Design Challenges in Silicon Photonics
Design Challenges in Silicon Photonics
4, JULY/AUGUST 2014
Abstract—Silicon photonics is rapidly gaining maturity in high- photonic design automation and discusses the different aspects
bandwidth optical communication, with applications in datacom, of the design gap in silicon photonics.
access networks, and I/O for bandwidth-intensive electronics. Also, We approach this from the point of view of electronic de-
applications are emerging in spectroscopy and sensing. To get the
best performance out of the photonics, co-integration with electron- sign automation (EDA) [7]. Today’s electronics design methods
ics is needed: side-by-side, stacked, or on the same chip. However, allow for a functional approach based on proven component li-
the combination of photonics and electronics introduces a range braries provided by foundries in process design kits (PDK). This
of new problems on the design side: Codesign and cosimulation of foundry approach is already adopted by photonics at R&D level
complex photonic and electronic circuits, tolerance to variability, through several multi-project-wafer services [8]–[11], which
and verification algorithms that can handle photonic circuits. We
will discuss these challenges and give an outlook on how tools need start offering photonic PDKs that enable photonic designers
to evolve to address the needs of photonic-electronic IC designers. to follow a similar design flow. Still, the functionality of these
PDKs is limited, and real photonic-electronic codesign capabil-
Index Terms—Silicon photonics, design.
ity is still missing.
In this paper, we will discuss our view on what constitutes
I. INTRODUCTION the design gap of silicon photonics, and offer perspectives on
the capabilities that are required to close this gap in a satis-
ILICON photonics is rapidly gaining traction as a tech-
S nology platform for complex photonic integrated circuits
(PIC). The technology is enabled by the infrastructure devel-
factory way, such that it becomes possible to design silicon
photonic+electronic circuits for different applications.
First, in Section II, we will give a short background on silicon
oped for silicon electronics, making it possible to define optical
photonics technologies, which we need to analyze in Section III
waveguide circuits with unparallelled precision. Moreover, the
what is needed to enable a photonic+electronic codesign flow.
material system with its high index contrast supports submicron
We will highlight several key challenges: the richness of infor-
waveguides with sharp bends, allowing for dense integration of
mation in a photonic signal that propagates through a waveguide
optical building blocks on one chip. This makes silicon pho-
(Section IV), the need for some multiphysics effects to be han-
tonics the first platform that can accommodate thousands of
dled at the circuit level (Section V), the extreme impact of
photonic components on a single chip [1], [2].
both manufacturing and operation variability on the operation
The main industrial drive for silicon photonics is in optical
of some silicon photonic circuit elements (Section VI), layout
interconnects [3], where optical links should replace electrical
and routing of photonic circuits (Section VII), handling of pho-
links on 10 cm to 2 km spans [4]. Here, the photonics serves the
tonic parasitics (Section VIII) and finally verification algorithms
needs of the electronics, enabling ever larger data bandwidths.
that can handle the peculiarities of optical waveguide circuits
But the potential of silicon photonics, and photonic integrated
(Section IX).
circuits in general, extends to many other applications in spec-
troscopy, sensing [5], and medical diagnostics [6]. For some of
these applications, integration with electronics is needed to pro- II. SILICON PHOTONICS
vide control and read-out functionality. Many strategies exist to
Silicon photonics is a logical evolution of the photonic IC
co-integrate the photonics and the electronics: on one chip, or
technology that emerged in the 1980s. On a PIC, light is pro-
by co-integrating chips. But functionally the photonics and the
cessed and routed on a chip by means of optical waveguides .
electronics behave as a single complex circuit.
There are several material systems for PICs: doped glass, III–V
However, there is a very wide gap between what the tech-
semiconductors, polymers, silicon, and others, each its own ad-
nology can deliver, and the functionality engineers can design
vantages, and all in active use today. Silicon’s key differentiator
and simulate in complex photonic-electronic circuits: Today’s
is the high refractive index contrast in the silicon-on-insulator
design methods and tools are not up to the task. This paper aims
(SOI) platform. This enables tight confinement of light in sub-
to provide some perspectives on the upcoming challenges in
micron waveguide cores, and bends with a radius of only a few
micrometer [12]. This allows integration of many more func-
Manuscript received October 7, 2013; revised December 2, 2013; accepted tional optical building blocks on a single chip.
