tables with
choices of Range/Average or Range/(2*Average).
Remote Communications
Parameters for 1) setting up how communication between a remote computer (i.e.
a computer controlling a process) and the ellipsometer is handled and 2) setting up
how parameter values are returned through the “get()” functions (see Figure
13-13). For more information about controlling remote communication, refer to
Appendix 14.8).
Communication Type
Method of communication between a remote computer and CompleteEASE.
Choosing “None” indicates no communication will take place. Other options
include “TCP/IP” and “RS232”.
Serial Port
Serial port to use with serial communications.
Auto Report
Turning Auto Report on will result in a string containing the values of current model
fit parameters to be sent out on the Asynchronous TCP/IP port after data is
acquired and fit. This is only done if the communication type is set to TCP/IP. See
Appendix 14.8 for a more detailed explanation of this feature.
Window Setup
These display settings are automatically saved when CompleteEASE is closed (see
Figure 13-14), except for “Title Text” and “Start Up Tab” which remain constant to
specified values.
Title Text
Additional text that appears in the title bar of the CompleteEASE program.
Start Up Tab
The tab that is selected by default when CompleteEASE starts. If users are required
to log in, then the selected tab is the default tab when a technician-level user logs
in.
Width in Pixels
Width of the graph on the clipboard in pixels.
Aspect Ratio
Specifies the ratio (Graph Width)/(Graph Height) when copied to the clipboard.
Resolution Factor
Oversampling factor for the graph and model; this value is multiplied by the graph
width and aspect ratio to determine the total number of pixels stored in the image.
It is also used when the model is copied to the clipboard to determine the size of
the image.
Simulation Enabled
When checked, CompleteEASE uses simulation mode instead of the physical
ellipsometer hardware to acquire data.
Shutter Controls
Optional control parameters for setting up user control of shutters (see Figure
13-20).
Treat as Signal
Treat the shutters as signals instead of shutters. The difference is that in process
control conditions, a signal remains off until the target thickness is reached whereas
the shutter opens (turns on) when the growth starts and closes (turns off) when the
target thickness is reached.
# of Shutters
The number of shutters to be configured in CompleteEASE. The maximum number
is four.
Upgrading to CompleteEASE 6
CompleteEASE 6 is the latest version of the CompleteEASE software package,
containing many new features for data analysis. It is backward-compatible with
previous versions of CompleteEASE along with previous data, model, material, and
snapshot files. This means that it can open files that were created with earlier
versions of CompleteEASE. However, CompleteEASE 6 uses a new file type for its
data files but maintains the same “.SE” and “.iSE” data-file extensions. If you try to
open a data file created with CompleteEASE 6 on an earlier version of
CompleteEASE, you will get a checksum error when opening the file. Unfortunately,
there is no workaround for this. Analysis of data acquired with CompleteEASE 6 will
need to be performed on CompleteEASE 6.
NOTE: CompleteEASE is only compatible with the encoded experimental data files
measured using CompleteEASE. Thus, you can install CompleteEASE on multiple
computers, but it can only be used with data collected by CompleteEASE. Also, note
that data files acquired with CompleteEASE 5 and earlier versions can be opened on
any version of CompleteEASE, but data files acquired with CompleteEASE 6 can only
be opened with a version of CompleteEASE 6.
To start CompleteEASE for the first time, open the “Finder” application and navigate
to the “Applications” folder, as shown in Figure 14-5. (When installing for the first
time, do not use “Launchpad” as it may block CompleteEASE for security reasons.)
Double-click on the CompleteEASE icon in the “Applications” folder to launch
CompleteEASE for the first time. (If you receive a security message that says that
CompleteEASE cannot be opened, as shown in Figure 14-6, then you will need to
right-click (or control-left-click) on the CompleteEASE icon and select “Open” from
the menu of options. Then, click the ‘Open’ button on the new security message
that appears as in Figure 14-7.)
Figure 14-5. CompleteEASE located in the “Applications” folder of the Mac Finder application.
Figure 14-7. Mac security warning about CompleteEASE that allows you to open it.
