Design Rules
Jan M. Rabaey
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
Cross-Section of CMOS Technology
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
Design Rules
Interface between designer and process
engineer
Guidelines for constructing process masks
Unit dimension: Minimum line width
scalable design rules: lambda parameter
absolute dimensions (micron rules)
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
CMOS Process Layers
Layer
Color
Well (p,n)
Yellow
Active Area (n+,p+)
Green
Select (p+,n+)
Green
Polysilicon
Red
Metal1
Blue
Metal2
Magenta
Contact To Poly
Black
Contact To Diffusion
Black
Via
Black
Digital Integrated Circuits
Design Rules
Representation
Prentice Hall 1995
Intra-Layer Design Rules
SamePotential
Well
10
0
or
6
DifferentPotential
2
9
Polysilicon
2
Active
3
Metal1
Contact
orVia
Hole
2
2
Select
3
4
Metal2
3
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
Transistor
Transistor Layout
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
Vias and Contacts
2
4
Via
1
Metalto
1
ActiveContact
1
Metalto
PolyContact
3
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
Select Layer
2
3
Select
2
1
3
Well
Substrate
Digital Integrated Circuits
Design Rules
Prentice Hall 1995
CMOS Inverter Layout
In
GND
VD D
Out
(a)Layout
A
n
psubstrate
n
Field
Oxide
(b)CrossSectionalongAA
Digital Integrated Circuits
Design Rules
Prentice Hall 1995