A 0.8-nm-thick CoFe ultrathin film was deposited on a MgO tunneling barrier by means of cryogenic temperature sputtering. The cryogenic temperature sputtering at 100 K effectively suppressed island-like initial growth of CoFe without hampering grain-to-grain epitaxy, while CoFe deposited at 300 K exhibited rough and mixed interfaces. The flat and sharp interfaces in CoFe ultrathin films deposited at 100 K resulted in improved properties such as low magnetic damping, high tunneling magnetoresistance, and clear perpendicular magnetic anisotropy. Furthermore, the clear interfaces were maintained even after annealing at 673 K, indicating high thermal stability.
- Tomohiro Ichinose
- Tatsuya Yamamoto
- Shinji Yuasa