Figure 14-9. Providing administrator credentials to install the CompleteEASE security service.
If you have not installed CompleteEASE before on this computer, CompleteEASE will
also ask you to create a special directory in which to store configuration files, model
and material library files, and example data files, as shown in Figure 14-10. Choose
‘Yes’ to continue. After this, CompleteEASE should then arrive at its activation
screen. This means that CompleteEASE has been installed successfully, and you can
now consult Appendix 14.2 for activation.
Operating Hardware
Hardware operation for data acquisition can only be done when running
CompleteEASE on the Microsoft Windows operating system. Hardware operation
also requires the configuration files for your instrument to be present in the
“C:\CompleteEASE\cnf” directory. These are provided with the installation USB
drive that accompanies each instrument. If you are upgrading to a newer version of
CompleteEASE on the computer that came with the instrument, the configuration
files should already be installed on that computer from the factory and do not
require any additional attention. When installing newer versions of CompleteEASE,
you can install the new version over the top of old version. The CompleteEASE
installer knows to preserve the configuration files. If you are installing
NOTE: Do not copy configuration files from the USB drive that came with your
system if your system is already operating with CompleteEASE, as this will overwrite
your latest calibration and return it to factory settings, which may require the
recalibration of your instrument. Please contact J.A. Woollam for further details.
Timed License
The Timed License is a type of license distributed in special cases, such as at a
J.A. Woollam Short Course. A Timed License will expire after a specified period of
time once it is activated. After a Timed License is activated, the clock starts running
for how long it can be used. Timed Licenses cannot be deactivated and then
reactivated later; if you deactivate a Timed License, it is no longer usable. With a
Timed License, CompleteEASE will not contact the activation servers after it has
been activated. CompleteEASE keeps track of the time remaining on the Timed
License locally.
Online Activation
1. Verify you are logged in as a local administrator on your computer and are
connected to the Internet before installing CompleteEASE. Administrator
privileges are required to activate CompleteEASE. However, once
CompleteEASE is activated, administrator privileges should not be needed
to continue using CompleteEASE in most cases.
2. Start CompleteEASE from its shortcut (usually placed on the Desktop in
Windows or in the “Applications” folder in Mac). (If you are using Mac and
have not started CompleteEASE, you will now be prompted to install the
security service. Consult Appendix 14.1 for more details.)
5. If you instead see an error message, then the activation was not successful.
If activation was not successful because CompleteEASE indicated that it
could not access the Internet, try the “Offline Activation” by clicking
‘Continue Activation Offline’. If the activation was not successful for other
reasons, consult “Activation Troubleshooting” below.
Offline Activation
1. Verify you are logged in as a local administrator on your computer before
installing CompleteEASE. Administrator privileges are required to activate
CompleteEASE. However, once CompleteEASE is activated, administrator
privileges should not be needed to continue using CompleteEASE in most
cases.
2. Start CompleteEASE from its shortcut (usually placed on the Desktop in
Windows or in the “Applications” folder in Mac). (If you are using Mac and
have not started CompleteEASE, you will now be prompted to install the
security service. Consult Appendix 14.1 for more details.)
3. The CompleteEASE Activation window will appear as shown in Figure
14-13. Click on the ‘Continue Activation Offline’ button.
4. You will then see the “Offline Activation” dialog box as shown in Figure
14-14. We will follow the steps listed in this dialog box. Click on the ‘Save
Computer C2V File’ button. The “.c2v” file is a unique identifier for your
specific computer. You will want to save this file to a USB drive or some
portable location so that you have access to the .c2v file while at a
computer with an Internet connection.
7. On the activation website, enter your product key with the dashes. (If you
have the USB flash drive that came with your ellipsometer, you should find
a text file containing your product key which you can copy and paste into
the CompleteEASE Activation website.) The key is not case sensitive. You
should now see a screen similar to Figure 14-16.
9. After the license is generated, you should now see a screen similar to the
one shown in Figure 14-18. Click on the orange ‘Download V2C File’ link as
indicated by the red arrow. You will then be prompted to save the .v2c file.