December 17, 2013. Date of publication December 23, 2013; date of current Unlike in complimentary metal–oxide–semiconductor
version February 14, 2014. (CMOS) electronics, where all functions are executed with a
The authors are with the Photonics Research Group, Ghent University—
IMEC, Department of Information Technology, Gent 9000, Belgium (e-mail: combination of transistors, resistors, diodes and capacitors, the
[email protected]; [email protected]; pieter.dumon@ elementary building on a PIC are quite diverse and impose
imec.be). different requirements. First of all, light should be guided in
Color versions of one or more of the figures in this paper are available online
at http://ieeexplore.ieee.org. low-loss waveguides. Distribution and routing also requires
Digital Object Identifier 10.1109/JSTQE.2013.2295882 efficient splitters and waveguide crossings. Coupling light
1077-260X © 2013 IEEE. Translations and content mining are permitted for academic research only. Personal use is also permitted, but republication/redistribution
requires IEEE permission. See http://www.ieee.org/publications standards/publications/rights/index.html for more information.
BOGAERTS et al.: DESIGN CHALLENGES IN SILICON PHOTONICS 8202008
One of the challenges lies in compiling accurate behavioral accept the richness of photonics, and address some of the key
models for photonic building blocks. As already discussed in challenges discussed in this paper. First steps in that direction
the previous section, photonic circuits consist of a variety of have been made [38], but these do not necessarily scale to all
active and passive building blocks. In addition, most of these photonics applications. This tighter design integration can be
blocks exhibit a behavior that is wavelength-dependent, and in accomplished by native support, or by interfacing with photonic
many cases strongly dependent on temperature and other ef- design tools. Recent developments are progressing in that di-
fects. These effects should be incorporated in the component rection, with schematic editing, mask layout, verification and
model in order to reliably simulate the circuit. We’ll discuss the exporting to a photonic circuit simulator driven from a standard
wavelength-dependence in more detail in the next section, and EDA environment [39].
the influence of temperature in Section V. A problem with com- In the following sections, we describe a number of challenges
pact behavioral models is often their limited validity range: they in more detail, highlighting some fundamental differences be-
only work for a given set of parameters. If the designer moves tween photonics and electronics that make codesign not possible
out of the valid parameter range (either intentionally, or because today, unless with significant approximations. We do this from
of variability effects), additional physical simulations might be the perspective of EDA tools: what needs to be supported, on
required. Ideally, these should be triggered automatically, with- top of the existing electronic design capabilities, to design and
out requiring the user to set up a new simulation environment. simulate photonic integrated circuits.
Today, only a few tools enable this kind of hierarchical model-
ing, and only to a limited extent [21], [33]–[35].
The next step in the photonics design flow is generating the IV. CHALLENGE: RICH SIGNALS
mask layouts for fabrication. This process is disjoint from the Typical simulations of electronic circuits are based on SPICE
circuit design (if any circuit design is actually done outside of a or similar engines, tracking voltages, and currents through the
conceptual schematic), and usually executed in a separate tool. circuit. For analog circuits, the time stepping, which can be
Support for automatic place and routing of photonic blocks is adaptive, is typically one order of magnitude smaller than fastest
minimal. The reason for this will be discussed in Section VII. signals that are expected in the circuit. Depending on the appli-
Quite often, the technology imposed restrictions and limitations cation, this is megahertz to tens of gigahertz.
