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A comprehensive VLSI design project implementing a static CMOS NAND gate using industry-standard Cadence tools and HSPICE simulation in 45nm technology.

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VLSI NAND Gate Design and Analysis

This project demonstrates the complete VLSI design flow from schematic capture to physical layout verification and performance characterization. The design implements a 2-input NAND gate optimized for a standard cell library with detailed timing and power analysis.

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  • Key Achievements

✅ Functional NAND gate design meeting all specifications
✅ DRC and LVS clean layout in 45nm technology
✅ Comprehensive timing characterization (tpdr: 35.1ps, tpdf: 38.3ps)
✅ Power analysis including leakage (21.8nA) and peak current (243µA)
✅ Supply voltage sensitivity analysis (0.85V - 1.10V)
✅ Parasitic extraction and post-layout verification

  • Tools and Technologies

Design Tools: Cadence Virtuoso (Schematic XL, Layout GXL)
Verification: Cadence Pegasus (DRC, LVS, PEX)
Simulation: Synopsys HSPICE, Cscope
Technology: GPDK 45nm CMOS process
Design Kit: gpdk045

  • Design Specifications

Transistor Sizing

Technology: 45nm minimum channel length
β ratio: 2 (PMOS/NMOS width ratio)
Minimum width: 120nm (NMOS), 240nm (PMOS)
Series optimization: Properly upsized for stacked transistors

  • Layout Constraints

Cell height: 3µm standard cell compatible
Power rails: 300nm M1 rails (VDD top, GND bottom)
Metal layers: M1 horizontal, M2 vertical routing only
I/O placement: Inputs left (M1), outputs right (M1)

  • Performance Targets

Supply voltage: 1.1V nominal
Load: 8 minimum inverters + 6fF wire capacitance
Input timing: 30ps rise/fall times (20%-80%)

Results Summary

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  • Analysis Methodology
  1. Functional Verification

Complete truth table verification using digital vector simulation
HSPICE transient analysis with proper load modeling
Input/output timing relationship validation

  1. Timing Analysis

Propagation delay measurement (50%-50% metric)
Rise/fall time characterization (20%-80% metric)
Load capacitance impact assessment
Parasitic extraction effects quantification

  1. Power Analysis

Static leakage current measurement during steady-state
Dynamic peak current during switching transitions
Supply current source methodology with 0V meters
Exclusion of load inverter channel currents

  1. Process Sensitivity

Supply voltage sweep analysis (0.85V - 1.10V)
Delay vs. VDD characterization
Leakage vs. VDD relationship
Input signal integrity verification

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A comprehensive VLSI design project implementing a static CMOS NAND gate using industry-standard Cadence tools and HSPICE simulation in 45nm technology.

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