Again, it is recommended that you save this file to a portable location, such
as a USB drive, as you will need to move this file to the computer where
CompleteEASE is installed.
Figure 14-18. Click ‘Download V2C File’ to download the generated license.
10. You can now log out of the activation website and close your browser.
Transfer the .v2c file back to the computer where CompleteEASE is
installed.
11. After returning to the computer where CompleteEASE is installed, click on
the ‘Apply V2C License File’ button shown in Figure 14-19 and then browse
Figure 14-19. Choose ‘Apply V2C License File’ to complete offline activation.
12. If you instead see an error message, then the activation was not successful.
Consult “Activation Troubleshooting” below.
Deactivating CompleteEASE
Perpetual License Deactivation
It is possible to deactivate a perpetual license. The computer MUST be connected to
the Internet for deactivation. There is no option for deactivating offline. Once you
deactivate, you will be able to reactivate the same seat on another computer.
There is no limit on how many times you can activate/deactivate a license;
however, it is recommended that you use this feature sparingly as needed. It is not
meant for moving a CompleteEASE license between computers on a frequent basis.
To deactivate a perpetual license, navigate to the Options tab and select the
‘Deactivate’ button. If you launch CompleteEASE after your software has been
deactivated, you will once again be prompted for an activation key.
Activation Troubleshooting
Activation problems are commonly caused by not being logged in with appropriate
administrator privileges, internal firewalls, antivirus software, or network security
policies. If you are having issues with activation, please review the sections below. If
you are still experiencing activation issues after addressing these steps, feel free to
email [email protected] for support.
No Internet Connection
To resolve errors related to the Internet connection, generally the fastest and
easiest approach is to simply try the offline activation. However, there are a few
additional diagnostic steps that can be attempted.
1. Make sure your computer is connected to the Internet by opening a web
browser, such as Chrome, Safari, Firefox, or Edge, and navigate to any
website, such as http://www.jawoollam.com/. If you cannot do this
successfully, then it is likely that your computer has no Internet connection
at all and that this is the cause of the activation issues. Either make
attempts to connect your computer to the Internet or follow the steps for
Offline Activation by clicking on the ‘Continue Activation Offline’ button
and using another computer for the steps that require an Internet
connection.
2. If you were able to access typical websites in a browser from the previous
step, that means your computer is connected to the Internet, but
something else is blocking CompleteEASE from accessing the Internet to
perform activation. This can be due to firewall settings, a strict network
group policy, proxy server settings, antivirus software, website access
restrictions, etc. CompleteEASE is configured to use your computer’s proxy
settings, but this doesn’t always guarantee that it can successfully reach
the Internet. Check to see if you can access the specific activation website
from a web browser by navigating to the following URL:
https://license.jawoollam.com/ems/customerLogin.html. If you are
greeted by the website shown in Figure 14-15, then your computer can
successfully access the activation website. If you do not see that website,
then your activation issues are probably caused by certain website
restrictions or proxy-server settings preventing your computer from
accessing the activation website. You will need to contact your IT support
to figure out how to allow access to the activation website
(https://license.jawoollam.com). If this is not possible, you will have to
follow the steps for Offline Activation.
3. If your computer is able to access the activation website in the previous
step from a web browser but CompleteEASE still says that it cannot access
the Internet, this means that something is preventing CompleteEASE from
NOTE: Your closest J.A. Woollam Representative can be found on our website by
visiting www.jawoollam.com/contact-us/worldwide-representatives/.
Reporting Problems
If you have a problem with CompleteEASE or your hardware, please send a debug
file to J.A. Woollam or your local representative. The debug file contains your
current configuration, log files, and recent calibration data. You can email this file to
us along with a description of your problem and contact information.
NOTE: The Debug File packages all hardware and software configuration files along
with the current Error Log into a single .zip file.
Email this file to J.A. Woollam or your representative to aid in debugging problems
with your ellipsometer system.
Figure 14-21. Add “ -memXXXX” to the “Target” field to increase maximum memory usage
for CompleteEASE.
Figure 14-22. Select “View network status and tasks” in the Control Panel.