on the component layout, and this can have an impact on the Photonic circuits handle light, which is basically a very high
actual performance. Especially when designing custom layouts frequency electromagnetic wave, with an oscillation frequency
(which is still the most common way of photonic design), some around 200 THz. Compared to electronic phenomena, as well as
physical simulation might also be needed at the layout level to the data rates of high-speed communications (25-40 Gb/s) this
evaluate the effects of the fabrication process, or to optimize is extremely fast. Simulating the propagation of an optical wave
functionality [36]. through a circuit simulation would require too much time and
Verification of the mask layout is usually done with EDA resources for practical use. Even when simulating an optical link
verification tools, but this is not straightforward as photonic at 40 Gb/s, it would require 10000 samples per bit to capture
layout elements are very unlike typical manhattan-oriented elec- the waveform accurately.
tronic features, with many curvilinear features. Also, extracting Luckily, in most cases the exact shape of the optical wave-
photonic circuit elements from the layout is difficult: Layout- form is not required, as the high-frequencies are generally used
versus-schematic verification is a significant challenge. Verifi- as carrier wavelengths that are modulated at “electronic” speeds.
cation challenges are discussed in Section IX. A photonic-electronic circuit simulation can therefore run with
In the photonic design flow, it is often still necessary to come the same time stepping. For an optical point-to-point link (laser-
back to physical simulation in a later stage in the design flow. modulator-waveguide-photodetector) it suffices to track the in-
Once aspects like variability and parasitics are incorporated into tensity envelope of the optical signal, which could be repre-
the design flow, this will often require additional physical sim- sented by a single number per time step in the circuit simulation.
ulations. This back-and-forth switching between the different But amplitude is a relatively poor representation of light in an
levels in the design flow is error prone, as it often requires a optical circuit, so more information (expressed in floating point
redefinition of the problem in different simulation tools. While numbers) needs to be exchanged to describe the optical signal.
this is not a fundamental problem of photonic design, good data In practice, the required amount of data depends on which ap-
exchange between tools will be essential for a successful design plication and which phenomena one wishes to capture. This is
flow [33]. An integrated flow where transitions between between illustrated in Fig. 2 and in Table I.
design steps is largely automated is therefore desirable. This is As light is a wave, knowledge of the phase is essential to cap-
an area where EDA has paved the way, and where some early ture electromagnetic interference, needed for interferometers or
photonics solutions are appearing [27], [34], [37]. optical resonators. Mechanisms such as phase modulation can
Enabling a design flow for complex PICs will also need also be modeled in the system. Now two numbers need to be
to integrate electronic design. This is a sine qua non if pho- communicated between components in the circuit simulation.
tonic+electronic codesign is to succeed. Today’s EDA tools When phase is used, it is often needed to know the wavelength
support much larger complexity, and integrate more tightly as well, especially with the use of optical wavelength filters.
the transition from circuit design to layout. To bring pho- In addition, as some waveguides can support multiple Eigen-
tonic design into an electronic design flow, EDA tools need to modes, these add another two numbers that need to be handed
BOGAERTS et al.: DESIGN CHALLENGES IN SILICON PHOTONICS 8202008
TABLE I
AMOUNT OF INFORMATION (EXPRESSED IN FLOATING POINT NUMBERS) NEEDED PER TIME STEP WHEN PROPAGATING DIFFERENT TYPES OF SIGNALS
modulators) to modulate signals, but it can also be uninten- VI. CHALLENGE: VARIABILITY
tional. Accidental doping of an optical waveguide, or incorrect
annealing steps might change the local carrier density. The up- The high refractive index contrast of silicon photonics makes
side of carrier-induced effects it that they are typically locally it possible to confine light in a submicron waveguide core.
confined, and that they can be directly controlled by the elec- However, the effective refractive index of the waveguide core
trical circuits connected to the optical circuit. However, carriers is strongly governed by the actual geometry of the cross
can also be generated by the light itself. Even though silicon is section. For a rectangular cross section, this is the width and
quite transparent for optical wavelengths beyond 1.2μm it can height, but also the slope of the sidewalls.
still absorb two photons at the same time (two-photon absorp- To illustrate this more clearly, let us look at a ring resonator.