3. Select “Change adapter settings” from the panel on the left side of the
screen.
Figure 14-26. Select only “Internet Protocol Version 4” from the network card
properties dialog box.
9. The TCP/IPv4 properties dialog box is displayed. Select “Use the following
IP address” and enter “192.168.0.1” for the “IP address” and
“255.255.255.0” for the “Subnet mask” and then select “OK”.
NOTE: Any data open in the Experimental Data window will be removed (deleted if
not saved) by performing the following steps.
3. After the CompleteEASE data files are selected, browse to select the
directory where you wish the new WVASE files to be saved. Imported files
will be saved in the WVASE format in the directory chosen.
Figure 14-32. Choose the “CompleteEASE Data Transfer” menu from the “File”
menu of the “Experimental Data” window and then select “Export Data to
CompleteEASE”.
2. Browse and select the WVASE data files that you want to export to
CompleteEASE, as in Figure 14-33. Multiple files can be selected.
Figure 14-34. Browse for location to place the newly created CompleteEASE files.
4. After the files are exported, the message shown in Figure 14-35 will
appear. Previous “.dat” and “.bdt” files are now saved in CompleteEASE
“.SE” and “.iSE” formats.
Figure 14-35. Message when all data files are exported. If files were unable to
export, the total number of successful files is listed.
Fit Weighting
Note the difference in Fit Weighting during data analysis in both software packages.
The WVASE default is “Experimental Standard Deviations” while CompleteEASE uses
“NCS” for its default fit weighting.
Depolarization Data
If the data contain depolarization, WVASE will automatically include this in the MSE
calculation and fit. CompleteEASE will not use the depolarization data during MSE
calculation and fit unless you turn ON “Include Depolarization Data” in the hidden
options of the +FIT Options menu in the model (see Section 9.7).
Surface Roughness
In CompleteEASE, surface roughness is an independent thickness quantity with half
of its thickness extending down into the top layer and the other half of its thickness
extending up above the top layer. In the actual model calculation (which is created
in the background and not visible to users), an EMA layer is added above the top
layer while the top layer’s thickness is reduced by half of the surface roughness
thickness. Thus, if your top layer shows that it is 100-nm thick with 2 nm of surface
roughness, the actual model calculation will use a 99-nm thick layer with a 2-nm
EMA layer on top to represent the surface roughness. In WVASE, surface roughness
is simply an EMA layer over the top layer thickness; it does not “take away” from
the top layer. If your layer in WVASE shows 100 nm of thickness with 2 nm of
surface roughness, this is the actual model calculation.
Standard Mode
Standard mode is the most common measurement mode. When the data
acquisition is started, the ellipsometer will acquire data until a pause command is
received or the acquisition is ended. Commands can be sent to set models and
retrieve hardware and fit parameters during acquisition.
Triggered Mode
Triggered mode is typically used when process monitoring and control is to be
automated. Commands are sent to CompleteEASE, CompleteEASE performs the
specified task, and then the acquisition pauses, waiting for the next command. For
Remote Commands
In order to facilitate communication with external systems, CompleteEASE has a set
of commands that allow the remote system to communicate with CompleteEASE
and control how it operates. Some types of commands allow the external system to
query CompleteEASE for state information and parameter values (called
“Information Query Commands”) and others allow the external system to control
various aspects of the acquisition and analysis of data (called “Measurement
Control Commands”), such as setting models and target thicknesses, starting and
ending data acquisition, switching between acquisition modes, etc. Some
Table 14-2 while those for ex-situ data acquisition are given in Table 14-3.
Additionally, there are some specific hardware commands that are only applicable
for certain ellipsometer systems; these are shown in Table 14-4. Unless a command
is supposed to return a specific value or string of text information, the command
will respond with “OK” if it has completed successfully or will return an error
message beginning with “Error” if it could not complete successfully.
COMMAND DESCRIPTION
MEASUREMENT CONTROL
StartAcq(file_name) Starts in-situ data acquisition which will save the
data to the file specified in the file_name parameter.
StopAcq() Stops in-situ data acquisition and ends the
measurement process.
PauseAcq() Pauses in-situ data acquisition temporarily but does
not end the measurement process.
ResumeAcq() Resumes in-situ data acquisition after it has been
paused.
Trigger() Triggers an in-situ data measurement when in
Triggered Mode; in other words, performs a
measurement of a single data point.
StdAcq() Sets the acquisition time to “Standard Acquisition”,
which uses the normal acquisition time specified in
the Hardware Configuration. (This is equivalent to
unchecking the “Fast Acquisition Mode” checkbox
on the In situ tab.)
FastAcq() Sets the acquisition time to “Fast Acquisition”, which
uses the faster acquisition time specified in the
Hardware Configuration. (This is equivalent to
checking the “Fast Acquisition Mode” checkbox on
the In situ tab.)
DCOffset() Performs a DC offset calibration.
GetAlign() Performs a one-point alignment and returns the
signal intensity and the X and Y alignment values. An
error message is returned if the alignment cannot be
performed. (Ellipsometers without alignment
detectors only return signal intensity.)
GetAlign2() Performs the same function as “GetAlign()” but in
addition returns more specific intensity values, such
as the UV and NIR intensities separately.
COMMAND DESCRIPTION
MEASUREMENT CONTROL
LoadRecipe(recipe_name) Loads the recipe indicated by recipe_name into
CompleteEASE. This recipe file must be located in
the COMMON Recipe folder (usually
C:\CompleteEASE\recipe).
COMMAND DESCRIPTION
SPECIALIZED HARDWARE CONTROL
SystemLampOn() Turns the ellipsometer light source on. (It may take
up to 30 seconds for the lamp to turn on after
sending this command.)
SystemLampOff() Turns the ellipsometer light source off.
SystemLampIsOn() Returns “Yes” if current to the light source is
detected, indicating it is on. Returns “No” if no
current to the light source is detected, indicating it is
off. If the ellipsometer does not have a lamp current
sensor, then ‘Sensor Not Available’ is returned.
SystemLampShutterOpen() Opens the lamp shutter if it is available or moves the
filter wheel to its previous position before
“SystemLampShutterClosed()” was last sent.
SystemLampShutterClosed() Closes the lamp shutter if it is available or moves the
filter wheel to the blocked position. (Note the
misnomer with this command’s name. This
command does NOT detect if the shutter is closed; it
actually closes the shutter.)
SystemYellowFilterOn() Moves the filter wheel to the yellow filter position if
it is available.
SystemYellowFilterOff() Moves the filter wheel to its previous position
before “SystemYellowFilterOn()” was last sent.
SystemMoveToSampleLoad() Moves the ellipsometer stage to the sample load
position. (Sometimes, if the system is already at the
sample load position, this command may move the
stage back to the center position.)
Figure 14-37. “Comm Test.exe” program provided with CompleteEASE to allow basic testing
of the remote command functionality.
To communicate using TCP/IP, make sure the “Serial?” checkbox is unchecked and
enter the IP address in the “IP Addr” box and the port number (4444 by default) in
the “IP Port” box. If CompleteEASE features requiring asynchronous communication
will be used, then make sure that the “Async IP Port” is set to one number higher
than the IP port number (4445 by default). Press the ‘Connect’ button. The “Status”
label at the bottom will change to say “Connected to…” if Comm Test was able to
connect to CompleteEASE. To communicate using RS-232, make sure that the
“Serial?” checkbox is checked, select the serial port using the drop-down menu, and
press the ‘Connect’ button. The “Status” label at the bottom will change to say
“Connected to…” if Comm Test was able to connect to the specified serial port.
Once a connection has been made, commands can be entered in the “Command”
field. Pressing the ‘Send’ button sends the command to CompleteEASE through the
configured connection. When a response is received from CompleteEASE, it is
displayed in the “Reply” box. Only one command can be sent at a time, and the next
command cannot be sent until a response to the previous command is received.
The “Poll” checkbox allows a command to be entered and then continuously polled
(i.e., sent repeatedly). The response to the poll feature can be found in the “Poll
Reply” box. (For instance, the poll feature could be used to continuously monitor