tion or TPA). This effect is weak, but scales with the intensity this is an optical resonator where the resonance condition de-
of the light. For high optical power, TPA will generate carriers pends on the optical roundtrip length of the ring waveguide, and
that will change the optical properties of the circuit. In addi- this in turn depends on the actual geometry of the waveguide.
tion, the thermalization and recombination of the carriers will Small width or height variations will induce a significant shift
heat up the waveguide from the inside out, and will also in- in the resonance wavelength: for a width change of 1nm, the
duce a change in refractive index. On top of TPA, most silicon wavelength will shift approximately 1nm, which can span more
waveguides also suffer from some linear losses by defects in the than one channel in a WDM system.
lattice structure and at the etched sidewalls.Similar to TPA, this Temperature can be used to tune wavelength-selective de-
absorption induces changes in refractive index. All these sec- vices, so in principle, heating a ring resonator can compensate
ondary non-linear effects are very difficult to include in a circuit for some fabrication imperfections. However, it takes a 12K
model, especially because they have relaxation times on very temperature increase to compensate for 1nm fabrication varia-
different length scales: Free carriers thermalize and recombine tion. Therefore, fabrication precision should be very accurate,
on ns-scale, while thermal effects dissipate on a μs scale. but also, at the component and circuit design stage tolerances
On top of carrier-induced and thermal nonlinearities, silicon should be taken into account [44], [48].
also has an intrinsic nonlinear response to the optical field. The Therefore, the effects of variability should be considered in
Kerr effect also induces a change in refractive index, and like the design stage. It is possible to optimize components at the
TPA this scales with the optical intensity in the waveguide [47]. physical level for tolerance against geometric variations, espe-
Unlike carrier-based or thermal nonlinearities, the Kerr effect is cially if the distributions and the correlations of these varia-
virtually instantaneous. While this makes it somewhat easier to tions are known through careful monitoring of the fabrication
handle in a circuit simulation (little or no memory effects) it can process [17]. This typically requires intensive 3-D electromag-
result in very different responses to optical pulses: short pulses netic simulations, and a careful analysis to translate geometric
with a high peak powers will provoke a different response than variability into functional variability. Also, at the circuit level
longer pulses with a lower peak power, even with the same pulse variability can be addressed in the design phase. For instance,
energy. wavelength filters can be made athermal by adding compensa-
Nonlinear optical phenomena significantly complicate circuit tion circuits [49], [50], or multiple copies of a device can be
modeling: because of the nonlinearity, new frequencies will be added to the circuit as a form of redundancy.
generated in the optical spectrum. In a WDM system with a set of A key challenge is the efficient simulation of circuits with
fixed wavelengths, nonlinearities might cause new wavelengths variability: taking into account statistics and correlation be-
to appear, which should somehow be captured by the circuit tween effects, a given distribution of variable parameters must
model, even if only to ascertain that they will not impact the be propagated through the circuit. This could be done through
performance of the circuit. Monte-Carlo simulations, but careful choice of the parameter
BOGAERTS et al.: DESIGN CHALLENGES IN SILICON PHOTONICS 8202008
Fig. 4. Different parasitic light paths can severely affect the performance of a
Fig. 3. Variability in photonic design. Both fabrication related as well as photonic integrated circuit.
operation sources of variability affect the physical structure. This should be
propagated to the circuit design level to allow an accurate prediction of the
actual yield of the entire device. tical waves have a phase, in some cases it is also needed that
the length of the interconnections can be set exactly, to control
interferences. These are not straightforward, but probably be
space is needed to avoid an unmanageable number of simu-
enabled by existing custom electronic P&R tools.
lations. Getting closure for the variability in photonic circuits
However, probably the largest challenge is that the photonic
covers much more effects than the exploration of slow and fast
circuit is typically only defined in a single layer. But routing a
corners used in electronic design.
complex circuit on a single layer is not straightforward, and of-
Ultimately, the outcome of a variability analysis is a predic-
ten impossible without crossing interconnections. Fortunately,
tion of the circuit yield. The propagation of variability from
photonic waveguides can be engineered to cross without exces-
nominal devices to circuit yield is illustrated in Fig. 3.
sive loss and crosstalk [54], but routing algorithms need to take
this into account and minimize the number of crossings. While
VII. CHALLENGE: MASK LAYOUT it is possible to make multi-layer circuits, efficient optical vias
Photonic layouts are quite different from electronic layouts. are difficult to implement in a high-contrast material system,
As the propagation of electromagnetic waves is entirely gov- this comes with serious performance and integration penalties.
erned by the geometry, this needs to be accurately controlled.
While electronic building blocks usually consist of rectangles VIII. CHALLENGE: PARASITICS
(without considering assist features or optical proximity correc- Today’s waveguide circuits are usually designed by compos-
tions), photonic device layouts consist of curvilinear shapes to ing them of ideal building blocks. However, just as in electronics,
define smooth waveguide bends. there are parasitic mechanisms that can disturb the operation of
Silicon photonic waveguides are typically fabricated in a sin- the circuit. Some of these parasitics could already be simulated
gle device layer of crystalline or amorphous silicon embedded in at the design stage. Most of the unwanted effects include light
oxide. However, different patterning layers can be defined with that does not end up in the place where it is supposed to be.
different etch depths [13], and sometimes additional material is This parasitic light can interfere constructively or destructively,
added to the device layer [51]. Given the high sensitivity to geo- complicating the calculation of the actual net result of the para-
metric variations, very accurate overlay between these different sitics.
patterns is required. Also, parasitic effects of patterning must Some examples of photonic parasitic effects are shown in
be corrected with suitable proximity corrections [52]. Optimiz- Fig. 4. They include (back)reflections at discontinuities [55],
ing the lithography conditions for a specific type of pattern is [56], distributed scattering at roughness, unintended coupling to
not really possible. Unlike critical layers in electronic designs, adjacent components and excessive absorption and stray light
photonic waveguide layers often contain a mix of isolated and propagating in cladding modes or the substrate. In addition,
dense features of different dimensions and shapes. Also, local optical nonlinearities can be considered as parasitics, as devices
and global density plays an important role in pattern fidelity [53]. models might not take into account local high intensities within
Today’s silicon photonic circuits all rely on tiling to guarantee a building block.
a uniform pattern density, but some photonic components rely
on larger unetched areas (e.g., arrayed waveguide gratings and
echelle gratings [13]). IX. CHALLENGE: VERIFICATION
Another difficulty is placement and routing (P&R). Photonic At the end of the design flow the layout should be verified
waveguides need to observe a minimum bend radius to avoid before it is sent for manufacturing. Like in electronics, the first
high propagation losses. Also, sufficient spacing is needed be- line of verifications is a design rule check of the mask layers,
tween routing waveguides to avoid evanescent coupling. At the to verify minimum critical dimensions, overlays and density
interfaces with the component ports, the routing waveguides checks. Such rules are already in use in today’s photonic design
also need to match the port’s waveguide geometry, as well as flows, making use of the tools available for electronic DRC [57],
angle, to avoid backreflections and scattering. Given that op- although some photonic design tools support DRC specifically
8202008 IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, VOL. 20, NO. 4, JULY/AUGUST 2014
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(PICS) by combining device-and circuit-level simulation tools,” Proc. Overview.php
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[36] W. Bogaerts, P. Bradt, L. Vanholme, P. Bienstman, and R. Baets, “Closed-
loop modeling of silicon nanophotonics from design to fabrication and
back again,” Opt. Quantum Electron., vol. 40, no. 11–12, pp. 801–811, Wim Bogaerts completed his studies in engineering
Sep. 2008. (applied physics) from Ghent University, Gent, Bel-
[37] Ghent University—IMEC, “IPKISS parametric design framework,” gium, in 1998, and received the Ph.D. degree from the
[Online]. Available: http://www.ipkiss.org Department of Information Technology (INTEC) at
[38] A. Mekis, S. Abdalla, P. De Dobbelaere, D. Foltz, S. Gloeckner, S. Hovey, both Ghent University and the Interuniversity Micro-
S. Jackson, Y. Liang, M. Mack, G. Masini, R. Novais, M. Peterson, electronics Center (IMEC) in 2004. In the Photonics
T. Pinguet, S. Sahni, J. Schramm, M. Sharp, D. Song, B. Welch, Research Group, he specialized in the modeling, de-
K. Yokoyama, and S. Yu, “Scaling CMOS photonics transceivers be- sign, and fabrication of nanophotonic components.
yond 100 Gb/s,” presented at the. 14th SPIE, Conf. Optoelectron. Integr. He is currently a Professor in the field of silicon pho-
Circuits, San Francisco, CA, USA, Jan. 2012, vol. 8265. tonics at Ghent University, and coordinates the activ-
[39] L. Chrostowski and M. Hochberg, “Silicon photonics design,” Self- ities between IMEC and Ghent University in silicon
published via Lulu. com, 2013. photonics design. Dr. Bogaerts is a member of the IEEE Photonics Society, the
[40] C.-W. Ho, A. Ruehli, and P. Brennan, “The modified nodal approach to Optical Society of America, and SPIE.
network analysis,” IEEE Trans. Circ. Syst., vol. CS-22, no. 6, pp. 504–509,
Jun. 1975.
[41] R. Longoria, “Wave-scattering formalisms for multiport energetic sys-
tems,” J. Franklin Inst., vol. 333, no. 4, pp. 539–564, 1996. Martin Fiers completed his studies in electrical en-
[42] P. Gunupudi, T. Smy, J. Klein, and Z. Jakubczyk, “Self-consistent simu- gineering from Ghent University, Gent, Belgium,
lation of opto-electronic circuits using a modified nodal analysis formula- in 2008, and the Ph.D. degree from the Depart-
tion,” IEEE Trans. Adv. Pack., vol. 33, no. 4, pp. 979–993, Nov. 2010. ment of Information Technology at the same uni-
[43] C. Arellano, S. Mingaleev, E. Sokolov, I. Koltchanov, and A. Richter, versity in photonic reservoir computing in 2013. He
“Time-and-frequency-domain modeling (TFDM) of hybrid photonic inte- is now developing software for designing and model-
grated circuits,” Proc. SPIE, vol. 8265, pp. 82 650K–82 650K, 2012. ing nanophotonic circuits. His main research interests
[44] P. De Heyn, J. De Coster, P. Verheyen, G. Lepage, M. Pantouvaki, P. Absil, include modeling of nanophotonic components and
W. Bogaerts, J. Van Campenhout, and D. Van Thourhout, “Fabrication- machine learning.
tolerant four-channel wavelength-division-multiplexingfilter based on col-
lectively tuned Si microrings,” J. Lightw. Technol., vol. 31, no. 16,
pp. 3085–3092, Aug. 2013.
[45] D. Dai, L. Yang, and S. He, “Ultrasmall thermally tunable microring res- Pieter Dumon received the degree in electrical en-
onator with a submicrometer heater on Si nanowires,” J. Lightw. Technol., gineering from Ghent University, Gent, Belgium, in
vol. 26, no. 5-8, pp. 704–709, Mar. 2008. 2002, where he received a Ph.D. degree in electri-
[46] R. Soref and B. Bennett, “Electrooptical effects in silicon,” J. Quantum cal engineering in 2007, for his work in wavelength
Electron., vol. 23, no. 1, pp. 123–129, 1987. filters in silicon photonic wires. He currently coor-
[47] M. Dinu, F. Quochi, and H. Garcia, “Third-order nonlinearities in silicon dinates ePIXfab, a initiative for multiproject wafer
at telecom wavelengths,” Appl. Phys. Lett., vol. 82, no. 18, pp. 2954–2956, fabrication in photonics.
May 5, 2003.
[48] A. Krishnamoorthy, X. Zheng, G. Li, J. Yao, T. Pinguet, A. Mekis,
H. Thacker, I. Shubin, Y. Luo, K. Raj, and J. Cunningham, “Exploit-